scholarly journals A single-source precursor approach to solution processed indium arsenide thin films

2016 ◽  
Vol 4 (28) ◽  
pp. 6761-6768 ◽  
Author(s):  
Peter Marchand ◽  
Sanjayan Sathasivam ◽  
Benjamin A. D. Williamson ◽  
David Pugh ◽  
Salem M. Bawaked ◽  
...  
Keyword(s):  
Thin Films ◽  
Indium Arsenide ◽  
Single Source ◽  
Solution Processed ◽  
Single Source Precursor

Highly crystalline, stoichiometric InAs films have been deposited utilising a novel InAs cluster as a single source precursor.

Solution-processed CdS thin films from a single-source precursor

2014 ◽  
Vol 2 (17) ◽  
pp. 3247-3253 ◽  
Author(s):  
Anthony S. R. Chesman ◽  
Noel W. Duffy ◽  
Alessandro Martucci ◽  
Leonardo De Oliveira Tozi ◽  
Th. Birendra Singh ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Source ◽  
Solution Processed ◽  
Single Source Precursor ◽  
Cds Thin Films

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

ChemInform ◽  
2003 ◽  
Vol 34 (9) ◽  
Author(s):  
Oh-Shim Joo ◽  
Kwang-Deog Jung ◽  
Sung-Hoon Cho ◽  
Je-Hong Kyoung ◽  
Chang-Kyu Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type

MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications

2007 ◽  
Vol 201 (22-23) ◽  
pp. 9154-9158 ◽  
Author(s):  
M. Lemberger ◽  
S. Thiemann ◽  
A. Baunemann ◽  
H. Parala ◽  
R.A. Fischer ◽  
...  
Keyword(s):  
Thin Films ◽  
Tantalum Nitride ◽  
Single Source ◽  
Metal Electrodes ◽  
Single Source Precursor

Hafnium diboride thin films by chemical vapor deposition from a single source precursor

2005 ◽  
Vol 23 (6) ◽  
pp. 1619-1625 ◽  
Author(s):  
Sreenivas Jayaraman ◽  
Yu Yang ◽  
Do Young Kim ◽  
Gregory S. Girolami ◽  
John R. Abelson
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Source ◽  
Hafnium Diboride ◽  
Single Source Precursor

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2

2002 ◽  
Vol 8 (6) ◽  
pp. 273-276 ◽  
Author(s):  
O.-S. Joo ◽  
K.-D. Jung ◽  
S.-H. Cho ◽  
J.-H. Kyoung ◽  
C.-K. Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type

CVD of Zr0.65Ti0.35O2 Thin Films Using a Single-Source Precursor of Novel Anhydrous Mixed-Metal Nitrates

2006 ◽  
Vol 12 (7) ◽  
pp. 423-428 ◽  
Author(s):  
Q. Shao ◽  
A. Li ◽  
W. Zhang ◽  
D. Wu ◽  
Z. Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Source ◽  
Mixed Metal ◽  
Metal Nitrates ◽  
Single Source Precursor
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