Low-temperature, inkjet printed p-type copper(i) iodide thin film transistors

2016 ◽  
Vol 4 (43) ◽  
pp. 10309-10314 ◽  
Author(s):  
Chang-Ho Choi ◽  
Jenna Y. Gorecki ◽  
Zhen Fang ◽  
Marshall Allen ◽  
Shujie Li ◽  
...  

Low temperature fabrication of printed p-type CuI TFTs was reported for the first time.

2010 ◽  
pp. NA-NA
Author(s):  
O. Moustapha ◽  
A. Abramov ◽  
D. Daineka ◽  
M. Oudwan ◽  
Y. Bonnassieux ◽  
...  

2006 ◽  
Vol 14 (4) ◽  
pp. 403 ◽  
Author(s):  
Woo-Jin Nam ◽  
Jae-Hoon Lee ◽  
Hye-Jin Lee ◽  
Hee-Sun Shin ◽  
Min-Koo Han

2019 ◽  
Vol 6 (19) ◽  
pp. 1900883 ◽  
Author(s):  
Yena Ji ◽  
Han Ju Lee ◽  
Seonjeong Lee ◽  
Kyung Gook Cho ◽  
Keun Hyung Lee ◽  
...  

2017 ◽  
Vol 5 (10) ◽  
pp. 2524-2530 ◽  
Author(s):  
Ao Liu ◽  
Shengbin Nie ◽  
Guoxia Liu ◽  
Huihui Zhu ◽  
Chundan Zhu ◽  
...  

Solution-processed p-type Cu2O thin films were fabricated via in-situ reaction of CuI film in NaOH solution and their applications in thin-film transistors were successfully demonstrated.


2005 ◽  
Vol 36 (1) ◽  
pp. 352 ◽  
Author(s):  
Shin-Hung Yeh ◽  
Wein-Town Sun ◽  
Jian-Shen Yu ◽  
Chien-Chih Chen ◽  
Jargon Lee ◽  
...  

2012 ◽  
Vol 1426 ◽  
pp. 169-173 ◽  
Author(s):  
Miguel A. Dominguez ◽  
Pedro Rosales ◽  
Alfonso Torres ◽  
Mario Moreno

ABSTRACTWe present the fabrication and characterization of low-temperature ambipolar thin-film transistors (TFTs) based on hydrogenated amorphous silicon-germanium (a-SiGe:H) as active layer. Inverted staggered a-SiGe:H TFTs were fabricated on Corning glass. Spin-on glass silicon dioxide was used as gate dielectric to improve the quality of the dielectric-semiconductor interface. For positive gate bias the transfer characteristic showed n-type TFT behavior, while for negative gate bias p-type behavior was observed. The n-type region exhibits subthreshold slope of 0.45 V/decade while the p-type region shows a subthreshold slope of 0.49 V/decade.


Sign in / Sign up

Export Citation Format

Share Document