Phase pure Ni3S2 and NiS from bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) via solvent thermolysis and aerosol assisted chemical vapour deposition

2018 ◽  
Vol 42 (8) ◽  
pp. 6203-6209 ◽  
Author(s):  
Charles Gervas ◽  
Sixberth Mlowe ◽  
Matthew P. Akerman ◽  
Neerish Revaprasadu
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Nickel Sulfide ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor ◽  
Phase Pure

We report the structure of a triclinic bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) complex and its use as a single source precursor for the synthesis of nickel sulfide thin films and nanoparticles.

scholarly journals [Ge(TenBu)4] – a single source precursor for the chemical vapour deposition of germanium telluride thin films

2019 ◽  
Vol 48 (1) ◽  
pp. 117-124 ◽  
Author(s):  
Samantha L. Hawken ◽  
Ruomeng Huang ◽  
C. H. (Kees) de Groot ◽  
Andrew L. Hector ◽  
Marek Jura ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Germanium Telluride ◽  
Single Source Precursor

Reaction of activated germanium with nBu2Te2 in THF solution was shown to be more effective for the preparation of the germanium(iv) tellurolate compound, [Ge(TenBu)4], than reaction of GeCl4 with LiTenBu in THF.

Homoleptic zirconium amidates: single source precursors for the aerosol-assisted chemical vapour deposition of ZrO2

2016 ◽  
Vol 4 (45) ◽  
pp. 10731-10739 ◽  
Author(s):  
Amanda L. Catherall ◽  
Michael S. Hill ◽  
Andrew L. Johnson ◽  
Gabriele Kociok-Köhn ◽  
Mary F. Mahon
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Single Source Precursor ◽  
Original Family

We report the development of a true single source precursor for the growth of zirconia thin films by aerosol-assisted chemical vapour deposition using an original family of zirconium(iv) amidate derivatives.

Fabrication of copper–zinc oxide composite thin films from single source precursor by aerosol assisted chemical vapour deposition

Polyhedron ◽  
2008 ◽  
Vol 27 (16) ◽  
pp. 3337-3342 ◽  
Author(s):  
Muhammad Shahid ◽  
Muhammad Mazhar ◽  
Mohammad A. Malik ◽  
Paul O’ Brien ◽  
James Raftery
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Oxide Composite ◽  
Single Source Precursor ◽  
Copper Zinc ◽  
Copper Zinc Oxide

scholarly journals Bis(piperidinedithiocarbamato)pyridinecadmium(ii) as a single-source precursor for the synthesis of CdS nanoparticles and aerosol-assisted chemical vapour deposition (AACVD) of CdS thin films

2014 ◽  
Vol 38 (12) ◽  
pp. 6073-6080 ◽  
Author(s):  
Sixberth Mlowe ◽  
David J. Lewis ◽  
M. Azad Malik ◽  
James Raftery ◽  
Egid B. Mubofu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Cds Nanoparticles ◽  
Single Source ◽  
Dithiocarbamate Complex ◽  
Single Source Precursor ◽  
Cds Thin Films

The pyridine adduct of a cadmium piperidine dithiocarbamate complex was used to deposit CdS thin films and for the synthesis of CdS nanoparticles.

ZnFe2O4 thin films from a single source precursor by aerosol assisted chemical vapour deposition

2010 ◽  
Vol 518 (14) ◽  
pp. 3664-3668 ◽  
Author(s):  
Asif Ali Tahir ◽  
K.G.U. Wijayantha ◽  
Muhammad Mazhar ◽  
Vickie McKee
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor

The Use of Xanthates as Precursors for the Deposition of Nickel Sulfide Thin Films by Aerosol Assisted Chemical Vapour Deposition

2005 ◽  
Vol 879 ◽  
Author(s):  
P.L. Musetha ◽  
N. Revaprasadu ◽  
M.A Malik ◽  
P. O'Brien
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Nickel Sulfide ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
X Rays ◽  
Single Source ◽  
Energy Dispersive Analysis ◽  
Nickel Sulphide ◽  
Scanning Electron

AbstractNickel sulphide (NiS) thin films have been deposited on glass by aerosol assisted chemical vapour deposition(AACVD) using single source precursors of the type, ([Ni(S2COR2)2], R = C2H5 or C3H7). TGA analyses showed that the precursors are highly volatile, making them suitable for AACVD studies. As deposited NiS films were polycrystalline as confirmed by XRD. The films have been characterised by xray diffraction (XRD), scanning electron microscopy (SEM), and Energy dispersive analysis of x-rays (EDAX).

Chemical vapour deposition of II–VI semiconductor thin films using M[(TePiPr2)2N]2(M = Cd, Hg) as single-source precursors

2006 ◽  
Vol 16 (10) ◽  
pp. 966-969 ◽  
Author(s):  
Shivram S. Garje ◽  
Jamie S. Ritch ◽  
Dana J. Eisler ◽  
Mohammad Afzaal ◽  
Paul O'Brien ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Semiconductor Thin Films
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