Sub-5 nm structured films by hydrogen bonded siloxane liquid crystals and block copolymers

2018 ◽  
Vol 6 (12) ◽  
pp. 3042-3046 ◽  
Author(s):  
Koen Nickmans ◽  
Rob C. P. Verpaalen ◽  
Jeffrey N. Murphy ◽  
Albert P. H. J. Schenning
Keyword(s):  
Thin Films ◽  
Hydrogen Bonding ◽  
Liquid Crystals ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Inorganic Thin Films ◽  
Hydrogen Bonded

Polymeric supramolecules were prepared using hydrogen-bonding oligo(dimethylsiloxane)-based liquid crystals and poly(4-vinylpyridine) homopolymer or poly(styrene)-b-poly(4-vinylpyridine) block copolymer. These materials form glassy, hybrid organic/inorganic thin films with sub-5 nm features.

Hierarchically ordered nanostructures of a supramolecular rod-coil block copolymer with a hydrogen-bonded discotic mesogen

2019 ◽  
Vol 10 (8) ◽  
pp. 991-999 ◽  
Author(s):  
Hongbing Pan ◽  
Wei Zhang ◽  
Anqi Xiao ◽  
Xiaolin Lyu ◽  
Pingping Hou ◽  
...  
Keyword(s):  
Hydrogen Bonding ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Liquid Crystalline ◽  
Hierarchical Structures ◽  
Molar Ratio ◽  
Ordered Nanostructures ◽  
Hydrogen Bonded

Supramolecular liquid crystalline block copolymers prepared via hydrogen bonding exhibit hierarchical structures that can be tuned by varying the molar ratio of the discotic hydrogen-bonding acceptor to the block copolymer donor.

scholarly journals Fractionation of block copolymers for pore size control and reduced dispersity in mesoporous inorganic thin films

Nanoscale ◽  
2020 ◽  
Vol 12 (35) ◽  
pp. 18455-18462
Author(s):  
Alberto Alvarez-Fernandez ◽  
Barry Reid ◽  
Jugal Suthar ◽  
Swan Yia Choy ◽  
Maximiliano Jara Fornerod ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Pore Size ◽  
Size Control ◽  
Widespread Application ◽  
Inorganic Thin Films ◽  
Pore Size Control

Inorganic mesoporous coatings find widespread application. In many cases, control over the pore dimensions is of paramount importance. To this end, we establish a powerful route to pore size and dispersity control.

scholarly journals Porous Ultra-Thin Films from Photocleavable Block Copolymers: In-Situ Degradation Kinetics Study of Pore Material

Polymers ◽  
2020 ◽  
Vol 12 (4) ◽  
pp. 781 ◽  
Author(s):  
Sedakat Altinpinar ◽  
Wael Ali ◽  
Patrick Schuchardt ◽  
Pinar Yildiz ◽  
Hui Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Polymer Film ◽  
Uv Exposure ◽  
Significant Information ◽  
X Ray ◽  
Washing Process

On the basis of the major application for block copolymers to use them as separation membranes, lithographic mask, and as templates, the preparation of highly oriented nanoporous thin films requires the selective removal of the minor phase from the pores. In the scope of this study, thin film of polystyrene-block-poly(ethylene oxide) block copolymer with a photocleavable junction groups based on ortho-nitrobenzylester (ONB) (PS-hν-PEO) was papered via the spin coating technique followed by solvent annealing to obtain highly-ordered cylindrical domains. The polymer blocks are cleaved by means of a mild UV exposure and then the pore material is washed out of the polymer film by ultra-pure water resulting in arrays of nanoporous thin films to remove one block. The removal of the PEO materials from the pores was proven using the grazing-incidence small-angle X-ray scattering (GISAXS) technique. The treatment of the polymer film during the washing process was observed in real time after two different UV exposure time (1 and 4 h) in order to draw conclusions regarding the dynamics of the removal process. In-situ X-ray reflectivity measurements provide statistically significant information about the change in the layer thickness as well as the roughness and electron density of the polymer film during pore formation. 4 H UV exposure was found to be more efficient for PEO cleavage. By in-situ SFM measurements, the structure of the ultra-thin block copolymer films was also analysed and, thus, the kinetics of the washing process was elaborated. The results from both measurements confirmed that the washing procedure induces irreversible change in morphology to the surface of the thin film.

scholarly journals Donor–acceptor block copolymers carrying pendant PC71BM fullerenes with an ordered nanoscale morphology

2015 ◽  
Vol 6 (5) ◽  
pp. 813-826 ◽  
Author(s):  
Martin Hufnagel ◽  
Matthias Fischer ◽  
Thomas Thurn-Albrecht ◽  
Mukundan Thelakkat
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Enhanced Absorption ◽  
Donor Acceptor ◽  
Periodic Nanostructure ◽  
Nanoscale Morphology

A PC71BM-grafted donor–acceptor block copolymer with enhanced absorption showing a periodic nanostructure of 37 nm both in bulk and in thin films was synthesized by combining KCTP and CRP methods.

Polymeric Janus nanoparticles templated by block copolymer thin films

RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44218-44221 ◽  
Author(s):  
Elio Poggi ◽  
Jean-Pierre Bourgeois ◽  
Bruno Ernould ◽  
Jean-François Gohy
Keyword(s):  
Thin Films ◽  
Surface Modification ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
The Self ◽  
Polymer Grafting ◽  
Novel Approach ◽  
Janus Nanoparticles

We report a novel approach to synthesize well-defined polymeric Janus nanoparticles by combining the self-assembly of block copolymers in thin films and surface modification by polymer grafting.

Noncovalent fabrication and tunable fusion of block copolymer–giant polyoxometalate hybrid micelles

Soft Matter ◽  
2014 ◽  
Vol 10 (35) ◽  
pp. 6791-6797 ◽  
Author(s):  
Liying Zhang ◽  
Haolong Li ◽  
Lixin Wu
Keyword(s):  
Hydrogen Bonding ◽  
Block Copolymer ◽  
Block Copolymers

The electrostatically premodified polyoxometalate clusters are assembled with block copolymers through hydrogen bonding, which forms hybrid micelles with tunable core fusion.

Block Copolymers on a Physically or Chemically Patterned Substrate

2010 ◽  
Vol 123-125 ◽  
pp. 523-526
Author(s):  
Jaeup U. Kim
Keyword(s):  
Thin Films ◽  
Phase Diagram ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Bulk Phase ◽  
Patterned Substrates ◽  
Patterned Substrate ◽  
Bulk Phase Diagram

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.

Functionalized Nanoporous Thin Films From Blends of Block Copolymers and Homopolymers Interacting via Hydrogen Bonding

2012 ◽  
Vol 213 (19) ◽  
pp. 2075-2080 ◽  
Author(s):  
Cé Guinto Gamys ◽  
Alexandru Vlad ◽  
Olivier Bertrand ◽  
Jean-François Gohy
Keyword(s):  
Thin Films ◽  
Hydrogen Bonding ◽  
Block Copolymers

Curvature Modification of Block Copolymer Microdomains Using Blends of Block Copolymers with Hydrogen Bonding Interactions

2012 ◽  
Vol 45 (21) ◽  
pp. 8729-8742 ◽  
Author(s):  
Victor Pryamitsyn ◽  
Sung Hyun Han ◽  
Jin Kon Kim ◽  
Venkat Ganesan
Keyword(s):  
Hydrogen Bonding ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Hydrogen Bonding Interactions
Sign in / Sign up

Export Citation Format

Share Document