Chemically robust solution-processed indium zinc oxide thin film transistors fabricated by back channel wet-etched Mo electrodes

RSC Advances ◽  
2016 ◽  
Vol 6 (58) ◽  
pp. 53310-53318 ◽  
Author(s):  
Da Eun Kim ◽  
Sung Woon Cho ◽  
Bora Kim ◽  
Jae Hui Shin ◽  
Won Jun Kang ◽  
...  

We designed a systematic strategy for a chemically robust solution-processed IZO thin film transistor with back channel wet-etched Mo electrodes, which showed superior electrical performance and uniformity.

2019 ◽  
Vol 19 (3) ◽  
pp. 1470-1473 ◽  
Author(s):  
Yooseong Lim ◽  
Namgyung Hwang ◽  
Jeongsuk Lee ◽  
Sehyeong Lee ◽  
Moonsuk Yi

2019 ◽  
Vol 7 (34) ◽  
pp. 10635-10641 ◽  
Author(s):  
Minh Nhut Le ◽  
Hyeongyeon Kim ◽  
Yeo Kyung Kang ◽  
Youngmin Song ◽  
Xugang Guo ◽  
...  

A facile bulk charge transfer doping method enabled electrical performance improvement of a low temperature solution processed thin film transistor.


2019 ◽  
Vol 19 (4) ◽  
pp. 2179-2182
Author(s):  
Hyunji Shin ◽  
Dongwook Kim ◽  
Jaehoon Park ◽  
Seong-Ho Song ◽  
Jong Sun Choi

Nanoscale ◽  
2019 ◽  
Vol 11 (48) ◽  
pp. 23459-23474 ◽  
Author(s):  
Taki Eddine Taouririt ◽  
Afak Meftah ◽  
Nouredine Sengouga ◽  
Marwa Adaika ◽  
Slimane Chala ◽  
...  

This study is a numerical simulation obtained by using Silvaco Atlas software to investigate the effect of different types of dielectric layers, inserted between the channel and the gate, on the performance and reliability of an a-ITZO TFT.


RSC Advances ◽  
2015 ◽  
Vol 5 (63) ◽  
pp. 51440-51445 ◽  
Author(s):  
Yuzhi Li ◽  
Linfeng Lan ◽  
Peng Xiao ◽  
Zhenguo Lin ◽  
Sheng Sun ◽  
...  

Enhanced performance of solution-processed IZO-TFTs with ZrOx interlayer due to Al diffusion suppression.


2008 ◽  
Vol 29 (12) ◽  
pp. 1309-1311 ◽  
Author(s):  
Jang Yeon Kwon ◽  
Kyoung Seok Son ◽  
Ji Sim Jung ◽  
Tae Sang Kim ◽  
Myung Kwan Ryu ◽  
...  

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