The stability of the SEI layer, surface composition and the oxidation state of transition metals at the electrolyte–cathode interface impacted by the electrochemical cycling: X-ray photoelectron spectroscopy investigation

2012 ◽  
Vol 14 (35) ◽  
pp. 12321 ◽  
Author(s):  
Gennady Cherkashinin ◽  
Kristian Nikolowski ◽  
Helmut Ehrenberg ◽  
Susanne Jacke ◽  
Lucangelo Dimesso ◽  
...  
Keyword(s):  
Transition Metals ◽  
Oxidation State ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Layer Surface ◽  
X Ray ◽  
Sei Layer ◽  
Electrochemical Cycling ◽  
The Stability ◽  
Electrolyte Cathode

The stability of the surface of La2CuO4 to reactions with adsorbed n-butyl amine: X-ray photoelectron spectroscopy study

1994 ◽  
Vol 9 (5) ◽  
pp. 1140-1146 ◽  
Author(s):  
S. Badrinarayanan ◽  
A.B. Mandale ◽  
S.R. Sainkar ◽  
N.R. Pavaskar ◽  
V. Ramaswamy
Keyword(s):  
Original Composition ◽  
Stainless Steel ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Ternary Oxide ◽  
Spectroscopy Study ◽  
X Ray ◽  
Butyl Amine ◽  
The Stability

The reaction of n-butyl amine adsorbed on the ternary oxide La2CuO4 has been studied by x-ray photoelectron spectroscopy (XPS), paying special attention to the surface composition. We suggest that n-butyl amine reacting with La2CuO4 reduces CuO to Cu2O. The reaction is confined to the surface because the original composition of the material could be restored after in situ scraping with a stainless steel blade.

Interactions of Ge Atoms with High- ê Oxide Dielectric Surfaces

2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Oxide Layer ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Temperature Programmed Desorption ◽  
Tungsten Filament ◽  
X Ray ◽  
Dielectric Surfaces ◽  
Temperature Programmed ◽  
The Stability ◽  
Ge Nanocrystals

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.

CO2 Reduction to Propanol by Copper Foams: A Pre- and Post-Catalysis Study

2020 ◽  
Author(s):  
Jennifer A. Rudd ◽  
Ewa Kazimierska ◽  
Louise B. Hamdy ◽  
Odin Bain ◽  
Sunyhik Ahn ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Photoelectron Spectroscopy ◽  
Carbon Capture ◽  
Surface Composition ◽  
Co2 Reduction ◽  
Structural Rearrangement ◽  
Copper Electrode ◽  
Ex Situ ◽  
X Ray ◽  
Copper Electrodes

The utilization of carbon dioxide is a major incentive for the growing field of carbon capture. Carbon dioxide could be an abundant building block to generate higher value products. Herein, we describe the use of porous copper electrodes to catalyze the reduction of carbon dioxide into higher value products such as ethylene, ethanol and, notably, propanol. For <i>n</i>-propanol production, faradaic efficiencies reach 4.93% at -0.83 V <i>vs</i> RHE, with a geometric partial current density of -1.85 mA/cm<sup>2</sup>. We have documented the performance of the catalyst in both pristine and urea-modified foams pre- and post-electrolysis. Before electrolysis, the copper electrode consisted of a mixture of cuboctahedra and dendrites. After 35-minute electrolysis, the cuboctahedra and dendrites have undergone structural rearrangement. Changes in the interaction of urea with the catalyst surface have also been observed. These transformations were characterized <i>ex-situ</i> using scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. We found that alterations in the morphology, crystallinity, and surface composition of the catalyst led to the deactivation of the copper foams.

scholarly journals Dual Light- and pH-Responsive Composite of Polyazo-Derivative Grafted Cellulose Nanocrystals

Materials ◽  
2018 ◽  
Vol 11 (9) ◽  
pp. 1725 ◽  
Author(s):  
Xiaohong Liu ◽  
Ming Li ◽  
Xuemei Zheng ◽  
Elias Retulainen ◽  
Shiyu Fu
Keyword(s):  
Cellulose Nanocrystals ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray Diffraction ◽  
Responsive Materials ◽  
X Ray ◽  
Ph Response ◽  
Transmission Electron ◽  
Ft Ir ◽  
Hexyl Methacrylate

