Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond

ACS Nano ◽  
2009 ◽  
Vol 3 (7) ◽  
pp. 1844-1858 ◽  
Author(s):  
XiaoMin Yang ◽  
Lei Wan ◽  
Shuaigang Xiao ◽  
Yuan Xu ◽  
Dieter K. Weller
Keyword(s):  
Electron Beam ◽  
Block Copolymer ◽  
Electron Beam Lithography ◽  
Areal Density ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
Block Copolymer Assembly ◽  
Copolymer Assembly

scholarly journals Directed Self-Assembly of Block Copolymer for Bit Patterned Media with Areal Density of 1.5 Teradot/Inch2 and Beyond

2013 ◽  
Vol 2013 ◽  
pp. 1-17 ◽  
Author(s):  
XiaoMin Yang ◽  
Shuaigang Xiao ◽  
Yautzong Hsu ◽  
Michael Feldbaum ◽  
Kim Lee ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Areal Density ◽  
Bit Patterned Media ◽  
Patterned Media

Fabrication and Recording of Bit Patterned Media Prepared by Rotary Stage Electron Beam Lithography

2011 ◽  
Vol 47 (10) ◽  
pp. 2656-2659 ◽  
Author(s):  
Matthew T. Moneck ◽  
Stephen Powell ◽  
James A. Bain ◽  
Jian-Gang Zhu ◽  
Takeru Okada ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
Rotary Stage

Bottlebrush Block Copolymer Assembly in Ultraconfined Films: Effect of Substrate Selectivity

2021 ◽  
Vol 54 (5) ◽  
pp. 2079-2089
Author(s):  
Yaron Aviv ◽  
Esra Altay ◽  
Ofer Burg ◽  
Marcus Müller ◽  
Javid Rzayev ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Substrate Selectivity ◽  
Block Copolymer Assembly ◽  
Copolymer Assembly

Regulating Block Copolymer Assembly Structures in Emulsion Droplets through Metal Ion Coordination

Langmuir ◽  
2018 ◽  
Vol 34 (38) ◽  
pp. 11495-11502 ◽  
Author(s):  
Yuqing Wu ◽  
Haiying Tan ◽  
Yi Yang ◽  
Yuce Li ◽  
Jiangping Xu ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Metal Ion ◽  
Emulsion Droplets ◽  
Block Copolymer Assembly ◽  
Copolymer Assembly

Development of Strategies to Improvement Ordering and Perpendicular Alignment of Cylinder Phase Block Copolymers Used as Templates for Bit Patterned Media

2007 ◽  
Vol 1032 ◽  
Author(s):  
Seth Garrett ◽  
Vincent Franco ◽  
Timothy Snowden ◽  
Chris Redden ◽  
Vishal Warke ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Substrate Surface ◽  
Chemical Properties ◽  
Random Copolymer ◽  
Pattern Generation ◽  
Information Storage ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
The Individual

AbstractBit patterned media, including media fabricated with a gradient in composition, is being developed as a potential path to higher information storage density. The noise level in such media is significantly impacted by the precision of the ordering of the individual bits and by the narrowness of their size distribution. Block copolymers that phase separate on the appropriate length scale are one method of pattern generation that is receiving considerable attention. For cylinder forming block copolymer phases the ordering and degree of perpendicular alignment is largely determined by the matching of the substrate surface to the block copolymer. If the chemical properties of the substrate surface match the average for the block copolymer, then thin films of the block copolymer align perpendicularly on annealing. Although there are a number of examples where the substrate surface fortuitously matches the block copolymer, in general an orienting layer is necessary to provide the appropriate match. The most popular approach has been to synthesize a random copolymer with the same average composition as the block copolymer. In order to produce suitably thin orienting layers it has been necessary to chemically tether the random copolymer to the substrate. Previously used chemistry has not been suitable for noble metal substrates such as platinum. We have been developing an alternate approach using thiol functional groups which we anticipate will be more suitable for Pt capped substrates.

Measurement of Arrays of Dots Produced by Electron-beam Lithography

2006 ◽  
Vol 961 ◽  
Author(s):  
Philip C. Hoyle ◽  
Ian Laidler
Keyword(s):  
Electron Beam ◽  
Standard Deviation ◽  
Electron Beam Lithography ◽  
Tool Development ◽  
Patterned Media ◽  
Tool Performance ◽  
Scanning Electron

ABSTRACTElectron-beam mastering of templates for patterned media presents a challenge to the toolmaker to simultaneously meet throughput, resolution and placement requirements. Fundamental to tool development is the ability to measure the placement to true grid of shapes as small as 7 nm over the whole substrate. In this article we describe a technique, consisting of acquiring and analyzing scanning electron (SE) micrographs, for measuring the placement errors in lithography similar to that required for patterned media, albeit over a few square microns and without scale and orthogonality components. The method enabled the measurement of placement errors of dots in an array with accuracy down to about 2 nm. The technique was used to benchmark current X-Y tool performance and the smallest 3× standard deviation of placement error was found to be around 4.5 nm. A clearer understanding of the necessary tool improvements was obtained. The use of the technique as basis for measuring errors to true grid over the entire substrate is discussed.

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