scholarly journals Cavity cooling of free silicon nanoparticles in high vacuum

2013 ◽  
Vol 4 (1) ◽  
Author(s):  
Peter Asenbaum ◽  
Stefan Kuhn ◽  
Stefan Nimmrichter ◽  
Ugur Sezer ◽  
Markus Arndt
Keyword(s):  
Silicon Nanoparticles ◽  
High Vacuum ◽  
Free Silicon ◽  
Cavity Cooling

scholarly journals Laser-Fabricated Fluorescent, Ligand-Free Silicon Nanoparticles: Scale-up, Biosafety, and 3D Live Imaging of Zebrafish under Development

2018 ◽  
Vol 2 (1) ◽  
pp. 321-329 ◽  
Author(s):  
Marta d’Amora ◽  
Marina Rodio ◽  
Giuseppe Sancataldo ◽  
Alberto Diaspro ◽  
Romuald Intartaglia
Keyword(s):  
Silicon Nanoparticles ◽  
Scale Up ◽  
Live Imaging ◽  
Free Silicon ◽  
Ligand Free ◽  
Fluorescent Ligand

Alkyl-Functionalized Oxide-Free Silicon Nanoparticles: Synthesis and Optical Properties

Small ◽  
2008 ◽  
Vol 4 (10) ◽  
pp. 1835-1841 ◽  
Author(s):  
Milena Rosso-Vasic ◽  
Evan Spruijt ◽  
Barend van Lagen ◽  
Luisa De Cola ◽  
Han Zuilhof
Keyword(s):  
Optical Properties ◽  
Silicon Nanoparticles ◽  
Free Silicon ◽  
Nanoparticles Synthesis

Femtosecond ionization and fragmentation of free silicon nanoparticles

2000 ◽  
Vol 71 (3) ◽  
pp. 373-379 ◽  
Author(s):  
B. Bescós ◽  
R. Hoch ◽  
H.-J. Schmidtke ◽  
G. Gerber
Keyword(s):  
Silicon Nanoparticles ◽  
Free Silicon

scholarly journals Alkyl-Functionalized Oxide-Free Silicon Nanoparticles: Synthesis and Optical Properties

Small ◽  
2009 ◽  
Vol 5 (23) ◽  
pp. NA-NA ◽  
Author(s):  
M. Rosso-Vasic ◽  
E. Spruijt ◽  
B. van Lagen ◽  
L. De Cola ◽  
Han Zuilhof
Keyword(s):  
Optical Properties ◽  
Silicon Nanoparticles ◽  
Free Silicon ◽  
Nanoparticles Synthesis

Morphology and Laser-Induced Photochemistry of Silicon and Nickel Nanoparticles

2014 ◽  
Vol 605 ◽  
pp. 593-596
Author(s):  
Y.N. Parkhomenko ◽  
A.I. Belogorokhov ◽  
A.P. Bliev ◽  
V.G. Sozanov ◽  
A.G. Kaloeva ◽  
...  
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Silicon Nanoparticles ◽  
High Vacuum ◽  
Nanocrystalline Silicon ◽  
Ultra High Vacuum ◽  
Aluminum Oxide Film ◽  
Photon Irradiation ◽  
Oxide Support ◽  
Nanosecond Pulsed Laser

The structural and photoinduced properties of silicon nanoparticles obtained by plasmachemical and electrolytic techniques and the nickel particles deposited on aluminum oxide film in ultra-high vacuum are investigated by Auger electron spectroscopy, transmission electron microscopy, Fourier-transform infrared spectroscopy and time-of-flight spectroscopy. It is found that substantial increase of silicon nanoparticle photoinduced luminescence can be attributed to particle specific structure, as well as to the SiO2thin film which is formed on the nanocrystalline silicon surface. In case of Ni particles deposited on aluminum oxide film at low mean coverage of about 0.04 monolayers, when the film can be viewed as consisting of separated single adsorbed atoms or very small clusters, the photon irradiation by nanosecond pulsed laser leads to NO desorption. At monolayer Ni coverage formed at a substrate temperature of 80 K laser irradiation causes dissociation of NO molecules. Efficiency of this process at the initial stage is notably enhanced compared to that of NO on the bulk Ni (111) crystal. This enhancement can be attributed to the effect of underlying aluminum oxide support.