As a type of functional group, azo-derivatives are commonly used to synthesize responsive materials. Cellulose nanocrystals (CNCs), prepared by acid hydrolysis of cotton, were dewatered and reacted with 2-bromoisobuturyl bromide to form a macro-initiator, which grafted 6-[4-(4-methoxyphenyl-azo) phenoxy] hexyl methacrylate (MMAZO) via atom transfer radical polymerization. The successful grafting was supported by Fourier transform infrared spectroscopy (FT-IR) and Solid magnetic resonance carbon spectrum (MAS 13C-NMR). The morphology and surface composition of the poly{6-[4-(4-methoxyphenylazo) phenoxy] hexyl methacrylate} (PMMAZO)-grafted CNCs were confirmed with Transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The grafting rate on the macro-initiator of CNCs was over 870%, and the polydispersities of branched polymers were narrow. The crystal structure of CNCs did not change after grafting, as determined by X-ray diffraction (XRD). The polymer PMMAZO improved the thermal stability of cellulose nanocrystals, as shown by thermogravimetry analysis (TGA). Then the PMMAZO-grafted CNCs were mixed with polyurethane and casted to form a composite film. The film showed a significant light and pH response, which may be suitable for visual acid-alkali measurement and reversible optical storage.

Surface Composition of Free Mixed NaCl/Na2SO4 Nanoscale Aerosols Probed by X-ray Photoelectron Spectroscopy

2018 ◽  
Vol 122 (10) ◽  
pp. 2695-2702 ◽  
Author(s):  
E. Antonsson ◽  
C. Raschpichler ◽  
B. Langer ◽  
D. Marchenko ◽  
E. Rühl
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray

Surface composition and electronic structure of Ni2+xMn1−xGa studied by X-ray photoelectron spectroscopy

2006 ◽  
Vol 600 (18) ◽  
pp. 3749-3752 ◽  
Author(s):  
C. Biswas ◽  
S. Banik ◽  
A.K. Shukla ◽  
R.S. Dhaka ◽  
V. Ganesan ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
X Ray

scholarly journals Succinic acid in aqueous solution: connecting microscopic surface composition and macroscopic surface tension

2014 ◽  
Vol 16 (39) ◽  
pp. 21486-21495 ◽  
Author(s):  
Josephina Werner ◽  
Jan Julin ◽  
Maryam Dalirian ◽  
Nønne L. Prisle ◽  
Gunnar Öhrwall ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Surface Tension ◽  
Succinic Acid ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Md Simulations ◽  
Vapor Interface ◽  
X Ray ◽  
Ph Values ◽  
Microscopic Surface

The water–vapor interface of aqueous solutions of succinic acid, where pH values and bulk concentrations were varied, has been studied using surface sensitive X-ray photoelectron spectroscopy (XPS) and molecular dynamics (MD) simulations.

Effect of Microstructural Characteristics of Electroless Nickel Metallisation on Solderability to Pb-Free Solder Alloys

2005 ◽  
Author(s):  
Changqing Liu ◽  
David A. Hutt ◽  
Dezhi Li ◽  
Paul P. Conway
Keyword(s):  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Bulk Composition ◽  
Industrial Process ◽  
Surface Characteristics ◽  
Electroless Nickel ◽  
X Ray ◽  
N2 Atmosphere ◽  
Different Temperatures ◽  
Free Solder

This paper aims to gain an insight into the correlation between the microstructure and surface composition of electroless Ni-P and its behaviour during soldering with Pb free alloys including Sn-3.8Ag-0.7Cu, Sn-3.5Ag and Sn-0.7Cu. Ni-P coatings with different P contents were produced through an industrial process on copper metal substrates. The surface morphology of these coatings was observed by Scanning Electron Microscopy (SEM) and the bulk composition was analyzed by means of Energy Dispersive X-ray analysis (EDX). The mechanical properties of the coatings were evaluated by nano-indentation testing under different maximum loads. However, to understand the behaviour of P in Ni-P coatings and deterioration of the coating surfaces during exposure to air, the surfaces of the coatings were also characterised by X-ray Photoelectron Spectroscopy (XPS) for storage at different temperatures. The dependence of the solderability of Ni-P coatings on the storage time and temperature was investigated by wetting balance testing, using an inactive or active flux with or without an inert N2 atmosphere. Finally, the solderability of Ni-P coatings to Pb free solders is correlated with their composition and microstructure (e.g. surface characteristics).

