Fine structure of low-energy H+in the nightside auroral region

1994 ◽  
Vol 99 (A3) ◽  
pp. 4131 ◽  
Author(s):  
Chao Liu ◽  
J. D. Perez ◽  
T. E. Moore ◽  
C. R. Chappell ◽  
J. A. Slavin
1985 ◽  
Vol 32 (10) ◽  
pp. 6131-6137 ◽  
Author(s):  
J.-M. Baribeau ◽  
J.-D. Carette ◽  
P. J. Jennings ◽  
R. O. Jones

2017 ◽  
Vol 35 (4) ◽  
pp. 869-877 ◽  
Author(s):  
Rikard Slapak ◽  
Maria Hamrin ◽  
Timo Pitkänen ◽  
Masatoshi Yamauchi ◽  
Hans Nilsson ◽  
...  

Abstract. Recent studies strongly suggest that a majority of the observed O+ cusp outflows will eventually escape into the solar wind, rather than be transported to the plasma sheet. Therefore, an investigation of plasma sheet flows will add to these studies and give a more complete picture of magnetospheric ion dynamics. Specifically, it will provide a greater understanding of atmospheric loss. We have used Cluster spacecraft 4 to quantify the H+ and O+ total transports in the near-Earth plasma sheet, using data covering 2001–2005. The results show that both H+ and O+ have earthward net fluxes of the orders of 1026 and 1024 s−1, respectively. The O+ plasma sheet return flux is 1 order of magnitude smaller than the O+ outflows observed in the cusps, strengthening the view that most ionospheric O+ outflows do escape. The H+ return flux is approximately the same as the ionospheric outflow, suggesting a stable budget of H+ in the magnetosphere. However, low-energy H+, not detectable by the ion spectrometer, is not considered in our study, leaving the complete magnetospheric H+ circulation an open question. Studying tailward flows separately reveals a total tailward O+ flux of about 0. 5 × 1025 s−1, which can be considered as a lower limit of the nightside auroral region O+ outflow. Lower velocity flows ( < 100 km s−1) contribute most to the total transports, whereas the high-velocity flows contribute very little, suggesting that bursty bulk flows are not dominant in plasma sheet mass transport.


1989 ◽  
Vol 67 (4) ◽  
pp. 358-364 ◽  
Author(s):  
G. W. Johnson ◽  
D. E. Brodie ◽  
E. D. Crozier

In this study, thin films of germanium have been vacuum deposited in four regimes. Care was taken to prepare reproducible films, which required that the partial pressure of water be below 10−8 Torr during deposition (1 Torr = 133.3 Pa). First, films deposited onto substrates held during deposition at a temperature Ts that is below 473 K are amorphous. Once annealed above 423 K, their electrical conductivity and optical band gap are independent of deposition temperature and rate, and of whether or not low-energy electron irradiation of the substrate is used during deposition. This suggests that a well-defined and reproducible structure is being prepared. Second, a "precrystallization regime" is obtained when Ts is between 473 and 513 K. Extended X-ray adsorption fine-structure and X-ray diffraction confirm that this regime is a two-phase mixture of amorphous material and crystallites. Third, films deposited with Ts near 513 K, while using low-energy electrons to bombard the substrate, are amorphous, but these films have different electrical and optical properties from the films m the first regime. From this, we infer that a second well-defined amorphous structure exists. Fourth, films deposited with Ts above 513 K are polycrystalline. Extended X-ray adsorption fine-structure and X-ray adsorption near-edge structure could not distinguish between the two amorphous materials in the first and third regimes.


2001 ◽  
Vol 63 (10) ◽  
Author(s):  
R. Manzke ◽  
R. Müller ◽  
C. Janowitz ◽  
M. Schneider ◽  
A. Krapf ◽  
...  

2010 ◽  
Vol 82 (6) ◽  
Author(s):  
Sultana N. Nahar ◽  
Maximiliano Montenegro ◽  
Werner Eissner ◽  
Anil K. Pradhan
Keyword(s):  

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