Replication of Wet Objects and Cells

1974 ◽  
Vol 32 ◽  
pp. 102-103
Author(s):  
S. Basu ◽  
D. F. Parsons
Keyword(s):  
Water Vapor Pressure ◽  
High Vacuum ◽  
Polystyrene Latex ◽  
Vacuum System ◽  
Saturated Water Vapor ◽  
Replication Method ◽  
New Methods ◽  
Saturated Water ◽  
Water Vapors ◽  
Intermediate Chamber

We are approaching the invasiveness of cancer cells from the studies of their wet surface morphology which should distinguish them from their normal counterparts. In this report attempts have been made to provide physical basis and background work to a wet replication method with a differentially pumped hydration chamber (Fig. 1) (1,2), to apply this knowledge for obtaining replica of some specimens of known features (e.g. polystyrene latex) and finally to realize more specific problems and to improvize new methods and instrumentation for their rectification. In principle, the evaporant molecules penetrate through a pair of apertures (250, 350μ), through water vapors and is, then, deposited on the specimen. An intermediate chamber between the apertures is pumped independently of the high vacuum system. The size of the apertures is sufficiently small so that full saturated water vapor pressure is maintained near the specimen.

Thin Pyrolytic Graphite Films for Electron Microscope Substrates

1971 ◽  
Vol 29 ◽  
pp. 226-227 ◽  
Author(s):  
George H. N. Riddle ◽  
Benjamin M. Siegel
Keyword(s):  
Vacuum Chamber ◽  
Pyrolytic Graphite ◽  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Graphite Substrate ◽  
Nickel Substrate ◽  
Routine Procedure ◽  
Field Electron Microscopy ◽  
Dark Field Electron

A routine procedure for growing very thin graphite substrate films has been developed. The films are grown pyrolytically in an ultra-high vacuum chamber by exposing (111) epitaxial nickel films to carbon monoxide gas. The nickel serves as a catalyst for the disproportionation of CO through the reaction 2C0 → C + CO2. The nickel catalyst is prepared by evaporation onto artificial mica at 400°C and annealing for 1/2 hour at 600°C in vacuum. Exposure of the annealed nickel to 1 torr CO for 3 hours at 500°C results in the growth of very thin continuous graphite films. The graphite is stripped from its nickel substrate in acid and mounted on holey formvar support films for use as specimen substrates.The graphite films, self-supporting over formvar holes up to five microns in diameter, have been studied by bright and dark field electron microscopy, by electron diffraction, and have been shadowed to reveal their topography and thickness. The films consist of individual crystallites typically a micron across with their basal planes parallel to the surface but oriented in different, apparently random directions about the normal to the basal plane.

A High Voltage Electron Microscopy Study of Sub-Oxide Formation in Vanadium

1971 ◽  
Vol 29 ◽  
pp. 212-213
Author(s):  
R. H. Geiss ◽  
R. L. Ladd ◽  
K. R. Lawless
Keyword(s):  
High Vacuum ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Ultra High Vacuum ◽  
Pure Oxygen ◽  
Pressure Oxidation ◽  
High Voltage Electron Microscopy ◽  
Oxidation Study ◽  
Voltage Electron ◽  
Good Agreement

Detailed electron microscope and diffraction studies of the sub-oxides of vanadium have been reported by Cambini and co-workers, and an oxidation study, possibly complicated by carbon and/or nitrogen, has been published by Edington and Smallman. The results reported by these different authors are not in good agreement. For this study, high purity polycrystalline vanadium samples were electrochemically thinned in a dual jet polisher using a solution of 20% H2SO4, 80% CH3OH, and then oxidized in an ion-pumped ultra-high vacuum reactor system using spectroscopically pure oxygen. Samples were oxidized at 350°C and 100μ oxygen pressure for periods of 30,60,90 and 160 minutes. Since our primary interest is in the mechanism of the low pressure oxidation process, the oxidized samples were cooled rapidly and not homogenized. The specimens were then examined in the HVEM at voltages up to 500 kV, the higher voltages being necessary to examine thick sections for which the oxidation behavior was more characteristic of the bulk.

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