scholarly journals Aqueous metal–organic solutions for YSZ thin film inkjet deposition

2017 ◽  
Vol 5 (24) ◽  
pp. 6021-6029 ◽  
Author(s):  
C. Gadea ◽  
Q. Hanniet ◽  
A. Lesch ◽  
D. Marani ◽  
S. H. Jensen ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
High Precision ◽  
Inkjet Printing ◽  
Organic Solution ◽  
Metal Organic ◽  
Ysz Thin Film ◽  
Organic Solutions

An aqueous metal–organic solution is designed to deposit YSZ thin films by high precision and reliable inkjet printing.

Enhanced properties of metal–organic framework thin films fabricated via a coordination modulation-controlled layer-by-layer process

2017 ◽  
Vol 5 (26) ◽  
pp. 13665-13673 ◽  
Author(s):  
Suttipong Wannapaiboon ◽  
Kenji Sumida ◽  
Katharina Dilchert ◽  
Min Tu ◽  
Susumu Kitagawa ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Adsorption Capacity ◽  
Metal Organic Framework ◽  
Layer By Layer ◽  
Film Properties ◽  
Metal Organic ◽  
Enhanced Properties ◽  
P Addition ◽  
Organic Framework

Addition of a modulator in the LPE process enhances MOF thin film properties by boosting their crystallinity, orientation uniformity, and adsorption capacity.

Conductivity of Yittria-Stabilized Zirconia Nanostructure Electrolyte for Solid Oxide Fuel Cell Application by Using RF Magnetron Sputtering

2017 ◽  
Vol 268 ◽  
pp. 352-357
Author(s):  
S.Y. Jaffar ◽  
Yussof Wahab ◽  
Rosnita Muhammad ◽  
Z. Othaman ◽  
Zuhairi Ibrahim ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Stabilized Zirconia ◽  
Deposition Parameter ◽  
Deposition Parameters ◽  
Ysz Thin Film ◽  
Temperature Rate ◽  
Lower Temperature

Yttria-stabilized zirconia (YSZ) thin films were deposited successfully using RF magnetron sputtering. The substrate had been used are sapphire glass. A pure ceramic of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-O nanostructure. The aim of this research is to study the conductivity and roughness YSZ thin film by using RF magnetron sputtering by varying the temperature deposition parameter. By lowering the YSZ thin film into nanostructure would enable for SOFC to be operate at lower temperature below 400°C. The YSZ nanostructure were controlled by varying the deposition parameters, including the deposition temperature and the substrate used. The crystalline of YSZ structure at 100W and temperature 300°C. The surface morphology of the films proved that at 300°C temperature rate deposition showed optimum growth morphology and density of YSZ thin films. Besides, the high deposition subtrate temperature affected the thickness of YSZ thin film at 80nm by using surface profiler. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y target is metallic as opposed to oxide. YSZ is synthesizing to obtain the optimum thin film for SOFC application.

Solution Synthesis of Thin Films in the SnO2−In2O3System: A Case Study of the Mixing of Sol−Gel and Metal-Organic Solution Processes

2006 ◽  
Vol 18 (3) ◽  
pp. 840-846 ◽  
Author(s):  
Mauro Epifani ◽  
Raül Díaz ◽  
Jordi Arbiol ◽  
Pietro Siciliano ◽  
Joan R. Morante
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Solution Synthesis ◽  
Organic Solution ◽  
Solution Processes ◽  
Metal Organic

Inkjet-printed porphyrinic metal–organic framework thin films for electrocatalysis

2016 ◽  
Vol 4 (28) ◽  
pp. 11094-11102 ◽  
Author(s):  
Chun-Hao Su ◽  
Chung-Wei Kung ◽  
Ting-Hsiang Chang ◽  
Hsin-Che Lu ◽  
Kuo-Chuan Ho ◽  
...  
Keyword(s):  
Thin Films ◽  
Inkjet Printing ◽  
Metal Organic Framework ◽  
Metal Organic ◽  
Printing Method ◽  
Organic Framework

A simple and effective direct inkjet printing method was developed to prepare porphyrinic metal–organic framework (MOF) thin films for electrocatalysis.

scholarly journals Electrocatalytic water oxidation by a molecular catalyst incorporated into a metal–organic framework thin film

2017 ◽  
Vol 46 (5) ◽  
pp. 1382-1388 ◽  
Author(s):  
Ben A. Johnson ◽  
Asamanjoy Bhunia ◽  
Sascha Ott
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Water Oxidation ◽  
Ruthenium Complex ◽  
Metal Organic Framework ◽  
Molecular Catalyst ◽  
Metal Organic ◽  
Organic Framework

A molecular ruthenium complex incorporated into FTO-grown thin films of UiO-67 catalyzes electrochemical water oxidation.

