Phase Behavior of Thin Film Blends of Block Copolymers and Homopolymers:  Changes in Domain Dimensions

1999 ◽  
Vol 32 (4) ◽  
pp. 1087-1092 ◽  
Author(s):  
Keith A. Orso ◽  
Peter F. Green
Polymer ◽  
2014 ◽  
Vol 55 (8) ◽  
pp. 2059-2067 ◽  
Author(s):  
Ha-Kyung Kwon ◽  
Vanessa E. Lopez ◽  
Raleigh L. Davis ◽  
So Youn Kim ◽  
Adam B. Burns ◽  
...  

2010 ◽  
Vol 144 ◽  
pp. 143-157 ◽  
Author(s):  
Federica Lo Verso ◽  
Athanassios Z. Panagiotopoulos ◽  
Christos N. Likos

Molecules ◽  
2021 ◽  
Vol 26 (5) ◽  
pp. 1412
Author(s):  
Eunkyung Ji ◽  
Cian Cummins ◽  
Guillaume Fleury

The ability of bottlebrush block copolymers (BBCPs) to self-assemble into ordered large periodic structures could greatly expand the scope of photonic and membrane technologies. In this paper, we describe a two-step synthesis of poly(l-lactide)-b-polystyrene (PLLA-b-PS) BBCPs and their rapid thin-film self-assembly. PLLA chains were grown from exo-5-norbornene-2-methanol via ring-opening polymerization (ROP) of l-lactide to produce norbornene-terminated PLLA. Norbonene-terminated PS was prepared using anionic polymerization followed by a termination reaction with exo-5-norbornene-2-carbonyl chloride. PLLA-b-PS BBCPs were prepared from these two norbornenyl macromonomers by a one-pot sequential ring opening metathesis polymerization (ROMP). PLLA-b-PS BBCPs thin-films exhibited cylindrical and lamellar morphologies depending on the relative block volume fractions, with domain sizes of 46–58 nm and periodicities of 70–102 nm. Additionally, nanoporous templates were produced by the selective etching of PLLA blocks from ordered structures. The findings described in this work provide further insight into the controlled synthesis of BBCPs leading to various possible morphologies for applications requiring large periodicities. Moreover, the rapid thin film patterning strategy demonstrated (>5 min) highlights the advantages of using PLLA-b-PS BBCP materials beyond their linear BCP analogues in terms of both dimensions achievable and reduced processing time.


1995 ◽  
Vol 28 (10) ◽  
pp. 3597-3603 ◽  
Author(s):  
Maarten Svensson ◽  
Per Linse ◽  
Folke Tjerneld

2000 ◽  
Vol 112 (5) ◽  
pp. 2452-2462 ◽  
Author(s):  
H. P. Huinink ◽  
J. C. M. Brokken-Zijp ◽  
M. A. van Dijk ◽  
G. J. A. Sevink
Keyword(s):  

2020 ◽  
Vol 5 (10) ◽  
pp. 1642-1657
Author(s):  
Cian Cummins ◽  
Guillaume Pino ◽  
Daniele Mantione ◽  
Guillaume Fleury

Recently engineered high χ-low N block copolymers for nanolithography are evaluated. Synthetic routes together with thin film processing strategies are highlighted that could enable the relentless scaling for logic technologies at sub-10 nanometres.


2015 ◽  
Vol 48 (7) ◽  
pp. 2107-2117 ◽  
Author(s):  
Harikrishna Erothu ◽  
Joanna Kolomanska ◽  
Priscilla Johnston ◽  
Stefan Schumann ◽  
Dargie Deribew ◽  
...  

2016 ◽  
Vol 39 (7) ◽  
Author(s):  
Lingfei Zheng ◽  
Jianqi Wu ◽  
Zheng Wang ◽  
Yuhua Yin ◽  
Run Jiang ◽  
...  

2018 ◽  
Vol 51 (12) ◽  
pp. 4727-4734 ◽  
Author(s):  
Rui-Yang Wang ◽  
Jie Huang ◽  
Xiao-Shuai Guo ◽  
Xiao-Han Cao ◽  
Shu-Fen Zou ◽  
...  

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