scholarly journals Systematic increase of electrocatalytic turnover at nanoporous platinum surfaces prepared by atomic layer deposition

2015 ◽  
Vol 3 (16) ◽  
pp. 8450-8458 ◽  
Author(s):  
Loïc Assaud ◽  
Johannes Schumacher ◽  
Alexander Tafel ◽  
Sebastian Bochmann ◽  
Silke Christiansen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metallic Platinum ◽  
Platinum Surfaces ◽  
Layer Deposition ◽  
Electrochemically Active ◽  
Nanoporous Surfaces ◽  
Nanoporous Platinum

An atomic layer deposition reaction for metallic platinum is investigated mechanistically and exploited to generate electrochemically active nanoporous surfaces.

scholarly journals Plasma-assisted and thermal atomic layer deposition of electrochemically active Li2CO3

RSC Advances ◽  
2017 ◽  
Vol 7 (66) ◽  
pp. 41359-41368 ◽  
Author(s):  
N. Hornsveld ◽  
B. Put ◽  
W. M. M. Kessels ◽  
P. M. Vereecken ◽  
M. Creatore
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Electrochemically Active

Growth per cycle as a function of process table temperature for both plasma-assisted (squares) and thermal (circles) ALD processes.

scholarly journals Remote Plasma Atomic Layer Deposition of Thin Films of Electrochemically Active LiCoO2

2019 ◽  
Vol 41 (2) ◽  
pp. 321-330 ◽  
Author(s):  
Merijn E. Donders ◽  
Harm C. Knoops ◽  
W.M.M. Kessels ◽  
Peter H. Notten
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Electrochemically Active

Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries

2017 ◽  
Vol 5 (1) ◽  
pp. 330-338 ◽  
Author(s):  
Thomas Dobbelaere ◽  
Felix Mattelaer ◽  
Amit Kumar Roy ◽  
Philippe Vereecken ◽  
Christophe Detavernier
Keyword(s):  
Atomic Layer Deposition ◽  
Lithium Ion Batteries ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Titanium Phosphate ◽  
Lithium Ions ◽  
Layer Deposition ◽  
Electrochemically Active

The as-deposited PE-ALD titanium phosphate was electrochemically active, showing insertion/extraction of lithium ions around a potential of 2.7 V vs. Li/Li+.

Atomic layer deposition in the preparation of Bi-metallic, platinum-based catalysts for fuel cell applications

2014 ◽  
Vol 148-149 ◽  
pp. 11-21 ◽  
Author(s):  
Emma Sairanen ◽  
Marta C. Figueiredo ◽  
Reetta Karinen ◽  
Annukka Santasalo-Aarnio ◽  
Hua Jiang ◽  
...  
Keyword(s):  
Fuel Cell ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metallic Platinum ◽  
Layer Deposition

Atomic Layer Deposition of Platinum Oxide and Metallic Platinum Thin Films from Pt(acac)2and Ozone

2008 ◽  
Vol 20 (21) ◽  
pp. 6840-6846 ◽  
Author(s):  
Jani Hämäläinen ◽  
Frans Munnik ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Platinum Oxide ◽  
Metallic Platinum ◽  
Layer Deposition

Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

2021 ◽  
Vol 3 (1) ◽  
pp. 59-71
Author(s):  
Degao Wang ◽  
Qing Huang ◽  
Weiqun Shi ◽  
Wei You ◽  
Thomas J. Meyer
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Dye Sensitized ◽  
Layer Deposition

Workfunction of Al-Doped ZnO Films Deposited by Atomic Layer Deposition

2018 ◽  
Author(s):  
Peter George Gordon ◽  
Goran Bacic ◽  
Gregory P. Lopinski ◽  
Sean Thomas Barry
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Ratio ◽  
Aluminum Concentration ◽  
Zno Films ◽  
Transparent Conductor ◽  
Kelvin Probe ◽  
Layer Deposition ◽  
Earth Abundant ◽  
Doped Zno

Al-doped ZnO (AZO) is a promising earth-abundant alternative to Sn-doped In<sub>2</sub>O<sub>3</sub> (ITO) as an n-type transparent conductor for electronic and photovoltaic devices; AZO is also more straightforward to deposit by atomic layer deposition (ALD). The workfunction of this material is particularly important for the design of optoelectronic devices. We have deposited AZO films with resistivities as low as 1.1 x 10<sup>-3</sup> Ωcm by ALD using the industry-standard precursors trimethylaluminum (TMA), diethylzinc (DEZ), and water at 200<sup>◦</sup>C. These films were transparent and their elemental compositions showed reasonable agreement with the pulse program ratios. The workfunction of these films was measured using a scanning Kelvin Probe (sKP) to investigate the role of aluminum concentration. In addition, the workfunction of AZO films prepared by two different ALD recipes were compared: a “surface” recipe wherein the TMA was pulsed at the top of each repeating AZO stack, and a interlamellar recipe where the TMA pulse was introduced halfway through the stack. As aluminum doping increases, the surface recipe produces films with a consistently higher workfunction as compared to the interlamellar recipe. The resistivity of the surface recipe films show a minimum at a 1:16 Al:Zn atomic ratio and using an interlamellar recipe, minimum resistivity was seen at 1:19. The film thicknesses were characterized by ellipsometry, chemical composition by EDX, and resistivity by four-point probe.<br>

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