Location-controlled parallel and vertical orientation by dewetting-induced block copolymer directed self-assembly

2013 ◽  
Vol 1 (25) ◽  
pp. 4020 ◽  
Author(s):  
Haeng-Deog Koh ◽  
Youn Jung Park ◽  
Seong-Jun Jeong ◽  
Young-Nam Kwon ◽  
In Taek Han ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Vertical Orientation

scholarly journals Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments

2020 ◽  
Vol 4 (2) ◽  
pp. 19 ◽  
Author(s):  
Hiroki Yamamoto ◽  
Guy Dawson ◽  
Takahiro Kozawa ◽  
Alex P. G. Robinson
Keyword(s):  
Electron Beam ◽  
Block Copolymer ◽  
Self Assembly ◽  
Self Assembled Monolayer ◽  
Vertical Orientation ◽  
Lithographic Patterning ◽  
Si Substrates ◽  
Lamellar Orientation ◽  
Assembled Monolayers ◽  
Self Assembled

Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) chemically modified by electron beam (EB) irradiation, which is composed of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT). Irradiating a NPHT by EB could successfully induce the orientation and selective patterning of block copolymer domains. We clarified that spatially-selective lamellar orientations of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) could be achieved by a change of an underlying SAM. The change of an underlying SAM is composed of the transition of an NO2 group to an NH2 group, which is induced by EB. The modification in the polarity of different regions of the SAM with EB lithography controlled the lamellar orientation of PS-b-PMMA. The reduction of the NPHT SAM plays an important role in the orientation of block copolymer. This method might significantly simplify block copolymer DSA processes when it is compared to the conventional DSA process. By investigating the lamellae orientation with EB, it is clarified that only suitable annealing temperatures and irradiation doses lead to the vertical orientation. We also fabricated pre-patterned Si substrates by EB lithographic patterning and reactive ion etching (RIE). DSA onto such pre-patterned Si substrates was proven to be successful for subdivision of the lithographic patterns into line and space patterns.

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Oxidation and ATP dual-responsive block copolymer containing tertiary sulfoniums: self-assembly, protein complexation and triggered release

2021 ◽  
Author(s):  
Yanfen Jiang ◽  
Shuqi Dong ◽  
Guoyang Qin ◽  
Li Liu ◽  
Hanying Zhao
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Phenylboronic Acid ◽  
Cationic Polymer ◽  
Release Profile ◽  
Triggered Release ◽  
Dual Responsive ◽  
Protein Complexation

Alkylation of thioether-containing block copolymer simultaneously incorporated sulfoniums and phenylboronic acid moieties. The co-assembly of this cationic polymer and protein generated micelles with an H2O2-and ATP-responsive release profile.

scholarly journals Mesoporous Titanium Oxynitride Monoliths from Block Copolymer-Directed Self-Assembly of Metal–Urea Additives

Langmuir ◽  
2020 ◽  
Vol 36 (36) ◽  
pp. 10803-10810
Author(s):  
Yun Li ◽  
Raymond Horia ◽  
Wei Xin Tan ◽  
Nathawat Larbaram ◽  
Wardhana A. Sasangka ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly

Synthesis of azobenzene-containing liquid crystalline block copolymer nanoparticles via polymerization induced hierarchical self-assembly

2021 ◽  
Author(s):  
Wei Wen ◽  
Wangqi Ouyang ◽  
Song Guan ◽  
Aihua Chen
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Liquid Crystalline ◽  
Facile Synthesis ◽  
Liquid Crystalline Nanoparticles

A facile synthesis of non-spherical photoresponsive azobenzene-containing liquid crystalline nanoparticles via polymerization-induced hierarchical self-assembly (PIHSA).

Synthesis of PMMA-b-PS Block Copolymer by Emulsion ATRP and its Self-Assembly Property

2013 ◽  
Vol 705 ◽  
pp. 115-119
Author(s):  
Bao Yong Tian ◽  
Er Jun Tang ◽  
Miao Yuan ◽  
Rui Xia Hao ◽  
Cun Man Li ◽  
...  
Keyword(s):  
Drug Delivery ◽  
Block Copolymer ◽  
Self Assembly ◽  
Potential Application ◽  
Morphological Characteristic ◽  
Living Polymerization ◽  
The Self ◽  
Emulsion System ◽  
Copolymer Concentration ◽  
Ft Ir

The well-defined block copolymer PMMA-b-PS was prepared by two-step ATRP in emulsion system. GPC results indicate that Mn increased linearly with conversion and polydispersity remained relatively narrow. It presents the characteristics of living polymerization in emulsion system. FT-IR demonstrated that block copolymer PMMA-b-PS could be successfully synthesized by ATRP with macroinitiator PMMA-Cl in emulsion system. The morphological characteristic of the self-assembly depends on the block copolymer concentration and transforms between spheres and rodlike micelles. The property indicates a perfect potential application in drug delivery materials.

scholarly journals Photonic Particles Made by the Confined Self‐Assembly of a Supramolecular Comb‐Like Block Copolymer

2021 ◽  
pp. 2100522
Author(s):  
Guillaume Moriceau ◽  
Cédric Kilchoer ◽  
Kenza Djeghdi ◽  
Christoph Weder ◽  
Ullrich Steiner ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly
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