Sub-100 nm Triangular Nanopores Fabricated with the Reactive Ion Etching Variant of Nanosphere Lithography and Angle-Resolved Nanosphere Lithography

Nano Letters ◽  
2004 ◽  
Vol 4 (8) ◽  
pp. 1507-1511 ◽  
Author(s):  
Alyson V. Whitney ◽  
Benjamin D. Myers ◽  
Richard P. Van Duyne
Keyword(s):  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Ion Etching

Plasmonic Properties of Anchored Nanoparticles Fabricated by Reactive Ion Etching and Nanosphere Lithography

2007 ◽  
Vol 111 (11) ◽  
pp. 4116-4124 ◽  
Author(s):  
Erin M. Hicks ◽  
Olga Lyandres ◽  
W. Paige Hall ◽  
Shengli Zou ◽  
Matthew R. Glucksberg ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Ion Etching

FABRICATION AND OPTICAL PROPERTIES OF METAL-COATED NON-CLOSE-PACKED COLLOIDAL CRYSTALS

2009 ◽  
Vol 18 (04) ◽  
pp. 633-640
Author(s):  
ANNA MUSTONEN ◽  
HARRI LIPSANEN
Keyword(s):  
Optical Properties ◽  
Optical Transmission ◽  
Reactive Ion Etching ◽  
Colloidal Crystals ◽  
Nanosphere Lithography ◽  
Optical Response ◽  
Ion Etching ◽  
Circular Holes ◽  
Shell Particles

We present a study of optical transmission through metal-coated non-close-packed colloidal crystals. The arrays combine semi-shell particles and circular holes simultaneously. We show that the optical response of the structures can be tuned by altering the size of the semi-shell particles and holes. The non-close-packed colloidal crystals were fabricated using modified nanosphere lithography and reactive ion etching.

Fabrication of Size-Tunable Gold Nanoparticles Array with Nanosphere Lithography, Reactive Ion Etching, and Thermal Annealing

2005 ◽  
Vol 109 (22) ◽  
pp. 11100-11109 ◽  
Author(s):  
B. J. Y. Tan ◽  
C. H. Sow ◽  
T. S. Koh ◽  
K. C. Chin ◽  
A. T. S. Wee ◽  
...  
Keyword(s):  
Gold Nanoparticles ◽  
Thermal Annealing ◽  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Ion Etching

The extraordinary optical transmission and sensing properties of Ag/Ti composite nanohole arrays

2019 ◽  
Vol 21 (7) ◽  
pp. 3771-3780 ◽  
Author(s):  
Steven Larson ◽  
Daniel Carlson ◽  
Bin Ai ◽  
Yiping Zhao
Keyword(s):  
Optical Transmission ◽  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Extraordinary Optical Transmission ◽  
Ion Etching ◽  
Sensing Properties ◽  
Nanohole Arrays

Ag/Ti composite nanohole arrays were fabricated through a combination of nanosphere lithography, reactive ion etching, and co-deposition. The sensing performances were improved by the tunable dispersion of the Ag/Ti composites.

Fabrication of Nanoimprint Stamps by Nanosphere Lithography

2003 ◽  
Vol 776 ◽  
Author(s):  
Chun-Wen Kuo ◽  
Jau-Ye Shiu ◽  
Yi-Hong Cho ◽  
Peilin Chen
Keyword(s):  
Double Layer ◽  
Nanoimprint Lithography ◽  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Large Area ◽  
Periodic Nanostructures ◽  
Ion Etching ◽  
Polystyrene Beads ◽  
Nanopillar Arrays

AbstractAnovel scheme for the fabrication of large-area nanoimprint stamps has been developed based on the utilization of a combination of nanosphere lithography and reactive ion etching. Both single and double layer polystyrene beads have been employed to construct well-ordered, periodic silicon nanopillar arrays. The nanopillar arrays fabricated by this method have been successfully used as the stamps for nanoimprint lithography. Our result indicates that this approach is capable of producing large-area sub-50 nm periodic nanostructures.

scholarly journals Wafer Surface Charge Reversal as a Method of Simplifying Nanosphere Lithography for Reactive Ion Etch Texturing of Solar Cells

2007 ◽  
Vol 2007 ◽  
pp. 1-4 ◽  
Author(s):  
Daniel Inns ◽  
Patrick Campbell ◽  
Kylie Catchpole
Keyword(s):  
Solar Cells ◽  
Surface Charge ◽  
Reactive Ion Etching ◽  
Nanosphere Lithography ◽  
Batch Process ◽  
Aluminum Nitrate ◽  
Wafer Surface ◽  
Charge Reversal ◽  
Ion Etching ◽  
Lithography Process

A simplified nanosphere lithography process has been developed which allows fast and low-waste maskings of Si surfaces for subsequent reactive ion etching (RIE) texturing. Initially, a positive surface charge is applied to a wafer surface by dipping in a solution of aluminum nitrate. Dipping the positive-coated wafer into a solution of negatively charged silica beads (nanospheres) results in the spheres becoming electrostatically attracted to the wafer surface. These nanospheres form an etch mask for RIE. After RIE texturing, the reflection of the surface is reduced as effectively as any other nanosphere lithography method, while this batch process used for masking is much faster, making it more industrially relevant.

Magnetron Reactive Ion Etching of GaAs and AIGaAs in CH4/H2/Ar Plasmas.

1996 ◽  
Author(s):  
George F. McLane ◽  
Paul Cooke ◽  
Robert P. Moerkirk
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching
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