Chemically robust solution-processed indium zinc oxide thin film transistors fabricated by back channel wet-etched Mo electrodes
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We designed a systematic strategy for a chemically robust solution-processed IZO thin film transistor with back channel wet-etched Mo electrodes, which showed superior electrical performance and uniformity.
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2019 ◽
Vol 19
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pp. 1470-1473
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2019 ◽
Vol 7
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pp. 10635-10641
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2016 ◽
Vol 16
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pp. 12871-12874
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2019 ◽
Vol 19
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pp. 2179-2182
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2008 ◽
Vol 29
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pp. 1309-1311
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