Ultraviolet photochemistry of trichlorovinylsilane and allyltrichlorosilane: vinyl radical (HCCH2) and allyl radical (H2CCHCH2) production in 193 nm photolysis

2006 ◽  
Vol 8 (19) ◽  
pp. 2240 ◽  
Author(s):  
John D. DeSain ◽  
Leonard E. Jusinski ◽  
Craig A. Taatjes
Keyword(s):  
Allyl Radical ◽  
Vinyl Radical ◽  
193 Nm

Excimer Projection Lithography at 193-nm Wavelength

1988 ◽  
Author(s):  
M. Rothschild ◽  
D. J. Ehrlich
Keyword(s):  
Projection Lithography ◽  
193 Nm

Mass spectrometric study of allyl radical, allyl bromide and 1,5-hexadiene interactions with oxides; Cobalt suboxide Co3O4

1979 ◽  
Vol 44 (7) ◽  
pp. 2009-2014 ◽  
Author(s):  
Jana Nováková ◽  
Zdeněk Dolejšek
Keyword(s):  
Room Temperature ◽  
Allyl Bromide ◽  
Catalytic Properties ◽  
Mass Spectrometric Study ◽  
Spectrometric Study ◽  
Flow Conditions ◽  
Allyl Radical ◽  
Knudsen Flow ◽  
Thermally Activated ◽  
Radical Interaction

Products of (a) allyl radical interaction with unheated Co3O4, (b) thermally activated 1,5-hexadiene or thermally activated allyl bromide with unheated Co3O4, (c) moderately heated Co3O4 with unheated 1,5-hexadiene or allyl bromide were studied under Knudsen flow conditions. Cobalt suboxide Co3O4, a typical catalyst of deep oxidations yielded acrolein in reaction with allyl radicals as early as at the room temperature of the catalyst. A similar acrolein formation was also observed in the allyl radical interaction with other oxides exhibiting different catalytic properties. It appears that acrolein is in general the primary product of the allyl radical interaction with the oxides. The results are discussed and compared with previous data obtained with MoO3.

Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

1994 ◽  
Vol 30 (14) ◽  
pp. 1133-1134 ◽  
Author(s):  
P. E. Dyer ◽  
K. C. Byron ◽  
R. J. Farley ◽  
R. Giedl
Keyword(s):  
Bragg Grating ◽  
Fibre Bragg Grating ◽  
Arf Laser ◽  
193 Nm

Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

2003 ◽  
Vol 150 (1) ◽  
pp. G58 ◽  
Author(s):  
Sang-Yun Lee ◽  
Yong-Bae Kim ◽  
Jeong Soo Byun
Keyword(s):  
Antireflection Coating ◽  
Dual Damascene ◽  
Damascene Process ◽  
193 Nm

Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

2012 ◽  
Vol 447 (1) ◽  
pp. 267-272 ◽  
Author(s):  
N. N. Vtyurina ◽  
S. L. Grohovsky ◽  
A. B. Vasiliev ◽  
I. I. Titov ◽  
P. M. Ponomarenko ◽  
...  
Keyword(s):  
Dna Damage ◽  
Laser Beam ◽  
Ultraviolet Laser ◽  
193 Nm

C–Br bond rupture in 193 nm photodissociation of vinyl bromide

1998 ◽  
Vol 231 (2-3) ◽  
pp. 345-353 ◽  
Author(s):  
Hideki Katayanagi ◽  
Nobuaki Yonekuira ◽  
Toshinori Suzuki
Keyword(s):  
Bond Rupture ◽  
Vinyl Bromide ◽  
193 Nm

Advantages of using the 223-nm compared with 193-nm radiation wavelength for ophthalmic applications

2002 ◽  
Author(s):  
Sergei N. Bagayev ◽  
Alexander M. Razhev ◽  
Andrey A. Zhupikov ◽  
Evgeny S. Kargapoltsev
Keyword(s):  
Radiation Wavelength ◽  
193 Nm
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