scholarly journals Morphologic Diversity of Martian Ripples: Implications for Large‐Ripple Formation

2018 ◽  
Vol 45 (19) ◽  
pp. 10,229-10,239 ◽  
Author(s):  
M. G. A. Lapotre ◽  
R. C. Ewing ◽  
C. M. Weitz ◽  
K. W. Lewis ◽  
M. P. Lamb ◽  
...  
Keyword(s):  
Ripple Formation

scholarly journals Ripple Formation during Oblique Angle Etching

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 272
Author(s):  
Mehmet F. Cansizoglu ◽  
Mesut Yurukcu ◽  
Tansel Karabacak
Keyword(s):  
Plasma Etching ◽  
Incidence Angle ◽  
Incident Beam ◽  
Root Mean Square Roughness ◽  
Sticking Coefficient ◽  
Oblique Angle ◽  
Nano Fabrication ◽  
Ripple Formation ◽  
Rapid Formation ◽  
Roughness Analysis

Chemical removal of materials from the surface is a fundamental step in micro- and nano-fabrication processes. In conventional plasma etching, etchant molecules are non-directional and perform a uniform etching over the surface. However, using a highly directional obliquely incident beam of etching agent, it can be possible to engineer surfaces in the micro- or nano- scales. Surfaces can be patterned with periodic morphologies like ripples and mounds by controlling parameters including the incidence angle with the surface and sticking coefficient of etching particles. In this study, the dynamic evolution of a rippled morphology has been investigated during oblique angle etching (OAE) using Monte Carlo simulations. Fourier space and roughness analysis were performed on the resulting simulated surfaces. The ripple formation was observed to originate from re-emission and shadowing effects during OAE. Our results show that the ripple wavelength and root-mean-square roughness evolved at a more stable rate with accompanying quasi-periodic ripple formation at higher etching angles (θ > 60°) and at sticking coefficient values (Sc) 0.5 ≤ Sc ≤ 1. On the other hand, smaller etching angle (θ < 60°) and lower sticking coefficient values lead to a rapid formation of wider and deeper ripples. This result of this study can be helpful to develop new surface patterning techniques by etching.

Observation of ripple formation on O2+-irradiated GaN surfaces using atomic force microscopy

2003 ◽  
Vol 203-204 ◽  
pp. 152-155 ◽  
Author(s):  
M. Kanazawa ◽  
A. Takano ◽  
Y. Higashi ◽  
M. Suzuki ◽  
Y. Homma
Keyword(s):  
Atomic Force Microscopy ◽  
Force Microscopy ◽  
Ripple Formation ◽  
Atomic Force

Discussion of “Mechanics of Sediment-Ripple Formation”

1958 ◽  
Vol 84 (1) ◽  
pp. 23-32
Author(s):  
M. L. Albertson ◽  
D. B. Simons ◽  
E. V. Richardson
Keyword(s):  
Ripple Formation

scholarly journals Modifying the electrical properties of graphene by reversible point-ripple formation

Carbon ◽  
2019 ◽  
Vol 143 ◽  
pp. 762-768 ◽  
Author(s):  
Mona M.M. Alyobi ◽  
Chris J. Barnett ◽  
Paul Rees ◽  
Richard J. Cobley
Keyword(s):  
Electrical Properties ◽  
Ripple Formation

scholarly journals Ablation in Externally Applied Electric and Magnetic Fields

Nanomaterials ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 182
Author(s):  
Jovan Maksimovic ◽  
Soon-Hock Ng ◽  
Tomas Katkus ◽  
Nguyen Hoai An Le ◽  
James W.M. Chon ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Laser Ablation ◽  
Lorentz Force ◽  
Negative Electrode ◽  
Magnetic Flux Density ◽  
Ripple Formation ◽  
Electric And Magnetic Fields ◽  
Potential Applications ◽  
Application Potential ◽  
X Ray Absorption

To harness light-matter interactions at the nano-/micro-scale, better tools for control must be developed. Here, it is shown that by applying an external electric and/or magnetic field, ablation of Si and glass under ultra-short (sub-1 ps) laser pulse irradiation can be controlled via the Lorentz force F = e E + e [ v × B ] , where v is velocity of charge e, E is the applied electrical bias and B is the magnetic flux density. The external electric E-field was applied during laser ablation using suspended micro-electrodes above a glass substrate with an air gap for the incident laser beam. The counter-facing Al-electrodes on Si surface were used to study debris formation patterns on Si. Debris was deposited preferentially towards the negative electrode in the case of glass and Si ablation. Also, an external magnetic field was applied during laser ablation of Si in different geometries and is shown to affect ripple formation. Chemical analysis of ablated areas with and without a magnetic field showed strong chemical differences, revealed by synchrotron near-edge X-ray absorption fine structure (NEXAFS) measurements. Harnessing the vectorial nature of the Lorentz force widens application potential of surface modifications and debris formation in external E-/B-fields, with potential applications in mass and charge spectroscopes.

scholarly journals A 1D Ising model for ripple formation

2000 ◽  
Vol 33 (28) ◽  
pp. 4955-4962
Author(s):  
Nicolas Vandewalle ◽  
Serge Galam
Keyword(s):  
Ising Model ◽  
Ripple Formation

scholarly journals LABORATORY STUDY ON TWO-DIMENSIONAL BEACH TRANSFORMATION DUE TO IRREGULAR WAVES

1986 ◽  
Vol 1 (20) ◽  
pp. 102 ◽  
Author(s):  
Nubuo Mimura ◽  
Yukinori Otsuka ◽  
Akira Watanabe
Keyword(s):  
Wave Train ◽  
Irregular Waves ◽  
Two Dimensional ◽  
Beach Profile ◽  
Irregular Wave ◽  
Sand Ripple ◽  
Ripple Formation ◽  
Sand Movement ◽  
Incident Waves ◽  
Profile Change

In the present study, effects of irregular waves on two-dimensional beach transformation and related phenomena were investigated through a series of laboratory experiments. Attempts were made to determine a representative wave of irregular wave trains which controlled individual phenomenon related to the two-dimensional beach profile change. It was found that the representative wave is different for each phenomenon. For the macroscopic beach profile change, it is the mean wave which represents whole incident waves. On the other hand, some of microscopic phenomena, such as initiation of sand movement and sand ripple formation, are controlled by larger waves in the wave train selectively, of which representative wave is the significant wave.

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