scholarly journals The influence of precursor on rhenium incorporation into Re-doped MoS2 (Mo1−xRexS2) thin films by aerosol-assisted chemical vapour deposition (AACVD)

2017 ◽  
Vol 5 (35) ◽  
pp. 9044-9052 ◽  
Author(s):  
Naktal Al-Dulaimi ◽  
Edward A. Lewis ◽  
Nicky Savjani ◽  
Paul D. McNaughter ◽  
Sarah J. Haigh ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Molecular Precursors

The molecular precursors [Mo(S2CNEt2)4] (1), [Re(S2CC6H5)(S3CC6H5)2] (2), and [Re2(μ-S)2(S2CNEt2)4] (3) were used to deposit thin films of Re-doped MoS2.

scholarly journals Chemical vapour deposition of chromium-doped tungsten disulphide thin films on glass and steel substrates from molecular precursors

2018 ◽  
Vol 6 (35) ◽  
pp. 9537-9544 ◽  
Author(s):  
Ghulam Murtaza ◽  
Sai P. Venkateswaran ◽  
Andrew G. Thomas ◽  
Paul O'Brien ◽  
David J. Lewis
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Molecular Precursors ◽  
Tungsten Disulphide ◽  
Polycrystalline Thin Films ◽  
Steel Substrates

Polycrystalline thin films of chromium doped tungsten disulphide (WS2) have been deposited onto glass and steel substrates by Aerosol-Assisted Chemical Vapour Deposition (AACVD) at 450 °C.

scholarly journals The aerosol assisted chemical vapour deposition of SnSe and Cu2SnSe3thin films from molecular precursors

2014 ◽  
Vol 50 (92) ◽  
pp. 14328-14330 ◽  
Author(s):  
Punarja Kevin ◽  
Sajid N. Malik ◽  
Mohammad A. Malik ◽  
Paul O'Brien
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Molecular Precursors ◽  
Glass Substrates

SnSe and Cu2SnSe3thin films have been deposited onto glass substrates by AACVD from molecular precursors.

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

Ar stabilisation of the cubic/tetragonal phases of ZrO2 in thin films prepared by ion beam induced chemical vapour deposition

2001 ◽  
Vol 389 (1-2) ◽  
pp. 34-42 ◽  
Author(s):  
J.P Holgado ◽  
J.P Espinós ◽  
F Yubero ◽  
A Justo ◽  
M Ocaña ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour

Growth and characteristics of β-Ga2O3 thin films on sapphire (0001) by low pressure chemical vapour deposition

Vacuum ◽  
2021 ◽  
Vol 189 ◽  
pp. 110253
Author(s):  
Yujia Jiao ◽  
Qian Jiang ◽  
Junhua Meng ◽  
Jinliang Zhao ◽  
Zhigang Yin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Pressure Chemical
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