Endowing graphene with superior cation/anion co-purification and visible photocatalysis performances by in situ deposition of silver compounds

2017 ◽  
Vol 5 (39) ◽  
pp. 20903-20910 ◽  
Author(s):  
Ye Xiong ◽  
Chao Wang ◽  
Hanwei Wang ◽  
Chunde Jin ◽  
Qingfeng Sun ◽  
...  
Keyword(s):  
In Situ Deposition ◽  
Silver Compound ◽  
Visible Photocatalysis ◽  
Silver Compounds

Endowing graphene with superior cations/anion co-purification and visible photocatalysis performances by in situ deposition of silver compound.

In situ deposition of magnetic nanoparticles on glass mat using plasma sputtering method

2021 ◽  
pp. 1-11
Author(s):  
Sheila Shahidi ◽  
Sanaz Dalalsharifi ◽  
Mahmood Ghoranneviss ◽  
Rattanaphol Mongkholrattanasit
Keyword(s):  
Magnetic Nanoparticles ◽  
Plasma Sputtering ◽  
In Situ Deposition ◽  
Glass Mat

scholarly journals A new hypothesis for the origin of Amazonian Dark Earths

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Lucas C. R. Silva ◽  
Rodrigo Studart Corrêa ◽  
Jamie L. Wright ◽  
Barbara Bomfim ◽  
Lauren Hendricks ◽  
...  
Keyword(s):  
Indigenous Peoples ◽  
Sustainable Use ◽  
Mineral Elements ◽  
High Fertility ◽  
Natural Processes ◽  
Plant Cultivation ◽  
In Situ Deposition ◽  
Amazonian Dark Earths ◽  
Landscape Formation

AbstractAmazonian Dark Earths (ADEs) are unusually fertile soils characterised by elevated concentrations of microscopic charcoal particles, which confer their distinctive colouration. Frequent occurrences of pre-Columbian artefacts at ADE sites led to their ubiquitous classification as Anthrosols (soils of anthropic origin). However, it remains unclear how indigenous peoples created areas of high fertility in one of the most nutrient-impoverished environments on Earth. Here, we report new data from a well-studied ADE site in the Brazilian Amazon, which compel us to reconsider its anthropic origin. The amounts of phosphorus and calcium—two of the least abundant macronutrients in the region—are orders of magnitude higher in ADE profiles than in the surrounding soil. The elevated levels of phosphorus and calcium, which are often interpreted as evidence of human activity at other sites, correlate spatially with trace elements that indicate exogenous mineral sources rather than in situ deposition. Stable isotope ratios of neodymium, strontium, and radiocarbon activity of microcharcoal particles also indicate exogenous inputs from alluvial deposition of carbon and mineral elements to ADE profiles,  beginning several thousands of years before the earliest evidence of soil management for plant cultivation in the region. Our data suggest that indigenous peoples harnessed natural processes of landscape formation, which led to the unique properties of ADEs, but were not responsible for their genesis. If corroborated elsewhere, this hypothesis would transform our understanding of human influence in Amazonia, opening new frontiers for the sustainable use of tropical landscapes going forward.

In situ deposition of ErNi2B2C films by pulsed laser ablation technique

1998 ◽  
Vol 299 (1-2) ◽  
pp. 15-22 ◽  
Author(s):  
A Canesi ◽  
M.R Cimberle ◽  
C Ferdeghini ◽  
A Diaspro ◽  
P Guasconi ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Technique ◽  
In Situ Deposition ◽  
Laser Ablation Technique

Properties of Thin SiO2 Films with In-Situ Deposition of Poly Si Electrodes

1989 ◽  
Vol 146 ◽  
Author(s):  
Paihung Pan ◽  
Ahmad Kermani ◽  
Wayne Berry ◽  
Jimmy Liao
Keyword(s):  
Electrical Properties ◽  
Breakdown Strength ◽  
Chemical Vapor ◽  
Interface State ◽  
State Density ◽  
In Situ Deposition ◽  
Different Temperatures ◽  
Flatband Voltage ◽  
Si Films

ABSTRACTElectrical properties of thin (12 nm) SiO2 films with and without in-situ deposited poly Si electrodes have been studied. Thin SiO2 films were grown by the rapid thermal oxidation (RTO) process and the poly Si films were deposited by the rapid thermal chemical vapor deposition (RTCVD) technique at 675°C and 800°C. Good electrical properties were observed for SiO2 films with thin in-situ poly Si deposition; the flatband voltage was ∼ -0.86 V, the interface state density was < 2 × 1010/cm2/eV, and breakdown strength was > 10 MV/cm. The properties of RTCVD poly Si were also studied. The grain size was 10-60 rim before anneal and was 50-120 rim after anneal. Voids were found in thin (< 70 nm) RTCVD poly Si films. No difference in either SiO2 properties or poly Si properties was observed for poly Si films deposited at different temperatures.

In-situ deposition of superconducting YBCO films on Si with ceramic buffer layers

1993 ◽  
Vol 1 (3-6) ◽  
pp. 815-826 ◽  
Author(s):  
J.Y. Juang ◽  
K.H. Wu ◽  
T.C. Lai ◽  
M.H. Lee ◽  
M.C. Hseih ◽  
...  
Keyword(s):  
Buffer Layers ◽  
Ybco Films ◽  
In Situ Deposition

In situ deposition of nano Cu2O on electrospun chitosan nanofibrous scaffolds and their antimicrobial properties

2021 ◽  
Vol 191 ◽  
pp. 600-607
Author(s):  
Xinglu Zhou ◽  
Anlin Yin ◽  
Junlu Sheng ◽  
Jiayan Wang ◽  
Huifen Chen ◽  
...  
Keyword(s):  
Antimicrobial Properties ◽  
Nanofibrous Scaffolds ◽  
In Situ Deposition

Investigation of Pt Bottom Electrodes for "In-Situ" Deposited Pb(Zr,Ti)O3 (PZT) thin Films

1991 ◽  
Vol 243 ◽  
Author(s):  
Rainer Bruchhaus ◽  
Dana Pitzer ◽  
Oliver Eibl ◽  
Uwe Scheithauer ◽  
Wolfgang Hoesler
Keyword(s):  
Elevated Temperatures ◽  
Diffusion Processes ◽  
Rutherford Backscattering Spectrometry ◽  
Layer Sequence ◽  
Si Substrates ◽  
Transmission Electron ◽  
In Situ Deposition ◽  
Electron Spectrometry ◽  
Heating Up

AbstractThe deposition of the bottom electrode plays a key role in the fabrication of ferroelectric capacitors. Processing at elevated temperatures of up to 800°C can give rise to diffusion processes and thereof formation of harmful dielectric layers.In this paper we used Rutherford backscattering spectrometry (RBS), Auger electron spectrometry (AES) and transmission electron microscopy (TEM) to study Pt/Ti/SiO2/Si substrates with various thicknesses of the Ti and Pt layers. During heating up to about 450°C in vacuum the initial layer sequence remains unchanged. However, drastic changes occur when the electrodes are exposed to Ar/O2 atmosphere during heat treatment. Oxidation induced diffusion of Ti into Pt and oxidation of Ti were observed. A Pt electrode with a 100 nm thick Ti adhesion layer proved to be suitable for the "in-situ" deposition of PZT films.

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