Electronic effects of the Bernal stacking of graphite on self-assembled aromatic adsorbates

2018 ◽  
Vol 54 (69) ◽  
pp. 9607-9610 ◽  
Author(s):  
Nataliya Kalashnyk ◽  
Maud Jaouen ◽  
Céline Fiorini-Debuisschert ◽  
Ludovic Douillard ◽  
André-Jean Attias ◽  
...  
Keyword(s):  
Electronic Properties ◽  
Atomic Layer ◽  
Electronic Effects ◽  
Aromatic Molecules ◽  
Self Assembled ◽  
Bernal Stacking

We show the influence of the material beneath the single atomic layer of graphene on the electronic properties of adsorbed aromatic molecules.

scholarly journals Intercalated architecture of MA2Z4 family layered van der Waals materials with emerging topological, magnetic and superconducting properties

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Lei Wang ◽  
Yongpeng Shi ◽  
Mingfeng Liu ◽  
Ao Zhang ◽  
Yi-Lun Hong ◽  
...  
Keyword(s):  
Electronic Properties ◽  
Density Functional ◽  
Layer Structure ◽  
Atomic Layer ◽  
Type I ◽  
Hybrid Functional ◽  
Functional Theory ◽  
Valence Electrons ◽  
Nonmagnetic Metals ◽  
Standard Density

AbstractThe search for new two-dimensional monolayers with diverse electronic properties has attracted growing interest in recent years. Here, we present an approach to construct MA2Z4 monolayers with a septuple-atomic-layer structure, that is, intercalating a MoS2-type monolayer MZ2 into an InSe-type monolayer A2Z2. We illustrate this unique strategy by means of first-principles calculations, which not only reproduce the structures of MoSi2N4 and MnBi2Te4 that were already experimentally synthesized, but also predict 72 compounds that are thermodynamically and dynamically stable. Such an intercalated architecture significantly reconstructs the band structures of the constituents MZ2 and A2Z2, leading to diverse electronic properties for MA2Z4, which can be classified according to the total number of valence electrons. The systems with 32 and 34 valence electrons are mostly semiconductors. Whereas, those with 33 valence electrons can be nonmagnetic metals or ferromagnetic semiconductors. In particular, we find that, among the predicted compounds, (Ca,Sr)Ga2Te4 are topologically nontrivial by both the standard density functional theory and hybrid functional calculations. While VSi2P4 is a ferromagnetic semiconductor and TaSi2N4 is a type-I Ising superconductor. Moreover, WSi2P4 is a direct gap semiconductor with peculiar spin-valley properties, which are robust against interlayer interactions. Our study thus provides an effective way of designing septuple-atomic-layer MA2Z4 with unusual electronic properties to draw immediate experimental interest.

Modification of Electronic Properties of Graphene with Porphyrin Self-Assembled Monolayers and Photoinduced Interactions

2012 ◽  
Vol 4 (7) ◽  
pp. 743-746
Author(s):  
Mrunal A. Khaderbad ◽  
Verawati Tjoa ◽  
Nripan Mathews ◽  
S. Madhu ◽  
M. Ravikanth ◽  
...  
Keyword(s):  
Electronic Properties ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Double-atomic layer of Tl on Si(111): Atomic arrangement and electronic properties

2018 ◽  
Vol 668 ◽  
pp. 17-22 ◽  
Author(s):  
Alexey N. Mihalyuk ◽  
Leonid V. Bondarenko ◽  
Alexandra Y. Tupchaya ◽  
Dimitry V. Gruznev ◽  
Jyh-Pin Chou ◽  
...  
Keyword(s):  
Electronic Properties ◽  
Atomic Layer ◽  
Atomic Arrangement

Self-Assembled Gold Nanoparticle Thin Films with Nonmetallic Optical and Electronic Properties

Langmuir ◽  
1998 ◽  
Vol 14 (19) ◽  
pp. 5425-5429 ◽  
Author(s):  
Mathias Brust ◽  
Donald Bethell ◽  
Christopher J. Kiely ◽  
David J. Schiffrin
Keyword(s):  
Thin Films ◽  
Electronic Properties ◽  
Gold Nanoparticle ◽  
Optical And Electronic Properties ◽  
Self Assembled

scholarly journals Modifying hydrophilic properties of polyurethane acryl paint substrates by atomic layer deposition and self-assembled monolayers

RSC Advances ◽  
2020 ◽  
Vol 10 (57) ◽  
pp. 34333-34343
Author(s):  
D. Beitner ◽  
I. Polishchuk ◽  
E. Asulin ◽  
B. Pokroy
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Surface Wetting ◽  
Wetting Properties ◽  
Layer Deposition ◽  
Assembled Monolayers ◽  
Self Assembled

A process of atomic layer deposition (ALD) combined with self-assembled monolayers (SAMs) was used to investigate the possible modification of polyurethane (PUR) paint surface wetting properties without altering their original hue.

Sign in / Sign up

Export Citation Format

Share Document