scholarly journals Ubiquitous formation of bulk Dirac cones and topological surface states from a single orbital manifold in transition-metal dichalcogenides

2017 ◽  
Vol 17 (1) ◽  
pp. 21-28 ◽  
Author(s):  
M. S. Bahramy ◽  
O. J. Clark ◽  
B.-J. Yang ◽  
J. Feng ◽  
L. Bawden ◽  
...  
Keyword(s):  
Transition Metal ◽  
Transition Metal Dichalcogenides ◽  
Surface States ◽  
Metal Dichalcogenides ◽  
Topological Surface

P-type doping in 2M-WS2 for a complete phase diagram

2021 ◽  
Author(s):  
Chendong Zhao ◽  
Xiangli Che ◽  
Zhuang Zhang ◽  
Fu Qiang Huang
Keyword(s):  
Phase Diagram ◽  
Transition Metal ◽  
Physical Properties ◽  
Transition Metal Dichalcogenides ◽  
Surface States ◽  
Complete Phase Diagram ◽  
Metal Dichalcogenides ◽  
Topological Surface ◽  
P Type ◽  
New Phase

2M-WS2 as a new phase of transition metal dichalcogenides possesses many novel physical properties, such as superconductivity and topological surface states. The effect of n-type doping on the superconductivity of...

Valence-Mending Passivation of Si(100) Surface: Principle, Practice and Application

2015 ◽  
Vol 242 ◽  
pp. 51-60 ◽  
Author(s):  
Meng Tao
Keyword(s):  
Transition Metal ◽  
Schottky Barrier Height ◽  
New Records ◽  
Transition Metal Dichalcogenides ◽  
Surface States ◽  
Atomic Layer ◽  
Schottky Barriers ◽  
Photovoltaic Devices ◽  
Dangling Bonds ◽  
Metal Dichalcogenides

Surface states have hindered and degraded many semiconductor devices since the Bardeen era. Surface states originate from dangling bonds on the surface. This paper discusses a generic solution to surface states, i.e. valence-mending passivation. For the Si (100) surface, a single atomic layer of valence-mending sulfur, selenium or tellurium can terminate ~99% of the dangling bonds, while group VII fluorine or chlorine can terminate the remaining 1%. Valence-mending passivation of Si (100) has been demonstrated using CVD, MBE and solution passivation. The keys to valence-mending passivation include an atomically-clean Si (100) surface for passivation and precisely one monolayer of valence-mending atoms on the surface. The passivated surface exhibits unprecedented properties. Electronically the Schottky barrier height between various metals and valence-mended Si (100) now follows more closely the Mott-Schottky theory. With metals of extreme workfunctions, new records for low and high Schottky barriers are created on Si (100). The highest barrier so far is 1.14 eV, i.e. a larger-than-bandgap barrier, and the lowest barrier is below 0.08 eV and potentially negative. Chemically silicidation between metal and valence-mended Si (100) is suppressed up to 500 °C, and the thermally-stable record Schottky barriers enable their applications in nanoelectronic, optoelectronic and photovoltaic devices. Another application is transition metal dichalcogenides. Valence-mended Si (100) is an ideal starting surface for growth of dichalcogenides, as it provides only van der Waals bonding to the dichalcogenide.

scholarly journals Super-resolved Optical Mapping of Reactive Sulfur-Vacancies in Two-Dimensional Transition Metal Dichalcogenides

ACS Nano ◽  
2021 ◽  
Author(s):  
Miao Zhang ◽  
Martina Lihter ◽  
Tzu-Heng Chen ◽  
Michal Macha ◽  
Archith Rayabharam ◽  
...  
Keyword(s):  
Transition Metal ◽  
Optical Mapping ◽  
Transition Metal Dichalcogenides ◽  
Two Dimensional ◽  
Metal Dichalcogenides

Highly electroconductive and uniform WS2 film growth by sulfurization of W film using diethyl sulfide

2021 ◽  
Author(s):  
Yoobeen Lee ◽  
Jin Won Jung ◽  
Jin Seok Lee
Keyword(s):  
Transition Metal ◽  
Grain Boundaries ◽  
High Performance ◽  
Film Growth ◽  
Transition Metal Dichalcogenides ◽  
Electronic Systems ◽  
Intrinsic Defects ◽  
Diethyl Sulfide ◽  
Metal Dichalcogenides

The reduction of intrinsic defects, including vacancies and grain boundaries, remains one of the greatest challenges to produce high-performance transition metal dichalcogenides (TMDCs) electronic systems. A deeper comprehension of the...

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