scholarly journals Annealing temperature effects on photoelectrochemical performance of bismuth vanadate thin film photoelectrodes

RSC Advances ◽  
2018 ◽  
Vol 8 (51) ◽  
pp. 29179-29188 ◽  
Author(s):  
Le Shi ◽  
Sifei Zhuo ◽  
Mutalifu Abulikemu ◽  
Gangaiah Mettela ◽  
Thangavelu Palaniselvam ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Oxygen Evolution Reaction ◽  
Temperature Effects ◽  
Crystallization Behavior ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Bismuth Vanadate ◽  
Photoelectrochemical Performance

The effects of annealing treatment on crystallization behavior, grain size, electrochemical (EC) and photoelectrochemical (PEC) oxygen evolution reaction (OER) performances of bismuth vanadate (BiVO4) thin films are investigated in this work.

scholarly journals Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 859 ◽  
Author(s):  
Wei-Kai Wang ◽  
Kuo-Feng Liu ◽  
Pi-Chuen Tsai ◽  
Yi-Jie Xu ◽  
Shih-Yung Huang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Average Crystallite Size ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Atmospheric Conditions

Zinc gallate (ZnGa2O4) thin films were grown on sapphire (0001) substrate using radio frequency (RF) magnetron sputtering. After the thin film deposition process, the grown ZnGa2O4 was annealed at a temperature ranging from 500 to 900 °C at atmospheric conditions. The average crystallite size of the grown ZnGa2O4 thin films increased from 11.94 to 27.05 nm as the annealing temperature rose from 500 to 900 °C. Excess Ga released from ZnGa2O4 during thermal annealing treatment resulted in the appearance of a Ga2O3 phase. High-resolution transmission electron microscope image analysis revealed that the preferential crystallographic orientation of the well-arranged, quasi-single-crystalline ZnGa2O4 (111) plane lattice fringes were formed after the thermal annealing process. The effect of crystallite sizes and lattice strain on the width of the X-ray diffraction peak of the annealed ZnGa2O4 thin films were investigated using Williamson-Hall analysis. The results indicate that the crystalline quality of the deposited ZnGa2O4 thin film improved at higher annealing temperatures.

Influence of Annealing Treatment on N-Doped TiO2 Films Deposited by Pulsed Negative Bias Arc Ion Plating

2012 ◽  
Vol 482-484 ◽  
pp. 1105-1110
Author(s):  
Shu Juan Zhang ◽  
Ming Sheng Li ◽  
Zhi Qin Chen ◽  
Yong Zhong Fan
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Catalytic Performance ◽  
Film Structure ◽  
Negative Bias ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Absorption Edges

The N-doped TiO2thin films were deposited on medical glass slide by pulsed negative bias arc ion plating. The influence of pulsed negative bias, annealing temperature and time on films properties was investigated. Film structure, surface morphologies and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degrading methyl orange. The results show that the absorption edges of the as-deposited films increase with the rising of the pulse negative bias, and the maximum of 550 nm is achieved under -600V bias. The films absorption edges increase in different degree after annealing at 400°Cand 500°Cfor 2h, and the best extending can increase 22nm after annealing. The diffraction peak intensity and surface grain size increase with increasing the annealing temperature and time. The grain size of films after annealing at 400°C for 4h is largest of all the films. The pulsed negative bias and annealing treatment not only indecrease TiO2thin films the UV catalytic performance, but also extend the catalytic properties to the sunlight.

Enhanced the Dielectric and Tunable Properties of BZNT Thin Films through Adjusting Annealing Process

2012 ◽  
Vol 252 ◽  
pp. 211-215
Author(s):  
Xiao Hua Sun ◽  
Shuang Hou ◽  
Zhi Meng Luo ◽  
Cai Hua Huang ◽  
Zong Zhi Hu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Constant ◽  
Grain Size ◽  
Dielectric Loss ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Annealing Process ◽  
Si Substrates ◽  
Tunable Properties

Bismuth zinc niobate titanium (Bi1.5Zn0.5 Nb0.5Ti1.5O7) (BZNT) thin films were deposited on PtTiSiO2Si substrates by radio frequency (rf) magnetron sputtering. The microstructure, surface morphology, stress, dielectric and tunable properties of thin films were investigated as a function of initial annealing temperature. It’s found that high initial annealing temperature increases the grain size, dielectric constant and tunability of BZNT films simultaneously and decreases the tensile stress in films. The BZNT thin film annealed from 500 °C to 700 °C shows the highest FOM value of 45.67 with the smallest dielectric loss and upper tunability.

