Roll in and Roll out: A Path to High-Throughput Nanoimprint Lithography

ACS Nano ◽  
2009 ◽  
Vol 3 (8) ◽  
pp. 2062-2064 ◽  
Author(s):  
Colin Stuart ◽  
Yong Chen
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Roll Out

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

scholarly journals High-throughput roll-to-roll production of polymer biochips for multiplexed DNA detection in point-of-care diagnostics

Lab on a Chip ◽  
2020 ◽  
Vol 20 (22) ◽  
pp. 4106-4117
Author(s):  
Pelin Toren ◽  
Martin Smolka ◽  
Anja Haase ◽  
Ursula Palfinger ◽  
Dieter Nees ◽  
...  
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Dna Detection ◽  
Point Of Care ◽  
Roll To Roll ◽  
Flexible Polymer ◽  
Nano Structures ◽  
Point Of Care Diagnostics ◽  
Polymer Foils

Roll-to-roll UV nanoimprint lithography has superior advantages for high-throughput manufacturing of micro- or nano-structures on flexible polymer foils with various geometries and configurations.

Material development for high-throughput nanoimprint lithography

2018 ◽  
Author(s):  
Kei Kobayashi ◽  
Takayuki Nakamura ◽  
Hirokazu Kato ◽  
Masayuki Hatano ◽  
Hiroshi Tokue ◽  
...  
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Material Development

Nanopatterned L10-FePt nanoparticles from single-source metallopolymer precursors for potential application in ferromagnetic bit-patterned media magnetic recording

2016 ◽  
Vol 7 (27) ◽  
pp. 4467-4475 ◽  
Author(s):  
Zhengong Meng ◽  
Guijun Li ◽  
Sheung-Mei Ng ◽  
Hon-Fai Wong ◽  
Sze-Chun Yiu ◽  
...  
Keyword(s):  
High Throughput ◽  
Magnetic Recording ◽  
Potential Application ◽  
Nanoimprint Lithography ◽  
Fept Nanoparticles ◽  
Single Source ◽  
Bit Patterned Media ◽  
Patterned Media

A new single-source metallopolymer precursor P was applied for the synthesis of magnetic FePt nanoparticles, which was also suitable for patterning by high-throughput nanoimprint lithography to obtain ferromagnetic nanolines.

A Study on Adhesion Between Mold and Resist in Nanoimprint Lithography

2005 ◽  
Author(s):  
Kwang-Seop Kim ◽  
Ji-Hoon Kang ◽  
Kyung-Woong Kim
Keyword(s):  
Friction Force ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Adhesive Force ◽  
Adhesion Properties

Nanoimprint lithography (NIL) is one of the promising technologies to fabricate integrated fine patterns due to high-throughput and large processing latitude at low cost. However, adhesion between the mold and the resist occurs inevitably in NIL because the mold physically contacts with the resist. The adhesive force and friction force acting on the interface between the mold and the resist can cause the distortion and fracture of the mold and the patterns transferred on the resist when the mold is separated from the resist after imprinting process. In this study, the adhesion properties between quartz mold and mr-I PMMA and mr-I 7020 as resist usually used in thermal NIL is investigated. As the results of the comparison of the adhesion properties of two resists, it is found that mr-I PMMA has good release characteristics.

EBL/NIL fabrication and characterization of interdigitated electrodes for potential application in combinatorial studies.

2007 ◽  
Vol 1024 ◽  
Author(s):  
Lars Henrik Dæhli Skjolding ◽  
Christer Spégel ◽  
Jenny Emnéus ◽  
Lars Montelius
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography ◽  
Collection Efficiency ◽  
Cyclic Voltammograms ◽  
Production Scale ◽  
Interdigitated Electrodes ◽  
Full Production ◽  
Electrochemical Transducers ◽  
Good Agreement

AbstractElectrochemical transducers are frequently used to electrochemically deposit, synthesize and/or sense chemical compounds in material science, chemistry and biology. Traditionally this is done in fairly large volumes; generally several milliliters to even full production scale tanks, however, for high throughput measurements and combinatorial experiments smaller volumes are generally preferred. To probe small volumes small electrodes with preferable high density are needed. Presented in this paper is how to fabricate interdigitated electrodes by electron beam lithography (EBL) and also how to make large quantities by nanoimprint lithography (NIL) to enable combinatorial studies of cells or materials in microsystems (Lab-on-a-Chip Systems).Interdigitated electrodes are shown to have additional advantages compared to simple disk or rod electrodes, such as being able to perform redox cycling experiments. The collection efficiency for the electrodes with pitch of 400 nm and width of 200 nm fabricated by EBL has been found to be round 87% when characterized electrochemically using ferro-/ferricyanide. The shape of the cyclic voltammograms for the electrodes are also in good agreement with the theoretical expectations for ultramicroelectrodes. Hence, these electrodes should be ideal candidates for combinatorial and high-throughput studies based on electrochemical methods.Furthermore, a fabrication process based on nanoimprint lithography (NIL) is demonstrated, this could potentially ease fabrication and reduce cost of devices. The NIL process is based on thermal imprinting in PMMA 950k and LOR 0.7A.

High-throughput fabrication of anti-counterfeiting colloid-based photoluminescent microtags using electrical nanoimprint lithography

2014 ◽  
Vol 25 (34) ◽  
pp. 345302 ◽  
Author(s):  
R Diaz ◽  
E Palleau ◽  
D Poirot ◽  
N M Sangeetha ◽  
L Ressier
Keyword(s):  
High Throughput ◽  
Nanoimprint Lithography

Hologram Images Patterned in Shrink BOPP Film by Large-Area Roller Nanoimprint Lithography

2013 ◽  
Vol 873 ◽  
pp. 503-506 ◽  
Author(s):  
Meng Lin Jiang ◽  
Shi Wei Lin ◽  
Wen Kai Jiang
Keyword(s):  
Formation Mechanism ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Low Cost ◽  
Nanometer Scale ◽  
Flexible Substrates ◽  
Large Area ◽  
Biaxially Oriented Polypropylene ◽  
Oriented Polypropylene ◽  
Lithography Technique

Thermal roller nanoimprint lithography with the ability of larger area micro-to nanometer-scale patterning on flexible substrates possesses the advantages of low cost and high throughput, and is widely being practiced in industry. Hologram images have been successfully embossed in shrink biaxially oriented polypropylene films by the large-area roller nanoimprint lithography technique. The defects which occur during embossing processes have been studied in order to identify the underlying formation mechanism.

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