Atomic/molecular layer deposition of Cu–organic thin films
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The gas-phase atomic/molecular layer deposition (ALD/MLD) technique is strongly emerging as a viable approach for fabricating new exciting inorganic–organic hybrid thin-film materials. Here we report new ALD/MLD processes for copper-based hybrid materials based on five different organic precursors.
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2021 ◽
Vol 141
(4)
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pp. 574-575
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2009 ◽
Vol 9
(12)
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2018 ◽
Vol 10
(28)
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pp. 24266-24274
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