scholarly journals Atomic/molecular layer deposition of Cu–organic thin films

2018 ◽  
Vol 47 (44) ◽  
pp. 15791-15800 ◽  
Author(s):  
D. J. Hagen ◽  
L. Mai ◽  
A. Devi ◽  
J. Sainio ◽  
M. Karppinen

The gas-phase atomic/molecular layer deposition (ALD/MLD) technique is strongly emerging as a viable approach for fabricating new exciting inorganic–organic hybrid thin-film materials. Here we report new ALD/MLD processes for copper-based hybrid materials based on five different organic precursors.

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 103412-103417 ◽  
Author(s):  
Z. Giedraityte ◽  
L.-S. Johansson ◽  
M. Karppinen

Atomic/molecular layer deposition (ALD/MLD) processes based on Eu(thd)3 and three different aromatic organic acids with O and N donors as precursors are systematically investigated for the growth of Eu-based inorganic–organic thin-film phosphors.


2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.


Author(s):  
Seung-Hwan Lee ◽  
Hyun-Jun Jeong ◽  
Ki-Lim Han ◽  
GeonHo Beak ◽  
Jin-Seong Park

Indium oxide and indicone hybrid films consisting of indium oxide and organic aromatic linker are grown by molecular layer deposition (MLD) using bis(trimethylsilyl)amido-diethyl Indium (INCA-1) as the indium precursor, hydrogen...


2020 ◽  
Vol 49 (5) ◽  
pp. 1591-1599 ◽  
Author(s):  
Juho Heiska ◽  
Mikko Nisula ◽  
Eeva-Leena Rautama ◽  
Antti J. Karttunen ◽  
Maarit Karppinen

Crystalline Li-terephthalate and amino-functionalized Li-terephthalate thin film electrodes are fabricated from gaseous precursors with ALD/MLD to show that the electron-donating amino group lowers the redox potential.


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