Tough and adhesive nanostructured calcium phosphate thin films deposited by the pulsed plasma deposition method
Keyword(s):
Calcium phosphate thin films were deposited at room temperature by the pulsed plasma deposition method. After annealing at 600 °C, film mechanical properties and adhesion to the titanium substrate strongly improved.
2009 ◽
Vol 60
(5)
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pp. 415-419
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2010 ◽
Vol 256
(22)
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pp. 6526-6530
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2013 ◽
Vol 1
(3)
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pp. 310-318
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2015 ◽
Vol 15
(02)
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pp. 1540002
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2015 ◽
Vol 15
(05)
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pp. 1550070
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