Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
2015 ◽
Vol 3
(33)
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pp. 17332-17343
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Ultra-thin (0.5–10 nm) plasma-enhanced atomic layer deposited titanium oxide (TiOx) films deposited on indium-tin-oxide contacts, are investigated as hole-blocking interlayers using conventional electrochemistry, Si-diodes, and heterojunction (P3HT:PCBM) organic photovoltaics (OPVs).
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2014 ◽
Vol 118
(48)
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pp. 27884-27889
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2019 ◽
Vol 424
◽
pp. 165-175
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2013 ◽
Vol 116
◽
pp. 94-101
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