Effects of Annealing Treatment on WO3 Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 248-250 ◽  
Author(s):  
Thanat Srichaiyaperk ◽  
Kamon Aiempanakit ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Chanunthorn Chananonnawathorn ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Reactive Magnetron ◽  
Thin Film Thickness ◽  
Dc Reactive Magnetron Sputtering

Tungsten trioxide (WO3) thin films were prepared by a DC reactive magnetron sputtering technique. The thin film fabrication process used tungsten (99.995%) as the sputtering target, the mixture of argon and oxygen as sputtering and reactive gases, and silicon (100) and glass slides as the substrates. The effects of annealing temperature in the range of 200-400°C on physical and optical properties of the WO3 thin films were investigated. The nanostructures and morphologies of these films were characterized by grazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscopy (FE-SEM). The optical properties were analyzed by variable-angle spectroscopic ellipsometry (VASE) and spectrophotometer. From the XRD results, the as-deposited and annealed WO3 thin films up to 300°C were all amorphous. Only the WO3 thin film annealed at 400°C exhibited a polycrystalline monoclinic phase. The FE-SEM cross-sections and surface topologies demonstrated nearly identical thin-film thickness and physical grain sizes. The SE analyses showed that the thin films were all homogeneous dense layers with additional surface roughness. With the annealing treatment, the thin film thickness was slightly decreased. The SE physical model was best optimized with the Cauchy optical model. The results showed that the refractive index at 550 nm was increased from 2.17 to 2.23 with the increased annealing temperature. The results from the spectrophotometer confirmed that the optical spectra for the WO3 thin films were decreased. This study demonstrated that, the thin film annealed at 400°C exhibited the slightly lower transparency, which corresponded to the results from the GIXRD and SE analyses.

scholarly journals Post-Sputtering Heat Treatments of Molybdenum on Silicon Wafer

2018 ◽  
Vol 8 (9) ◽  
pp. 1692 ◽  
Author(s):  
Xuguang Jia ◽  
Ziyun Lin ◽  
Terry Chien-Jen Yang ◽  
Binesh Puthen-Veettil ◽  
Lingfeng Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Conductivity ◽  
Grain Size ◽  
Annealing Temperature ◽  
Heat Treatments ◽  
Fused Silica ◽  
Annealing Process ◽  
High Temperature Annealing ◽  
Crystalline Orientation

This paper investigated the property evolutions of Mo thin films that were subjected to post-sputtering heat treatments from 700 °C to 1100 °C. It was found that, after annealing, the use of Si wafers eliminated crack formations found in previously reported Mo thin films sputtered on fused silica substrates. The recrystallization of the Mo thin film was found to start at 900 °C, which led to rearrangements of the preferred crystalline orientation and enhancement of grain size when the annealing temperature was further increased. The electrical conductivity of the Mo thin films was majorly affected by the increase of Mo crystallite size as the annealing temperature was increased. Overall, the improvement of material sustainability and compatibility in the high temperature annealing process has made it positive to implement a Mo-Si contact-substrate scheme for vertical structured Si QDs solar cells.

scholarly journals Influence of annealing temperature on reversible resistive switching of WOx thin filmsdeposited on FTO substrate

2014 ◽  
Vol 17 (3) ◽  
pp. 12-18
Author(s):  
Tam Thi Bang Dao ◽  
Thang Bach Pham
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Monoclinic Phase ◽  
Annealing Temperature ◽  
Annealing Treatment ◽  
Crystalline Morphology ◽  
Annealing Temperatures ◽  
High Annealing ◽  
Bipolar Type ◽  
Switching Characteristics

In this work, we investigated effects of the annealing temperature on the crystalline, morphology of sputtered WOx thin films. The resutls show that as-deposited WOx thin films and annealed WOxthin films at 300oC, 600oC in the air are in monoclinic phase. As the annealing temperature increases, crystallinity of WOx thin films enhances with high(200) orientation. FESEM images showed larger grain size, and denser films at high annealing temperatures. The reversible resistance switching characteristics of the Ag/WOx/FTO structure follows bipolar type, the switching ratio decreases as the crystallinity of WOx thin films increases under an the annealing treatment.

