Ordered Arrays of Vertically Aligned [110] Silicon Nanowires by Suppressing the Crystallographically Preferred Etching Directions

Nano Letters ◽  
2009 ◽  
Vol 9 (7) ◽  
pp. 2519-2525 ◽  
Author(s):  
Zhipeng Huang ◽  
Tomohiro Shimizu ◽  
Stephan Senz ◽  
Zhang Zhang ◽  
Xuanxiong Zhang ◽  
...  
2011 ◽  
Vol 83 (12) ◽  
pp. 4724-4728 ◽  
Author(s):  
Christopher R. Field ◽  
Hyun Jin In ◽  
Nathan J. Begue ◽  
Pehr E. Pehrsson

2017 ◽  
Vol 21 (11) ◽  
pp. 3121-3127 ◽  
Author(s):  
Ming Qian ◽  
Nan Chen ◽  
Min Liu ◽  
Liang Cheng ◽  
Jing Li ◽  
...  

2021 ◽  
Vol 121 ◽  
pp. 111632
Author(s):  
Le Thanh Cong ◽  
Nguyen Thi Ngoc Lam ◽  
Doan Van Thuong ◽  
Ngo Ngoc Ha ◽  
Nguyen Duc Dung ◽  
...  

2017 ◽  
Vol 4 (7) ◽  
pp. 6797-6803 ◽  
Author(s):  
A.S. Gudovskikh ◽  
I.A. Morozov ◽  
D.A. Kudryashov ◽  
E.V. Nikitina ◽  
V. Sivakov

2013 ◽  
Vol 13 (6) ◽  
pp. 3983-3989 ◽  
Author(s):  
S. Jana ◽  
S. Mondal ◽  
S. R. Bhattacharyya

2014 ◽  
Vol 895 ◽  
pp. 200-203 ◽  
Author(s):  
Hui Chiang Teoh ◽  
Sabar Derita Hutagalung

Silicon nanowires (SiNWs) are important candidate for high performance electronic and optoelectronic devices due to their unique structures, electrical and optical properties. SiNWs were fabricated by silver-assisted electroless etching of Si wafer. Vertically aligned SiNW arrays with length about 8.75 μm and diameter of less than 90 nm have been fabricated. The reflectance of SiNWs without dye (12%) is greatly lower compared to bare Si wafer (25%). Therefore, SiNWs on Si substrate can be used as a good anti-reflection layer for a wide range of incident light. The reflectance of dye-sensitized SiNWs with red, green and blue dyes is 7%, 5.5%, and 5% respectively. The results confirmed that the reflectance of SiNWs with dye is much lower compared to SiNWs without dye and bare Si wafer. It was proven that dye on SiNWs can be used to reduce the reflectance (improved absorption) about 40% compared to SiNWs without dye.


2015 ◽  
Vol 60 ◽  
pp. 104-108 ◽  
Author(s):  
Chao Hou ◽  
Guowen Meng ◽  
Zhulin Huang ◽  
Bin Chen ◽  
Chuhong Zhu ◽  
...  

2015 ◽  
Vol 3 (44) ◽  
pp. 11577-11580 ◽  
Author(s):  
M. Ajmal Khan ◽  
Y. Ishikawa ◽  
I. Kita ◽  
K. Fukunaga ◽  
T. Fuyuki ◽  
...  

Decreasing the contact angle between In NDs and the Si substrate helps to grow vertically aligned Si NWs with a diameter of 18 nm.


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