scholarly journals Molecular detection by liquid gated Hall effect measurements of graphene

Nanoscale ◽  
2018 ◽  
Vol 10 (3) ◽  
pp. 930-935 ◽  
Author(s):  
Hualin Zhan ◽  
Jiri Cervenka ◽  
Steven Prawer ◽  
David J. Garrett
Keyword(s):  
Hall Effect ◽  
Sheet Resistance ◽  
Hall Coefficient ◽  
Molecular Detection ◽  
Hall Effect Measurement ◽  
Effect Measurement ◽  
Hall Effect Measurements

A liquid gated Hall effect measurement of graphene shows that the Hall coefficient is more sensitive to the change of l-histidine concentration in the pM range than the sheet resistance.

Theory and Realization of a Two-Layer Hall Effect Measurement Concept for Characterization of Epitaxial and Implanted Layers of SiC

1996 ◽  
Vol 423 ◽  
Author(s):  
Adolf Schöner ◽  
Kurt Rottner ◽  
Nils Nordell
Keyword(s):  
Hall Effect ◽  
Hall Effect Measurement ◽  
Thin Layers ◽  
Electrical Insulation ◽  
Effect Measurement ◽  
Pn Junction ◽  
Hall Effect Measurements ◽  
Measurement Concept ◽  
Van Der Pauw ◽  
Cv Measurements

AbstractEpitaxial and implanted layers are generally characterized by Hall effect measurements using a pn-junction as electrical insulation of the layer from the substrate. Due to defects, low doping concentrations or thin layers the resistivity of epitaxial or implanted layers is comparable to the resistivity of the pn-junction and the substrate. This results in inefficient electrical insulation between both regions. To be able to determine the properties of epitaxial or implanted layers even in the case of substantial leakage current we developed a two-layer Hall effect measurement concept. This concept is based on the conventional van der Pauw technique applied to the layer and the substrate separately. In addition the current-voltage characteristic of the pn-junction is measured and modeled in the analysis as an ohmic resistor.This two-layer concept is applied to epitaxial grown SiC and the results are compared with conventional van der Pauw technique. In addition both techniques are compared with the results of capacitance-voltage (CV) measurements and secondary ion mass spectroscopy (SIMS).

scholarly journals Hall effect measurement for precise sheet resistance and thickness evaluation of Ruthenium thin films using non-equidistant four-point probes

AIP Advances ◽  
2018 ◽  
Vol 8 (5) ◽  
pp. 055206 ◽  
Author(s):  
Frederik Westergaard Østerberg ◽  
Maria-Louise Witthøft ◽  
Shibesh Dutta ◽  
Johan Meersschaut ◽  
Christoph Adelmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Hall Effect ◽  
Sheet Resistance ◽  
Hall Effect Measurement ◽  
Effect Measurement ◽  
Thickness Evaluation

scholarly journals Microwave Hall effect measurement for materials in the skin depth region

2021 ◽  
Vol 129 (1) ◽  
pp. 015102
Author(s):  
Ryo Ogawa ◽  
Tatsunori Okada ◽  
Hideyuki Takahashi ◽  
Fuyuki Nabeshima ◽  
Atsutaka Maeda
Keyword(s):  
Hall Effect ◽  
Hall Effect Measurement ◽  
Skin Depth ◽  
Effect Measurement

scholarly journals The Hall effect measurement in the high resistance In2O3-ZnO polycrystalline films

2009 ◽  
Vol 34 (4) ◽  
pp. 755-757 ◽  
Author(s):  
K. Yamada ◽  
T. Yamaguchi ◽  
N. Kokubo ◽  
B. Shinokazi ◽  
K. Yano ◽  
...  
Keyword(s):  
Hall Effect ◽  
High Resistance ◽  
Hall Effect Measurement ◽  
Effect Measurement ◽  
Polycrystalline Films

In situ Hall effect measurement on diamond anvil cell under high pressure

2010 ◽  
Vol 81 (11) ◽  
pp. 115101 ◽  
Author(s):  
Tingjing Hu ◽  
Xiaoyan Cui ◽  
Yang Gao ◽  
Yonghao Han ◽  
Cailong Liu ◽  
...  
Keyword(s):  
High Pressure ◽  
Hall Effect ◽  
Diamond Anvil Cell ◽  
Hall Effect Measurement ◽  
Effect Measurement ◽  
Diamond Anvil

Characterization of magnetic properties in Co/Pd multilayers by Hall effect measurement

2002 ◽  
Vol 239 (1-3) ◽  
pp. 343-345 ◽  
Author(s):  
Hae-Seung Lee ◽  
Sug-Bong Choe ◽  
Sung-Chul Shin ◽  
Cheol Gi Kim
Keyword(s):  
Magnetic Properties ◽  
Hall Effect ◽  
Hall Effect Measurement ◽  
Effect Measurement
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