Carbon Supported Pt+Os Catalysts for Methanol Oxidation

2002 ◽  
Vol 57 (2) ◽  
pp. 193-201 ◽  
Author(s):  
Gülsün Gökağaç ◽  
Brendan J. Kennedy
Keyword(s):  
Methanol Oxidation ◽  
Photoelectron Spectroscopy ◽  
Surface Composition ◽  
Carbon Support ◽  
Methanol Oxidation Reaction ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Metal Metal ◽  
Metal Support

11% Pt/C, 10% Pt + 1%Os/C, 9% Pt + 2%Os/C, 8% Pt + 3%Os/C, 7% Pt + 4%Os/C, 6% Pt + 5%Os/C and 5%Pt + 6% Os/C catalysts have been prepared for methanol oxidation reaction. Transmission electron microscopy, X-ray photoelectron spectroscopy, X-ray diffraction and cyclic voltammetry have been used to understand the nature of the species present in these catalysts. 7% Pt + 4% Os/C was the most active catalyst, while 8% Pt + 3% Os/C was the least active one. It is found that the metal particle size and distribution on the carbon support, the surface composition and the oxidation states of the metal particles, the metal-metal and metal support interactions are important parameters to define the activity of the catalyst.

CVD Boron Carbo-Nitride as Pore Sealant for Ultra Low-K Interlayer Dielectrics

2005 ◽  
Vol 863 ◽  
Author(s):  
P. Ryan Fitzpatrick ◽  
Sri Satyanarayana ◽  
Yangming Sun ◽  
John M. White ◽  
John G. Ekerdt
Keyword(s):  
Photoelectron Spectroscopy ◽  
Depth Profiling ◽  
Chemical Vapor ◽  
K Value ◽  
X Ray ◽  
Dimethylamine Borane ◽  
The Stability ◽  
Low K ◽  
Secondary Ion ◽  
Sims Depth Profiling

AbstractBlanket porous methyl silsesquioxane (pMSQ) films on a Si substrate were studied with the intent to seal the pores and prevent penetration of a metallic precursor during barrier deposition. The blanket pMSQ films studied were approximately 220 nm thick and had been etched and ashed. When tantalum pentafluoride (TaF5) is exposed to an unsealed pMSQ sample, X-ray photoelectron spectroscopy (XPS) depth profiling and secondary ion mass spectroscopy (SIMS) depth profiling reveal penetration of Ta into the pores all the way to the pMSQ / Si interface. Boron carbo-nitride films were grown by thermal chemical vapor deposition (CVD) using dimethylamine borane (DMAB) precursor with Ar carrier gas and C2H4 coreactant. These films had a stoichiometry of BC0.9N0.07 and have been shown in a previous study to have a k value as low as 3.8. BC0.9N0.07 films ranging from 1.8 to 40.6 nm were deposited on pMSQ and then exposed to TaF5 gas to determine the extent of Ta penetration into the pMSQ. Ta penetration was determined by XPS depth profiling and sometimes SIMS depth profiling. XPS depth profiling of a TaF5 / 6.3 nm BC0.9N0.07 / pMSQ / Si film stack indicates the attenuation of the Ta signal to < 2 at. % throughout the pMSQ. Backside SIMS of this sample suggests that trace amounts of Ta (< 2 at. %) are due to knock-in by Ar ions used for sputtering. An identical film stack containing 3.9 nm BC0.9N0.07 was also successful at inhibiting Ta penetration even with a 370°C post-TaF5 exposure anneal, suggesting the stability of BC0.9N0.07 to thermal diffusion of Ta. All BC0.9N0.07 films thicker than and including 3.9 nm prevented Ta from penetrating into the pMSQ.

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