Annealing Treatment of Ferroelectric Pb (Zr0.52Ti0.48)O3 Thin Films with La0.5Sr0.5CoO3 Buffer Layer

2013 ◽  
Vol 739 ◽  
pp. 42-46 ◽  
Author(s):  
Jie Guo ◽  
Wei Liu ◽  
Shi Qing Man
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Buffer Layer ◽  
Annealing Temperature ◽  
Perovskite Phase ◽  
Annealing Treatment ◽  
Rf Magnetron Sputtering ◽  
X Rays ◽  
Pzt Thin Film ◽  
Degree Of Crystallization

Lead zirconium titanate Pb (Zr0.52Ti0.48)O3(PZT) thin films have been deposited on Pt/Ti/Si substrate by rf-magnetron sputtering. X rays diffraction revealed that at 600°C the PZT thin film had crystallized into ABO3perovskite phase. Degree of crystallization depended on annealing temperature. The perovskite grains were textured predominantly along the (110) direction. The grain size was about 140 nm and almost unchanged under different annealing temperature. With the annealing temperature increasing, the degree of crystallization was improved. La0.5Sr0.5CoO3(LSCO) thin film was grown on Pt/Ti/Si as buffer layer. PZT with LSCO buffer layer was intensively (110) preferred orientation and the morphology of PZT thin film changed greatly.

scholarly journals Study the Structural Properties and Surface Morphology of CdO Thin Films Prepared by Chemical Spray pyrolysis

2020 ◽  
Vol 12 (02) ◽  
pp. 1-11
Author(s):  
Karrar Mahdi Saleh ◽  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Structural Properties ◽  
Annealing Time ◽  
Annealing Temperature ◽  
Crystal Defects ◽  
Average Grain Size ◽  
Chemical Spray ◽  
Cdo Thin Films

CdO films were prepared using a chemical spray paralysis (CSP) method on the glass substrate at a temperature of 350 ° C and thickness (260 ± 15 nm), and study the effect annealing time (0, 1, 1.5, 2, 2.5) h at annealing temperature 450 °C on structural properties. The X-ray diffraction pattern the results showed that all CdO thin films have a polycrystalline structure and a prevalent growth in the direction (111), and the average grain size (G) in this direction ranges (29.80 - 33.23) nm. It generally increases in value while the agitation values, extraction density, number of crystals decrease by increasing the annealing time (0-2)h at annealing temperature 450 ° C of thin films. From the resulted of the atomic force microscope (AFM), the surface roughness, medium square root (RMS) and average grain size increase with the increasing of the annealing time (0-2) h, at annealing temperature 450 ° C. The thin film with annealing time 2.5 h at annealing temperature 450 °C . We note a slight decrease in the values of the coefficients ( XRD and AFM) Due to the changes in the crystal structure of thin films and beginning of cracks and crystal defects generated on the surface of the thin film during the annealing process. It has been observed in practice that the increase in the annealing time to 3 h at annealing temperature 450 ° C. led to the separation of the thin film from the substrates.

scholarly journals Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 23
Author(s):  
Weiguang Zhang ◽  
Jijun Li ◽  
Yongming Xing ◽  
Xiaomeng Nie ◽  
Fengchao Lang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Integrated Circuits ◽  
Film Thickness ◽  
Depth Range ◽  
Micro Electro Mechanical Systems ◽  
Si Substrates ◽  
Sio2 Thin Film ◽  
Average Grain Size

SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.

scholarly journals Optimizing the Properties of La0.8Sr0.2CrO3 Thin Films through Post-Annealing for High-Temperature Sensing

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1802
Author(s):  
Dan Liu ◽  
Peng Shi ◽  
Yantao Liu ◽  
Yijun Zhang ◽  
Bian Tian ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Annealing Temperature ◽  
Rf Sputtering ◽  
Maximum Size ◽  
Cross Sectional ◽  
Post Annealing ◽  
Maximum Conductivity ◽  
Different Temperatures ◽  
Post Annealing Temperature

La0.8Sr0.2CrO3 (0.2LSCO) thin films were prepared via the RF sputtering method to fabricate thin-film thermocouples (TFTCs), and post-annealing processes were employed to optimize their properties to sense high temperatures. The XRD patterns of the 0.2LSCO thin films showed a pure phase, and their crystallinities increased with the post-annealing temperature from 800 °C to 1000 °C, while some impurity phases of Cr2O3 and SrCr2O7 were observed above 1000 °C. The surface images indicated that the grain size increased first and then decreased, and the maximum size was 0.71 μm at 1100 °C. The cross-sectional images showed that the thickness of the 0.2LSCO thin films decreased significantly above 1000 °C, which was mainly due to the evaporation of Sr2+ and Cr3+. At the same time, the maximum conductivity was achieved for the film annealed at 1000 °C, which was 6.25 × 10−2 S/cm. When the thin films post-annealed at different temperatures were coupled with Pt reference electrodes to form TFTCs, the trend of output voltage to first increase and then decrease was observed, and the maximum average Seebeck coefficient of 167.8 µV/°C was obtained for the 0.2LSCO thin film post-annealed at 1100 °C. Through post-annealing optimization, the best post-annealing temperature was 1000 °C, which made the 0.2LSCO thin film more stable to monitor the temperatures of turbine engines for a long period of time.

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