scholarly journals Morphological phase separation in unstable thin films: pattern formation and growth

2011 ◽  
Vol 13 (30) ◽  
pp. 13598 ◽  
Author(s):  
Prabhat K. Jaiswal ◽  
Manish Vashishtha ◽  
Sanjay Puri ◽  
Rajesh Khanna
Keyword(s):  
Thin Films ◽  
Phase Separation ◽  
Pattern Formation

Complex pattern formation by phase separation of polymer blends in thin films

1999 ◽  
Vol 112 ◽  
pp. 285-297 ◽  
Author(s):  
Jochen S. Gutmann ◽  
Peter Müller-Buschbaum ◽  
Manfred Stamm
Keyword(s):  
Thin Films ◽  
Phase Separation ◽  
Pattern Formation ◽  
Polymer Blends ◽  
Complex Pattern

Coarsening and pattern formation during true morphological phase separation in unstable thin films under gravity

2017 ◽  
Vol 96 (6) ◽  
Author(s):  
Avanish Kumar ◽  
Chaitanya Narayanam ◽  
Rajesh Khanna ◽  
Sanjay Puri
Keyword(s):  
Thin Films ◽  
Phase Separation ◽  
Pattern Formation

scholarly journals Phase Separation and Pattern Formation in Polymer Blends.

Kobunshi ◽  
1992 ◽  
Vol 41 (11) ◽  
pp. 790-793
Author(s):  
Hajime Tanaka
Keyword(s):  
Phase Separation ◽  
Pattern Formation ◽  
Polymer Blends

Oxygen off-stoichiometry and phase separation in EuO thin films

2011 ◽  
Vol 84 (15) ◽  
Author(s):  
S. G. Altendorf ◽  
A. Efimenko ◽  
V. Oliana ◽  
H. Kierspel ◽  
A. D. Rata ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Separation

Phase Separation and Molecular Intermixing in Polymer–Fullerene Bulk Heterojunction Thin Films

2012 ◽  
Vol 3 (6) ◽  
pp. 683-688 ◽  
Author(s):  
Matthias A. Ruderer ◽  
Robert Meier ◽  
Lionel Porcar ◽  
Robert Cubitt ◽  
Peter Müller-Buschbaum
Keyword(s):  
Thin Films ◽  
Phase Separation ◽  
Bulk Heterojunction

Investigation on the Thermal and Electrical Properties of Ti-Si-O Film Formed by the Composite Sputtering Deposition

2001 ◽  
Vol 670 ◽  
Author(s):  
Akira Nishiyama ◽  
Akio Kaneko ◽  
Masato Koyama ◽  
Yoshiki Kamata ◽  
Ikuo Fujiwara ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Phase Separation ◽  
Nanocrystalline Film ◽  
Post Deposition Annealing ◽  
Current Increase ◽  
Sputtering Deposition ◽  
Thermal And Electrical Properties ◽  
Sputter Deposited ◽  
Post Deposition

ABSTRACTTi-Si-O films were sputter deposited from TiO2+SiO2 composite targets with various SiO2 content. The phase separation occurred for every SiO2 content used in this experiment (from 14% to 75%) and it has been revealed that nanocrystalline (TiO2)1-x(SiO2)x films in which anatase TiO2 forms tiny grains were obtained when x in the film is larger than 0.26. The tiny grain was effective for suppressing the thermal grooving phenomenon of the thin films by the post deposition annealing which leads to the leakage current increase. The dielectric constant of the nanocrystalline film was varied with the SiO2 content from the value of the bulk anatase to SiO2.

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