Ion flux and deposition rate measurements in the RF continuous wave plasma polymerisation of acrylic acid

1998 ◽  
pp. 1221-1222 ◽  
Author(s):  
A. J. Beck ◽  
R. M. France ◽  
A. M. Leeson ◽  
R. D. Short ◽  
R. M. France ◽  
...  
Keyword(s):  
Acrylic Acid ◽  
Deposition Rate ◽  
Continuous Wave ◽  
Ion Flux ◽  
Plasma Polymerisation

The role of ions in the continuous-wave plasma polymerisation of acrylic acid

1999 ◽  
Vol 1 (13) ◽  
pp. 3117-3121 ◽  
Author(s):  
S Candan ◽  
A J. Beck ◽  
L O'Toole ◽  
R D. Short ◽  
A Goodyear ◽  
...  
Keyword(s):  
Acrylic Acid ◽  
Continuous Wave ◽  
Plasma Polymerisation

The effect of ion energy upon plasma polymerization deposition rate for acrylic acid

2003 ◽  
pp. 348-349 ◽  
Author(s):  
David Barton ◽  
Robert D. Short ◽  
Stuart Fraser ◽  
James W. Bradley
Keyword(s):  
Acrylic Acid ◽  
Deposition Rate ◽  
Plasma Polymerization ◽  
Ion Energy

A Mass Spectrometric and Ion Energy Study of the Continuous Wave Plasma Polymerization of Acrylic Acid

Langmuir ◽  
2000 ◽  
Vol 16 (13) ◽  
pp. 5654-5660 ◽  
Author(s):  
David B. Haddow ◽  
Richard M. France ◽  
Robert D. Short ◽  
James W. Bradley ◽  
David Barton
Keyword(s):  
Acrylic Acid ◽  
Plasma Polymerization ◽  
Continuous Wave ◽  
Mass Spectrometric ◽  
Ion Energy

Surface functionalisation of polypropylene hernia-repair meshes by RF-activated plasma polymerisation of acrylic acid and silver nanoparticles

2015 ◽  
Vol 328 ◽  
pp. 287-295 ◽  
Author(s):  
Roberto Nisticò ◽  
Andrea Rosellini ◽  
Paola Rivolo ◽  
Maria Giulia Faga ◽  
Roberta Lamberti ◽  
...  
Keyword(s):  
Silver Nanoparticles ◽  
Acrylic Acid ◽  
Hernia Repair ◽  
Surface Functionalisation ◽  
Plasma Polymerisation

Study on Bombardment Energy of Substrate Surface in Sputtering Environment by Langmuir Probe

2010 ◽  
Vol 160-162 ◽  
pp. 1839-1844
Author(s):  
Hong Tao Li ◽  
Bai Ling Jiang ◽  
Bo Yang ◽  
Zheng Cao
Keyword(s):  
Deposition Rate ◽  
Temperature Rise ◽  
Langmuir Probe ◽  
Diffusion Processes ◽  
Substrate Surface ◽  
Bulk Diffusion ◽  
Ion Flux ◽  
Neutral Atoms ◽  
Energy Accumulation ◽  
Bombardment Energy

Based on deposition rate of coatings and ion flux measured by Langmuir probe in sputtering environment, bombardment energy Ec1 of sputtered neutral atoms and bombardment energy Ec2 of bombardment ions accepted by substrate surface micro-area per unit time were calculated. The magnitude of Ec1 and Ec2 was approximately the same, surface diffusing processes of the top layer atoms in the coating were accelerated by the simultaneity action of Ec1 and Ec2, bulk diffusion processes of the atoms under the top layer in the coating were promoted by energy accumulation and temperature rise effect caused by the continuance action of Ec1 and Ec2.

Temporal Evolution of an Electron-Free Afterglow in the Pulsed Plasma Polymerisation of Acrylic Acid

2008 ◽  
Vol 112 (13) ◽  
pp. 3938-3947 ◽  
Author(s):  
Ian Swindells ◽  
Sergey A. Voronin ◽  
Paul M. Bryant ◽  
Morgan R. Alexander ◽  
James W. Bradley
Keyword(s):  
Acrylic Acid ◽  
Temporal Evolution ◽  
Pulsed Plasma ◽  
Plasma Polymerisation

Pulsed and Continuous Wave Acrylic Acid Radio Frequency Plasma Deposits:  Plasma and Surface Chemistry

2007 ◽  
Vol 111 (13) ◽  
pp. 3419-3429 ◽  
Author(s):  
Sergey A. Voronin ◽  
Mischa Zelzer ◽  
Catalin Fotea ◽  
Morgan R. Alexander ◽  
James W. Bradley
Keyword(s):  
Acrylic Acid ◽  
Surface Chemistry ◽  
Radio Frequency ◽  
Continuous Wave ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

High Deposition Rate Amorphous Silicon Solar Cells and Thin Film Transistors Using the Pulsed Plasma Pecvd Technique

1998 ◽  
Vol 507 ◽  
Author(s):  
Scott Morrison ◽  
Jianping Xi ◽  
Arun Madan
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Deposition Rate ◽  
Continuous Wave ◽  
Modulation Frequency ◽  
Thin Film Transistor ◽  
High Deposition Rate ◽  
Pulsed Plasma ◽  
Active Matrix ◽  
Active Matrix Displays

ABSTRACTThe pulsed plasma technique has been shown to increase the deposition rate without an increase in the particulate count in the plasma which is an important factor determining the yield of commercial products such as active matrix displays. In this paper, we report the deposition of amorphous silicon at deposition rates of up to 15 Å/sec, using a modulation frequency in the range of 1-100kHz. These materials have been incorporated into a simple p/i/n solar cell and thin film transistor (TFT) configurations. We report on the effect of the conversion efficiency as a function of the modulation frequency, which in turn is related to the deposition rate. We also report on the TFT performance with modulation frequency and compare the results with devices made under the conventional continuous wave PECVD plasma at 13.56MHz.

Modification of polyester fabrics byin situplasma or post-plasma polymerisation of acrylic acid

1999 ◽  
Vol 115 (9) ◽  
pp. 274-279 ◽  
Author(s):  
T Öktem ◽  
H Ayhan ◽  
N Seventekin ◽  
E Piskin
Keyword(s):  
Acrylic Acid ◽  
Polyester Fabrics ◽  
Plasma Polymerisation
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