Efficacy of titanium doped-indium tin oxide (Ti/TiO2–ITO) films in rapid oxygen generation under photocatalysis and their suitability for bio-medical application

2014 ◽  
Vol 16 (45) ◽  
pp. 24790-24799 ◽  
Author(s):  
A. Subrahmanyam ◽  
A. Rajakumar ◽  
Md. Rakibuddin ◽  
T. Paul Ramesh ◽  
M. Raveendra Kiran ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Medical Application ◽  
Artificial Lung ◽  
Assistive Devices ◽  
Oxygen Generation ◽  
Ito Films

Fabrication of novel titanium doped ITO films and understanding the mechanism for effective photocatalytic oxygen generation for artificial lung-assistive devices.

scholarly journals Optoelectronic Properties of Ultrathin Indium Tin Oxide Films: A First-Principle Study

Crystals ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 30
Author(s):  
Xiaoyan Liu ◽  
Lei Wang ◽  
Yi Tong
Keyword(s):  
Film Thickness ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Density Functional ◽  
Optoelectronic Properties ◽  
Surface Strain ◽  
Strain Effect ◽  
First Principle ◽  
Electrical Resistivities ◽  
Ito Films

First-principle density functional theory simulations have been performed to predict the electronic structures and optoelectronic properties of ultrathin indium tin oxide (ITO) films, having different thicknesses and temperatures. Our results and analysis led us to predict that the physical properties of ultrathin films of ITO have a direct relation with film thickness rather than temperature. Moreover, we found that a thin film of ITO (1 nm thickness) has a larger absorption coefficient, lower reflectivity, and higher transmittance in the visible light region compared with that of 2 and 3 nm thick ITO films. We suggest that this might be due to the stronger surface strain effect in 1 nm thick ITO film. On the other hand, all three thin films produce similar optical spectra. Finally, excellent agreement was found between the calculated electrical resistivities of the ultrathin film of ITO and that of its experimental data. It is concluded that the electrical resistivities reduce along with the increase in film thickness of ITO because of the short strain length and limited bandgap distributions.

Plasma-Assisted Deposition and Crystal Growth of Thin Indium-Tin-Oxide (ITO) Films

2004 ◽  
pp. 299-312 ◽  
Author(s):  
R. Hippler ◽  
H. Steffen ◽  
M. Quaas ◽  
T. Röwf ◽  
T.M. Tun ◽  
...  
Keyword(s):  
Crystal Growth ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ito Films

Microstructure and Electrical Properties of ITO Films Deposited Using Various ITO Targets by Magnetron Sputtering

2007 ◽  
Vol 124-126 ◽  
pp. 431-434
Author(s):  
Joon Hong Park ◽  
Sang Chul Lee ◽  
Jin Ho Lee ◽  
Pung Keun Song
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Target Surface ◽  
Flow Ratio ◽  
Dc Power ◽  
Alkali Glass ◽  
Oxygen Ratio ◽  
Ito Films

Indium Tin Oxide (ITO) films were deposited on non-alkali glass substrate by magnetron sputtering using commercial ITO target (target A) and improved ITO target (target B). Depositions were carried out at total gas pressure (Ptot) of 0.5 Pa, substrate temperature (Ts) of RT ~ 300 °C, oxygen flow ratio [O2/(O2+Ar)] of 0 ~ 1.0% and dc power of 100W. Target B showed relatively higher stability in film resistivity with increasing sputtering time, i.e., erosion ratio of target surface. Optimum oxygen ratio to obtain the lowest resistivity was decreased with increasing substrate temperature. The lowest resistivity was 1.06x10-4 6cm for the film deposited using target B at O2/(O2+Ar) ratio of 0.05% and at Ts =300 °C.

Patterning of indium-tin-oxide (ITO) films using laser-induced forward transfer (LIFT) technique

2011 ◽  
Author(s):  
Hironobu Sakata ◽  
Akira Yoshikado ◽  
Eisuke Yokoyama ◽  
Moriaki Wakaki
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Forward Transfer ◽  
Ito Films

Properties of Indium Tin Oxide Films Prepared by Two-Targets Magnetron Sputtering

2014 ◽  
Vol 997 ◽  
pp. 337-340
Author(s):  
Jian Guo Chai
Keyword(s):  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Optical Transmittance ◽  
Visible Range ◽  
Glass Substrates ◽  
Optimized Conditions ◽  
Tin Oxide Films ◽  
Ito Films

Indium tin oxide (ITO) films were deposited on glass substrates by magnetron sputtering. Properties of ITO films showed a dependence on substrate temperature. With an increasing in substrate temperature, the intensity of XRD peak increased and the grain size showed an evident increasing. The results show that increasing substrate temperature remarkably improves the characteristics of the films. The sheet resistance of 10 Ω/sq and the maximum optical transmittance of 90% in the visible range with optimized conditions can be achicved. The results of experiment demonstrate that high-quality films have been achieved by this technique.

Effect of the heat treatment on the infrared emissivity of indium tin oxide (ITO) films

2011 ◽  
Vol 257 (22) ◽  
pp. 9639-9642 ◽  
Author(s):  
Kewei Sun ◽  
Wancheng Zhou ◽  
Xiufeng Tang ◽  
Zhibin Huang ◽  
Fa Lou ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Infrared Emissivity ◽  
Ito Films

Influence of the Tin Concentration in Indium Tin Oxide (ITO) Films Deposited by DC Magnetron Sputtering for Touch Panels

2014 ◽  
Vol 9 (3) ◽  
pp. 414-418
Author(s):  
Sang Hyun Cho ◽  
Hyo Jin Kim ◽  
Sung Ho Lee ◽  
Jae IK Woo ◽  
Kyu Ho Song ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Dc Magnetron Sputtering ◽  
Touch Panels ◽  
Ito Films

An embedded-PVA@Ag nanofiber network for ultra-smooth, high performance transparent conducting electrodes

2017 ◽  
Vol 5 (17) ◽  
pp. 4198-4205 ◽  
Author(s):  
Soram Bobby Singh ◽  
Yibin Hu ◽  
Tolendra Kshetri ◽  
Nam Hoon Kim ◽  
Joong Hee Lee
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
High Performance ◽  
Weather Conditions ◽  
Solar Panels ◽  
Transparent Conducting ◽  
Transparent Conducting Electrodes ◽  
Ito Films

Flexible transparent conducting electrodes (TCEs) in replacement of brittle indium tin oxide (ITO) films are of ultimate importance in the production of flexible and stretchable displays, lighting devices, and solar panels with the ability to resist harsh weather conditions.

Amorphous to crystalline transition and optoelectronic properties of nanocrystalline indium tin oxide (ITO) films sputtered with high rf power at room temperature

2009 ◽  
Vol 355 (28-30) ◽  
pp. 1508-1516 ◽  
Author(s):  
V. Malathy ◽  
S. Sivaranjani ◽  
V.S. Vidhya ◽  
J. Joseph Prince ◽  
T. Balasubramanian ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Optoelectronic Properties ◽  
Rf Power ◽  
Ito Films
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