Near-surface and internal lamellar structure and orientation in thin films of rod–coil block copolymers

Soft Matter ◽  
2009 ◽  
Vol 5 (1) ◽  
pp. 182-192 ◽  
Author(s):  
Bradley D. Olsen ◽  
Xuefa Li ◽  
Jin Wang ◽  
Rachel A. Segalman
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Lamellar Structure ◽  
Near Surface

Finely tuned digital memory modes and performances in diblock copolymer devices by well-defined lamellar structure formation and orientation control

2016 ◽  
Vol 4 (10) ◽  
pp. 2017-2027 ◽  
Author(s):  
Dongwoo Wi ◽  
Jonghyun Kim ◽  
Hoyeol Lee ◽  
Nam-Goo Kang ◽  
Jinseok Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Structure Formation ◽  
Diblock Copolymer ◽  
Lamellar Structure ◽  
Process Condition ◽  
Orientation Control ◽  
Digital Memory ◽  
Permanent Memory ◽  
Volatile Memory

Block copolymers bearing carbazole moieties in thin films nicely demonstrated vertical or horizontal lamellar structure depending on the process condition. The vertical lamellar structure revealed permanent memory behavior, where the horizontal lamellar structure exhibited volatile memory behavior.

Bulk and near-surface magnetic properties of FeRh thin films

2008 ◽  
Vol 103 (7) ◽  
pp. 07B515 ◽  
Author(s):  
Y. Ding ◽  
D. A. Arena ◽  
J. Dvorak ◽  
M. Ali ◽  
C. J. Kinane ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Near Surface

scholarly journals Role of dissimilar interfaces in thin films of cylinder-forming block copolymers

2004 ◽  
Vol 120 (2) ◽  
pp. 1127-1137 ◽  
Author(s):  
K. S. Lyakhova ◽  
G. J. A. Sevink ◽  
A. V. Zvelindovsky ◽  
A. Horvat ◽  
R. Magerle
Keyword(s):  
Thin Films ◽  
Block Copolymers

Highly ordered nanoporous thin films by blending of PSt-b-PMMA block copolymers and PEO additives as structure directing agents

2008 ◽  
Vol 46 (24) ◽  
pp. 8041-8048 ◽  
Author(s):  
Sung Chan Park ◽  
Hyunjung Jung ◽  
Ken-ichi Fukukawa ◽  
Luis M. Campos ◽  
Kyunghee Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Structure Directing Agents

Hexagonally ordered arrays of metallic nanodots from thin films of functional block copolymers

Polymer ◽  
2010 ◽  
Vol 51 (12) ◽  
pp. 2661-2667 ◽  
Author(s):  
E. Bhoje Gowd ◽  
Bhanu Nandan ◽  
Nadja C. Bigall ◽  
Alexander Eychmüller ◽  
Petr Formanek ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Ordered Arrays ◽  
Functional Block ◽  
Hexagonally Ordered ◽  
Functional Block Copolymers

scholarly journals Fractionation of block copolymers for pore size control and reduced dispersity in mesoporous inorganic thin films

Nanoscale ◽  
2020 ◽  
Vol 12 (35) ◽  
pp. 18455-18462
Author(s):  
Alberto Alvarez-Fernandez ◽  
Barry Reid ◽  
Jugal Suthar ◽  
Swan Yia Choy ◽  
Maximiliano Jara Fornerod ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymers ◽  
Pore Size ◽  
Size Control ◽  
Widespread Application ◽  
Inorganic Thin Films ◽  
Pore Size Control

Inorganic mesoporous coatings find widespread application. In many cases, control over the pore dimensions is of paramount importance. To this end, we establish a powerful route to pore size and dispersity control.

scholarly journals Porous Ultra-Thin Films from Photocleavable Block Copolymers: In-Situ Degradation Kinetics Study of Pore Material

Polymers ◽  
2020 ◽  
Vol 12 (4) ◽  
pp. 781 ◽  
Author(s):  
Sedakat Altinpinar ◽  
Wael Ali ◽  
Patrick Schuchardt ◽  
Pinar Yildiz ◽  
Hui Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Polymer Film ◽  
Uv Exposure ◽  
Significant Information ◽  
X Ray ◽  
Washing Process

On the basis of the major application for block copolymers to use them as separation membranes, lithographic mask, and as templates, the preparation of highly oriented nanoporous thin films requires the selective removal of the minor phase from the pores. In the scope of this study, thin film of polystyrene-block-poly(ethylene oxide) block copolymer with a photocleavable junction groups based on ortho-nitrobenzylester (ONB) (PS-hν-PEO) was papered via the spin coating technique followed by solvent annealing to obtain highly-ordered cylindrical domains. The polymer blocks are cleaved by means of a mild UV exposure and then the pore material is washed out of the polymer film by ultra-pure water resulting in arrays of nanoporous thin films to remove one block. The removal of the PEO materials from the pores was proven using the grazing-incidence small-angle X-ray scattering (GISAXS) technique. The treatment of the polymer film during the washing process was observed in real time after two different UV exposure time (1 and 4 h) in order to draw conclusions regarding the dynamics of the removal process. In-situ X-ray reflectivity measurements provide statistically significant information about the change in the layer thickness as well as the roughness and electron density of the polymer film during pore formation. 4 H UV exposure was found to be more efficient for PEO cleavage. By in-situ SFM measurements, the structure of the ultra-thin block copolymer films was also analysed and, thus, the kinetics of the washing process was elaborated. The results from both measurements confirmed that the washing procedure induces irreversible change in morphology to the surface of the thin film.

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