Solution-processed CdS thin films from a single-source precursor

2014 ◽  
Vol 2 (17) ◽  
pp. 3247-3253 ◽  
Author(s):  
Anthony S. R. Chesman ◽  
Noel W. Duffy ◽  
Alessandro Martucci ◽  
Leonardo De Oliveira Tozi ◽  
Th. Birendra Singh ◽  
...  
Keyword(s):  
Thin Films ◽  
Single Source ◽  
Solution Processed ◽  
Single Source Precursor ◽  
Cds Thin Films

scholarly journals Bis(piperidinedithiocarbamato)pyridinecadmium(ii) as a single-source precursor for the synthesis of CdS nanoparticles and aerosol-assisted chemical vapour deposition (AACVD) of CdS thin films

2014 ◽  
Vol 38 (12) ◽  
pp. 6073-6080 ◽  
Author(s):  
Sixberth Mlowe ◽  
David J. Lewis ◽  
M. Azad Malik ◽  
James Raftery ◽  
Egid B. Mubofu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Cds Nanoparticles ◽  
Single Source ◽  
Dithiocarbamate Complex ◽  
Single Source Precursor ◽  
Cds Thin Films

The pyridine adduct of a cadmium piperidine dithiocarbamate complex was used to deposit CdS thin films and for the synthesis of CdS nanoparticles.

scholarly journals A single-source precursor approach to solution processed indium arsenide thin films

2016 ◽  
Vol 4 (28) ◽  
pp. 6761-6768 ◽  
Author(s):  
Peter Marchand ◽  
Sanjayan Sathasivam ◽  
Benjamin A. D. Williamson ◽  
David Pugh ◽  
Salem M. Bawaked ◽  
...  
Keyword(s):  
Thin Films ◽  
Indium Arsenide ◽  
Single Source ◽  
Solution Processed ◽  
Single Source Precursor

Highly crystalline, stoichiometric InAs films have been deposited utilising a novel InAs cluster as a single source precursor.

scholarly journals Structure and Thermal Behaviour of Dichlorobis(thiourea)cadmium(II), a Single-Source Precursor for CdS Thin Films.

1997 ◽  
Vol 51 ◽  
pp. 294-301 ◽  
Author(s):  
Malle Krunks ◽  
János Madarász ◽  
Lassi Hiltunen ◽  
Risto Mannonen ◽  
Enn Mellikov ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Behaviour ◽  
Single Source ◽  
Single Source Precursor ◽  
Cds Thin Films

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

ChemInform ◽  
2003 ◽  
Vol 34 (9) ◽  
Author(s):  
Oh-Shim Joo ◽  
Kwang-Deog Jung ◽  
Sung-Hoon Cho ◽  
Je-Hong Kyoung ◽  
Chang-Kyu Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type

MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications

2007 ◽  
Vol 201 (22-23) ◽  
pp. 9154-9158 ◽  
Author(s):  
M. Lemberger ◽  
S. Thiemann ◽  
A. Baunemann ◽  
H. Parala ◽  
R.A. Fischer ◽  
...  
Keyword(s):  
Thin Films ◽  
Tantalum Nitride ◽  
Single Source ◽  
Metal Electrodes ◽  
Single Source Precursor
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