Fast & scalable pattern transfer via block copolymer nanolithography

RSC Advances ◽  
2015 ◽  
Vol 5 (124) ◽  
pp. 102619-102624 ◽  
Author(s):  
Tao Li ◽  
Zhongli Wang ◽  
Lars Schulte ◽  
Ole Hansen ◽  
Sokol Ndoni
Keyword(s):  
Block Copolymer ◽  
Pattern Transfer ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Fully scalable nanopatterning by direct PS-b-PDMS block copolymer lithography, without substrate pre-modification and without annealing.

Universal pattern transfer methods for metal nanostructures by block copolymer lithography

2015 ◽  
Vol 26 (37) ◽  
pp. 375301 ◽  
Author(s):  
Kun-Hua Tu ◽  
Wubin Bai ◽  
George Liontos ◽  
Konstantinos Ntetsikas ◽  
Apostolos Avgeropoulos ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Metal Nanostructures ◽  
Pattern Transfer ◽  
Block Copolymer Lithography ◽  
Universal Pattern ◽  
Copolymer Lithography

Block copolymer self-assembly assisted fabrication of laterally organized- and stacked- nanoarrays

2021 ◽  
Author(s):  
Vignesh Suresh ◽  
Ah Bian Chew ◽  
Christina Yuan Ling Tan ◽  
Hui Ru Tan
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
The Self ◽  
Functional Surfaces ◽  
Self Assembled ◽  
Block Copolymer Lithography ◽  
Unique Surface ◽  
Copolymer Lithography

Abstract Block copolymer (BCP) self-assembly processes are often seen as reliable techniques for advanced nanopatterning to achieve functional surfaces and create templates for nanofabrication. By taking advantage of the tunability in pitch, diameter and feature-to-feature separation of the self-assembled BCP features, complex, laterally organized- and stacked- multicomponent nanoarrays comprising of gold and polymer have been fabricated. The approaches not only demonstrate nanopatterning of up to two levels of hierarchy but also investigate how a variation in the feature-to-feature gap at the first hierarchy affects the self-assembly of polymer features at the second. Such BCP self-assembly enabled multicomponent nanoarray configurations are rarely achieved by other nanofabrication approaches and are particularly promising for pushing the boundaries of block copolymer lithography and in creating unique surface architectures and complex morphologies at the nanoscale.

Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography

Nanoscale ◽  
2018 ◽  
Vol 10 (21) ◽  
pp. 10005-10017 ◽  
Author(s):  
Katharina Brassat ◽  
Daniel Kool ◽  
Julius Bürger ◽  
Jörg K. N. Lindner
Keyword(s):  
Block Copolymer ◽  
Nanosphere Lithography ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Block copolymer lithography for the nanopatterning of Au, Pt and TiO2 surfaces is presented; by combining this technique with nanosphere lithography, we create hierarchical nanopores.

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