Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition

Nano Letters ◽  
2009 ◽  
Vol 9 (1) ◽  
pp. 30-35 ◽  
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Xiaoting Jia ◽  
John Ho ◽  
Daniel Nezich ◽  
Hyungbin Son ◽  
...  
2019 ◽  
Vol 6 (10) ◽  
pp. 105604
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Lirong Zhao ◽  
Yanyan Wang ◽  
Xiaodong Zhu ◽  
Peixuan Ji ◽  
Kaimin Zhang ◽  
...  

Nano Letters ◽  
2009 ◽  
Vol 9 (8) ◽  
pp. 3087-3087 ◽  
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Alfonso Reina ◽  
Xiaoting Jia ◽  
John Ho ◽  
Daniel Nezich ◽  
Hyungbin Son ◽  
...  

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2011 ◽  
Vol 4 (12) ◽  
pp. 1208-1214 ◽  
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Yunzhou Xue ◽  
Bin Wu ◽  
Yunlong Guo ◽  
Liping Huang ◽  
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Carbon ◽  
2021 ◽  
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Sergio Pezzini ◽  
Fabian.R. Geisenhof ◽  
Neeraj Mishra ◽  
Vaidotas Mišeikis ◽  
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2010 ◽  
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Choong-Heui Chung ◽  
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Yan-Jie Wang ◽  
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RSC Advances ◽  
2015 ◽  
Vol 5 (55) ◽  
pp. 44142-44148 ◽  
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Jun Pu ◽  
Lei Tang ◽  
Chaowei Li ◽  
Taotao Li ◽  
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...  

The facile and scalable technique is demonstrated, which grow graphene with controllable layers on copper foil substrates using the etching effect of H2 in atmospheric pressure chemical vapor deposition (APCVD).


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