scholarly journals Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Nanoscale ◽  
2014 ◽  
Vol 6 (24) ◽  
pp. 15216-15221 ◽  
Author(s):  
Woon Ik Park ◽  
Sheng Tong ◽  
Yuzi Liu ◽  
Il Woong Jung ◽  
Andreas Roelofs ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Interaction Parameter ◽  
Self Assembly ◽  
Mixed Solvent ◽  
Pattern Generation ◽  
20 Nm ◽  
Solvent Vapors

Pattern generation of well-controlled block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography.

Hierarchical multi-level block copolymer patterns by multiple self-assembly

Nanoscale ◽  
2019 ◽  
Vol 11 (17) ◽  
pp. 8433-8441 ◽  
Author(s):  
Hyunsung Jung ◽  
Won Ho Shin ◽  
Tae Wan Park ◽  
Young Joong Choi ◽  
Young Joon Yoon ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Pattern Generation ◽  
Unusual Pattern ◽  
3D Nanostructures ◽  
Multi Level ◽  
2D And 3D Nanostructures ◽  
2D And 3D

Unusual pattern generation of various 2D and 3D nanostructures can be achieved by the multiple self-assembly of block copolymers (BCPs) such as big-dot, double-dot, line-on-dot, pondering, dot-in-honeycomb, dot-in-pondering, and line-on-pondering patterns.

scholarly journals Bending Behaviors and Directed Self-assembly of Rod-Coil Block Copolymers

2020 ◽  
Author(s):  
lingying shi ◽  
Sangho Lee ◽  
Qingyang Du ◽  
rong ran ◽  
Runze Liu ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Self Assembly ◽  
Diblock Copolymers ◽  
Pattern Generation ◽  
Solvent Annealing ◽  
Line Segments ◽  
Chemical Functionalization ◽  
Triblock Terpolymers ◽  
Line Space

Abstract The formation of zig-zags, chevrons, Y-junctions and line segments is demonstrated in thin films formed from cylindrical morphology Si-containing rod-coil diblock copolymers and triblock terpolymers under solvent annealing. Directed self-assembly of the block copolymers within trenches yields well-ordered cylindrical microdomains oriented either parallel or transverse to the sidewalls depending on the chemical functionalization of the sidewalls, and the location and structure of concentric bends in the cylinders is determined by the shape of the trenches. The innate etching contrast, the spontaneous sharp bends and junctions, and the range of demonstrated periodicity and line/space ratios make these conformationally asymmetric rod-coil polymers attractive for nanoscale pattern generation.

scholarly journals Nanoscale neuroelectrode modification via sub-20 nm silicon nanowires through self-assembly of block copolymers

2015 ◽  
Vol 26 (2) ◽  
Author(s):  
Parvaneh Mokarian-Tabari ◽  
Catalina Vallejo-Giraldo ◽  
Marc Fernandez-Yague ◽  
Cian Cummins ◽  
Michael A. Morris ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Silicon Nanowires ◽  
Self Assembly ◽  
20 Nm

scholarly journals Controlled Self-Assembly of Block Copolymers in Printed Sub-20 nm Cross-bar Structures

2021 ◽  
Author(s):  
Tae Wan Park ◽  
Young Lim Kang ◽  
Myunghwan Byun ◽  
Suck Won Hong ◽  
Yong-Sik Ahn ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Simple Process ◽  
20 Nm ◽  
Pattern Resolution

Directed self-assembly (DSA) of block copolymers (BCPs) has garnered much attention due to its excellent pattern resolution, simple process, and good compatibility with many other lithography methods for useful nanodevice...

scholarly journals Pattern transfer using block copolymers

2013 ◽  
Vol 371 (2000) ◽  
pp. 20120306 ◽  
Author(s):  
Xiaodan Gu ◽  
Ilja Gunkel ◽  
Thomas P. Russell
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Pattern Transfer ◽  
Full Potential ◽  
Actual Use ◽  
Recent Developments ◽  
Increasing Demand ◽  
20 Nm ◽  
Lithography Technique ◽  
Made In

To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore’s law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.

Self-Assembly of Hydrogels From Elastin-Mimetic Block Copolymers

2002 ◽  
Vol 724 ◽  
Author(s):  
Elizabeth R. Wright ◽  
R. Andrew McMillan ◽  
Alan Cooper ◽  
Robert P. Apkarian ◽  
Vincent P. Conticello
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Triblock Copolymers ◽  
Variable Temperature ◽  
Inverse Temperature ◽  
Temperature Transition ◽  
Scanning Calorimetry ◽  
Design Synthesis ◽  
Inverse Temperature Transition ◽  
Functional Biomaterials

AbstractTriblock copolymers have traditionally been synthesized with conventional organic components. However, triblock copolymers could be synthesized by the incorporation of two incompatible protein-based polymers. The polypeptides would differ in their hydrophobicity and confer unique physiochemical properties to the resultant materials. One protein-based polymer, based on a sequence of native elastin, that has been utilized in the synthesis of biomaterials is poly (Valine-Proline-Glycine-ValineGlycine) or poly(VPGVG) [1]. This polypeptide has been shown to have an inverse temperature transition that can be adjusted by non-conservative amino acid substitutions in the fourth position [2]. By combining polypeptide blocks with different inverse temperature transition values due to hydrophobicity differences, we expect to produce amphiphilic polypeptides capable of self-assembly into hydrogels. Our research examines the design, synthesis and characterization of elastin-mimetic block copolymers as functional biomaterials. The methods that are used for the characterization include variable temperature 1D and 2D High-Resolution-NMR, cryo-High Resolutions Scanning Electron Microscopy and Differential Scanning Calorimetry.

Square patterns formed from the directed self-assembly of block copolymers

2021 ◽  
Author(s):  
Weihua Li ◽  
Xueying Gu
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Bottom Up ◽  
Tremendous Progress

Since tremendous progress has been made, directed self-assembly (DSA) of block copolymers has been regarded as one of the most promising bottom-up lithography techniques. In particular, DSA has been successfully...

Nucleobase-Containing Block Copolymers Having a High Interaction Parameter by Complementary Hydrogen Bonding

2021 ◽  
Author(s):  
Nari Shin ◽  
Seonghyeon Ahn ◽  
Eunsoel Kim ◽  
Eun Young Kim ◽  
So Yeong Park ◽  
...  
Keyword(s):  
Hydrogen Bonding ◽  
Block Copolymers ◽  
Interaction Parameter ◽  
High Interaction

Effects of Trace Water on Self-Assembly of Sulfonated Block Copolymers During Solution Processing

2020 ◽  
Vol 2 (11) ◽  
pp. 4893-4901
Author(s):  
Karthika Madathil ◽  
Kayla A. Lantz ◽  
Morgan Stefik ◽  
Gila E. Stein
Keyword(s):  
Block Copolymers ◽  
Self Assembly ◽  
Solution Processing ◽  
Trace Water
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