A novel combined method of thin-film evaporation and a supercritical carbon dioxide technique to prepare a fluorescent siRNA-liposome

RSC Advances ◽  
2016 ◽  
Vol 6 (94) ◽  
pp. 92115-92119 ◽  
Author(s):  
Lielie Li ◽  
Xueqin An
Keyword(s):  
Thin Film ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Combined Method ◽  
Thin Film Evaporation ◽  
Film Evaporation ◽  
Supercritical Carbon

A novel folate-DTX/siRNA-liposome (FDSL) was prepared by a combined method of thin-film evaporation and supercritical carbon dioxide technique.

scholarly journals Low-density polymer thin film formation in supercritical carbon dioxide

2003 ◽  
Vol 83 (21) ◽  
pp. 4309-4311 ◽  
Author(s):  
Tadanori Koga ◽  
Y.-S. Seo ◽  
J. L. Jerome ◽  
S. Ge ◽  
M. H. Rafailovich ◽  
...  
Keyword(s):  
Thin Film ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Film Formation ◽  
Low Density ◽  
Polymer Thin Film ◽  
Thin Film Formation ◽  
Supercritical Carbon

Electrochemical Synthesis of a Polypyrrole Thin Film with Supercritical Carbon Dioxide as a Solvent

Langmuir ◽  
2005 ◽  
Vol 21 (26) ◽  
pp. 12303-12308 ◽  
Author(s):  
Hao Yan ◽  
Tsuyoshi Sato ◽  
Daisuke Komago ◽  
Aritomo Yamaguchi ◽  
Kenichi Oyaizu ◽  
...  
Keyword(s):  
Thin Film ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Electrochemical Synthesis ◽  
Supercritical Carbon

scholarly journals Low Temperature Deposition of Metal Oxide Thin Films in Supercritical Carbon Dioxide Using Metal-organic Precursors

2007 ◽  
Vol 1007 ◽  
Author(s):  
Theodosia Gougousi ◽  
Zhiying Chen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Low Temperatures ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Metal Organic ◽  
Organic Precursors ◽  
Supercritical Carbon

ABSTRACTA novel chemical route in thin film formation that includes the use of inorganic and organic peroxides and metal organic complexes soluble in supercritical carbon dioxide has been investigated for the deposition of alumina, titania and zirconia thin films at low temperatures (<150°C). The metal organic precursors used include: Al(acac)3, OTi(tmhd)2, and Zr(acac)4. Tert-butyl peroxide, and a 30% aqueous solution of hydrogen peroxide were used as oxidants. Depositions were carried out in a 25 ml hot wall reactor at pressures ranging from 2100 to 3900 psi at 80-140°C. The deposited thin films were investigated by using X-ray photoelectron spectroscopy (XPS) and transmission Fourier transform infrared spectroscopy (FTIR). XPS and FTIR results indicate the formation of metal oxides thin films with some bonded carbon. The deposition temperatures achieved in this process are substantially lower than those used in conventional vacuum deposition techniques making feasible the deposition on temperature sensitive substrates and organic materials required for the development of hybrid organic/inorganic devices. Processing at low temperatures in supercritical carbon dioxide may provide the basis for the development of an alternative, environmentally friendly, thin film deposition technique for the processing of nanostructures.

Sign in / Sign up

Export Citation Format

Share Document