Preferential Geminal Bis-silylation of 3,4-Benzothiophane Is Caused by the Dominance of Electron Withdrawal by R3Si over Steric Shielding Effects
Keyword(s):
1994 ◽
Vol 23
(6)
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pp. 406-408
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Keyword(s):
1968 ◽
Vol 23
(1)
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pp. 25-30
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Keyword(s):
1972 ◽
Vol 7
(2)
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pp. 285-292
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