Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology

Nanoscale ◽  
2018 ◽  
Vol 10 (18) ◽  
pp. 8615-8627 ◽  
Author(s):  
Akhil Sharma ◽  
Marcel A. Verheijen ◽  
Longfei Wu ◽  
Saurabh Karwal ◽  
Vincent Vandalon ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Low Temperature Plasma ◽  
Large Area ◽  
High Quality ◽  
Temperature Plasma ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

A low-temperature plasma enhanced atomic layer deposition process is demonstrated to synthesize high quality 2-D MoS2 films with tuneable morphology.

Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films

2020 ◽  
Vol 29 (3) ◽  
pp. 038102 ◽  
Author(s):  
Ailing Chang ◽  
Yichen Mao ◽  
Zhiwei Huang ◽  
Haiyang Hong ◽  
Jianfang Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Large Area ◽  
Temperature Plasma ◽  
Layer Deposition

A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition

2021 ◽  
Vol 47 (1) ◽  
pp. 96-98
Author(s):  
A. S. Gudovskikh ◽  
D. A. Kudryashov ◽  
A. I. Baranov ◽  
A. V. Uvarov ◽  
I. A. Morozov
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

scholarly journals Long-range ordered vertical III-nitride nano-cylinder arrays via plasma-assisted atomic layer deposition

2018 ◽  
Vol 6 (24) ◽  
pp. 6471-6482 ◽  
Author(s):  
Ali Haider ◽  
Petro Deminskyi ◽  
Mehmet Yilmaz ◽  
Kholoud Elmabruk ◽  
Ibrahim Yilmaz ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Anodized Aluminum ◽  
Temperature Plasma ◽  
Anodized Aluminum Oxide ◽  
Si Substrates ◽  
Cylinder Arrays ◽  
Layer Deposition

In this work, we demonstrate vertical GaN, AlN, and InN hollow nano-cylindrical arrays (HNCs) grown on Si substrates using anodized aluminum oxide (AAO) membrane templated low-temperature plasma-assisted atomic layer deposition (PA-ALD).

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

2019 ◽  
Vol 14 (1) ◽  
Author(s):  
Zhen Zhu ◽  
Perttu Sippola ◽  
Oili M. E. Ylivaara ◽  
Chiara Modanese ◽  
Marisa Di Sabatino ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Layer Deposition

scholarly journals Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution

2019 ◽  
Vol 31 (14) ◽  
pp. 5104-5115 ◽  
Author(s):  
Shashank Balasubramanyam ◽  
Mahdi Shirazi ◽  
Matthew A. Bloodgood ◽  
Longfei Wu ◽  
Marcel A. Verheijen ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Hydrogen Evolution ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Layer Deposition ◽  
Edge Site
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