Synthesis of copper hydride (CuH) from CuCO3·Cu(OH)2 – a path to electrically conductive thin films of Cu

2017 ◽  
Vol 46 (20) ◽  
pp. 6533-6543 ◽  
Author(s):  
Cláudio M. Lousada ◽  
Ricardo M. F. Fernandes ◽  
Nadezda V. Tarakina ◽  
Inna L. Soroka

High purity CuH nano-sized particles have been synthesized in aqueous media and then converted to electrically conductive thin films.

2020 ◽  
Vol 12 (32) ◽  
pp. 36437-36448 ◽  
Author(s):  
Katariina Solin ◽  
Maryam Borghei ◽  
Ozlem Sel ◽  
Hannes Orelma ◽  
Leena-Sisko Johansson ◽  
...  

2009 ◽  
Vol 1220 ◽  
Author(s):  
Yiding Wang ◽  
Li Li ◽  
Junjing Chen ◽  
Zhenyu Song ◽  
Yupeng An ◽  
...  

AbstractThis paper presents results for infrared transparent and conducting thin films based on In2O3. The films have been prepared by magnetrons sputtering equipment with different condition. Typical transmittance of 70%-80% with a film sheet resistance of 80-300Ω/□ in the 3.5-5.0μrn region has been achieved.Optically transparent and electrically conductive semiconductor Oxide films have been extensively studied in recent years. Such films have been prepared by various methods. In general, these films have high visible transmittance, but are opaque in the IR wavelength range of 1-12μm IR transmission. The infrared transparent and electrically conductive thin films are useful in certain important applications. For example, these films can be use as antistatic coatings, and while permitting a reasonable transmission coefficient for IR. Another obvious application is to serve as the conducting electrode for various optical devices where good infrared transmission is important. So, it is important to research indium oxide base infrared (3-5 um) transparent conduction thin films.It has been developed that preparation condition influence on properties of thin films. Such as the sputtering time, and pressure, and power, and the substrate temperature, had great influence on the crystal structure, optical and electrical properties of In2O3-based thin films.The In2O3-based thin films obtained were characterized and analyzed by X-ray Diffractometer (XRD), Atomic Force Microscope (AFM), Vander Pauw Method and Fourier Transform Infrared Spectroscopy (FTIR).


2018 ◽  
Vol 6 (4) ◽  
pp. 1801570 ◽  
Author(s):  
Victoria E. Blair ◽  
Kemal Celebi ◽  
Klaus Müllen ◽  
Jan Vermant

2016 ◽  
Vol 4 (16) ◽  
pp. 3403-3414 ◽  
Author(s):  
Hilal Goktas ◽  
Xiaoxue Wang ◽  
Nicolas D. Boscher ◽  
Stephen Torosian ◽  
Karen K. Gleason

Tuning the optoelectronic properties and the density of hydroxyl pendant groups of 3-thiopheneethanol-co-ethylenedioxythiohene produced via an oxidative chemical vapor deposition technique.


2009 ◽  
Vol 19 (7) ◽  
pp. 1118-1129 ◽  
Author(s):  
Mubarak Alazemi ◽  
Indrajit Dutta ◽  
Feng Wang ◽  
Richard H. Blunk ◽  
Anastasios P. Angelopoulos

1989 ◽  
Vol 267 (1-2) ◽  
pp. 303-307 ◽  
Author(s):  
Tohru Maruno ◽  
Shoichi Hayashida ◽  
Ken Sukegawa

2002 ◽  
Vol 7 (2) ◽  
pp. 45-52
Author(s):  
L. Jakučionis ◽  
V. Kleiza

Electrical properties of conductive thin films, that are produced by vacuum evaporation on the dielectric substrates, and which properties depend on their thickness, usually are anisotropic i.e. they have uniaxial anisotropy. If the condensate grow on dielectric substrates on which plane electrical field E is created the transverse voltage U⊥ appears on the boundary of the film in the direction perpendicular to E. Transverse voltage U⊥ depends on the angle γ between the applied magnetic field H and axis of light magnetisation. When electric field E is applied to continuous or grid layers, U⊥ and resistance R of layers are changed by changing γ. It means that value of U⊥ is the measure of anisotropy magnitude. Increasing voltage U0 , which is created by E, U⊥ increases to certain magnitude and later decreases. The anisotropy of continuous thin layers is excited by inequality of conductivity tensor components σ0 ≠ σ⊥. The reason of anisotropy is explained by the model which shows that properties of grain boundaries are defined by unequal probability of transient of charge carrier.


2006 ◽  
Vol 6 (7) ◽  
pp. 1939-1944 ◽  
Author(s):  
X. Yu ◽  
R. Rajamani ◽  
K. A. Stelson ◽  
T. Cui

2015 ◽  
Vol 764-765 ◽  
pp. 138-142 ◽  
Author(s):  
Fa Ta Tsai ◽  
Hsi Ting Hou ◽  
Ching Kong Chao ◽  
Rwei Ching Chang

This work characterizes the mechanical and opto-electric properties of Aluminum-doped zinc oxide (AZO) thin films deposited by atomic layer deposition (ALD), where various depositing temperature, 100, 125, 150, 175, and 200 °C are considered. The transmittance, microstructure, electric resistivity, adhesion, hardness, and Young’s modulus of the deposited thin films are tested by using spectrophotometer, X-ray diffraction, Hall effect analyzer, micro scratch, and nanoindentation, respectively. The results show that the AZO thin film deposited at 200 °C behaves the best electric properties, where its resistance, Carrier Concentration and mobility reach 4.3×10-4 Ωcm, 2.4×1020 cm-3, and 60.4 cm2V-1s-1, respectively. Furthermore, microstructure of the AZO films deposited by ALD is much better than those deposited by sputtering.


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