In situ single-liquid-source metal-organic chemical vapor deposition of (La0.8Ca0.2)MnO3 giant magnetoresistive films

1995 ◽  
Vol 10 (9) ◽  
pp. 2166-2169 ◽  
Author(s):  
Y.Q. Li ◽  
J. Zhang ◽  
S. Pombrik ◽  
S. DiMascio ◽  
W. Stevens ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Organic Solution ◽  
Liquid Source ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

A large magnetoresistance change (ΔR/RH) of −550% has been observed at 270 K in (La0.8Ca0.2)MnO3 thin films. The films were prepared in situ on LaAlO3 substrates by single-liquid-source metal-organic chemical vapor deposition. M(thd)n (M = La, Ca, and Mn, and n = 2, 3) were dissolved together in an organic solution and used as precursors for the deposition of (La0.8Ca0.2)MnO3 thin films. Deposition was conducted at an oxygen partial pressure of 1.2 Torr and a substrate temperature ranging from 600 °C to 700 °C. The mechanism for the large magnetoresistance change in this manganese oxide is briefly discussed.

Effect of Acetic Acid/Water Ratio on the Microstructure and Properties of LaNiO3 Thin Films by Metal Organic Solution Deposition

2015 ◽  
Vol 815 ◽  
pp. 89-93
Author(s):  
Yuan Yuan Zhang ◽  
Xiao Dong Tang ◽  
Gen Shui Wang ◽  
Xian Lin Dong
Keyword(s):  
Thin Films ◽  
Surface Roughness ◽  
Acetic Acid ◽  
Ph Value ◽  
Precursor Solution ◽  
Organic Solution ◽  
Solution Deposition ◽  
Ph Values ◽  
Metal Organic ◽  
Acetic Acid Water

Highly (100)-oriented LaNiO3 (LNO) thin films were prepared on p-type Si (100) substrates by metal organic solution deposition (MOSD). The LNO thin films were driven by series precursor solutions with different ratio of acetic acid to deionized water (Raaw) and pH values. The dependences of viscosity, pH value and the thermal property of the gel-derived powders of the precursor solution on Raaw values were systematically investigated. AFM images showed that Raaw can dramatically influence the surface roughness. When Raaw changed from 7:1 to 1:1, the surface roughness decreased from 3.695 nm to 1.488 nm. The resistivities of all the films are less than 2.1×10-3Ω·cm. It shows that the precursor solution has strong effect on the microstructure of the thin films and relatively slight effect on the resistivity.

scholarly journals Thin Film Deposition: Solution Based Approach

2021 ◽  
Author(s):  
Kashif Tufail Chaudhary
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Inkjet Printing ◽  
High Efficiency ◽  
Scale Up ◽  
Thin Film Deposition ◽  
Dip Coating ◽  
Film Deposition ◽  
Promising Technique ◽  
Thin Film Fabrication

The wet chemical processing opens the way to deposit thin film with the versatility and ease for a variety of materials. Liquid film deposition involves the application of a liquid precursor on a substrate which is then converted to the required coating material in a subsequent post-treatment step. Different non-vacuum solution based deposition techniques have been developed to grow thin films with high efficiency and functionality. Spin coating is one of an effective technique for thin film fabrication due to low cost, uniformity, less hazardous, and capability of easy scaling up. The typical process involves depositing a small amount of a fluid onto the center of a substrate and then spinning the substrate at high speed. Dip coating is another simple, cost effective route with feasibility to scale-up for commercial production. The dip coating process can be divided into three important technical stages, immersion, withdrawal and evaporation. The coating may be subjected to further heat treatment in order to burn out residual compounds and induce crystallization of the functional oxides. Spray coating is a promising technique to grow thin film in research and industry to prepare thin and thick films. It is an easy approach to fabricate thin film with uniform distribution at small scale from a few nanometers to micrometers in thickness. Inkjet printing is the emerging promising technique to develop large-scale, and flexible thin films. The inkjet printing process allow easy customization to grow variety of complex structures.

Strong Hole Self-Doping in LaMnO3 Thin Film on a-SiO2 Substrate Produced by Metal Organic Decomposition Method

2019 ◽  
Vol 962 ◽  
pp. 17-21 ◽  
Author(s):  
Hiromi Kobori ◽  
Tohru Kitamura ◽  
Toshifumi Taniguchi ◽  
Tetsuo Shimizu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Heat Treatment ◽  
Single Crystal ◽  
Decomposition Method ◽  
Treatment Conditions ◽  
Gas Atmosphere ◽  
Metal Organic ◽  
Temperature Time ◽  
Organic Decomposition

We have studied the strong hole self-doping into LaMnO3(LMO) thin films produced by metal organic decomposition (MOD) method. With different heat treatment conditions, LMO thin films have been prepared by the MOD method in the 100 % O2gas atmosphere. We consider that the excess of O2-ions in LMO thin films induces the strong hole self-doping into LMO ones. The quantity of excess O2-ions in LMO is sensitive to the heat treatment conditions of the LMO production, especially the temperature, time and atmosphere gas. Although LMO single crystal is an antiferromagnetic insulator, LMO thin films we have produced in the 100 % O2gas atmosphere by use of the MOD method shows the properties of ferromagnetic metal.

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