Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics

2015 ◽  
Vol 3 (33) ◽  
pp. 17332-17343 ◽  
Author(s):  
Hyungchul Kim ◽  
Kai-Lin Ou ◽  
Xin Wu ◽  
Paul F. Ndione ◽  
Joseph Berry ◽  
...  

Ultra-thin (0.5–10 nm) plasma-enhanced atomic layer deposited titanium oxide (TiOx) films deposited on indium-tin-oxide contacts, are investigated as hole-blocking interlayers using conventional electrochemistry, Si-diodes, and heterojunction (P3HT:PCBM) organic photovoltaics (OPVs).

Author(s):  
Zhuocheng Zhang ◽  
Yaoqiao Hu ◽  
Zehao Lin ◽  
Mengwei Si ◽  
Adam Charnas ◽  
...  

2012 ◽  
Vol 101 (19) ◽  
pp. 193302 ◽  
Author(s):  
M. Neophytou ◽  
F. Hermerschmidt ◽  
A. Savva ◽  
E. Georgiou ◽  
S. A. Choulis

2014 ◽  
Vol 118 (48) ◽  
pp. 27884-27889 ◽  
Author(s):  
Tae Gun Kim ◽  
Hyekyoung Choi ◽  
Sohee Jeong ◽  
Jeong Won Kim

2012 ◽  
Vol 100 (21) ◽  
pp. 213302 ◽  
Author(s):  
Kyu-Sung Lee ◽  
Jong-Wook Lim ◽  
Han-Ki Kim ◽  
T. L. Alford ◽  
Ghassan E. Jabbour

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