scholarly journals Synthesis, Thermal Processing, and Thin Film Morphology of Poly(3-hexylthiophene)–Poly(styrenesulfonate) Block Copolymers

2015 ◽  
Vol 48 (7) ◽  
pp. 2107-2117 ◽  
Author(s):  
Harikrishna Erothu ◽  
Joanna Kolomanska ◽  
Priscilla Johnston ◽  
Stefan Schumann ◽  
Dargie Deribew ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymers ◽  
Thermal Processing ◽  
Film Morphology

Surface Effects on the Thin Film Morphology of Block Copolymers with Bulk Order−Order Transitions

2010 ◽  
Vol 43 (7) ◽  
pp. 3406-3414 ◽  
Author(s):  
Karen E. Sohn ◽  
Ken Kojio ◽  
Brian C. Berry ◽  
Alamgir Karim ◽  
Robert C. Coffin ◽  
...  
Keyword(s):  
Thin Film ◽  
Block Copolymers ◽  
Surface Effects ◽  
Film Morphology

scholarly journals Precise Synthesis and Thin Film Self-Assembly of PLLA-b-PS Bottlebrush Block Copolymers

Molecules ◽  
2021 ◽  
Vol 26 (5) ◽  
pp. 1412
Author(s):  
Eunkyung Ji ◽  
Cian Cummins ◽  
Guillaume Fleury
Keyword(s):  
Thin Film ◽  
Block Copolymers ◽  
Self Assembly ◽  
Ring Opening ◽  
Periodic Structures ◽  
One Pot ◽  
Ordered Structures ◽  
Carbonyl Chloride ◽  
Thin Film Patterning ◽  
Nanoporous Templates

The ability of bottlebrush block copolymers (BBCPs) to self-assemble into ordered large periodic structures could greatly expand the scope of photonic and membrane technologies. In this paper, we describe a two-step synthesis of poly(l-lactide)-b-polystyrene (PLLA-b-PS) BBCPs and their rapid thin-film self-assembly. PLLA chains were grown from exo-5-norbornene-2-methanol via ring-opening polymerization (ROP) of l-lactide to produce norbornene-terminated PLLA. Norbonene-terminated PS was prepared using anionic polymerization followed by a termination reaction with exo-5-norbornene-2-carbonyl chloride. PLLA-b-PS BBCPs were prepared from these two norbornenyl macromonomers by a one-pot sequential ring opening metathesis polymerization (ROMP). PLLA-b-PS BBCPs thin-films exhibited cylindrical and lamellar morphologies depending on the relative block volume fractions, with domain sizes of 46–58 nm and periodicities of 70–102 nm. Additionally, nanoporous templates were produced by the selective etching of PLLA blocks from ordered structures. The findings described in this work provide further insight into the controlled synthesis of BBCPs leading to various possible morphologies for applications requiring large periodicities. Moreover, the rapid thin film patterning strategy demonstrated (>5 min) highlights the advantages of using PLLA-b-PS BBCP materials beyond their linear BCP analogues in terms of both dimensions achievable and reduced processing time.

scholarly journals Asymmetric block copolymers confined in a thin film

2000 ◽  
Vol 112 (5) ◽  
pp. 2452-2462 ◽  
Author(s):  
H. P. Huinink ◽  
J. C. M. Brokken-Zijp ◽  
M. A. van Dijk ◽  
G. J. A. Sevink
Keyword(s):  
Thin Film ◽  
Block Copolymers

Ni Silicide Formation on Polycrystalline SiGe and SiGeC Layers

2002 ◽  
Vol 745 ◽  
Author(s):  
Erik Haralson ◽  
Tobias Jarmar ◽  
Johan Seger ◽  
Henry H. Radamson ◽  
Shi-Li Zhang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Lateral Diffusion ◽  
Lateral Growth ◽  
Silicide Formation ◽  
Diffusion Couples ◽  
Planar Configuration ◽  
20 Nm

ABSTRACTThe reactions of Ni with polycrystalline Si, Si0.82Ge0.18 and Si0.818Ge0.18C0.002 films in two different configurations during rapid thermal processing were studied. For the usually studied planar configuration with 20 nm thick Ni on 130–290 nm thick Si1-x-yGexCy, NiSi1-xGex(C) forms at 450°C on either Si0.82Ge0.18 or Si0.818Ge0.18C0.002, comparable to NiSi formed on Si. However, the agglomeration of NiSi1-xGex(C) on Si0.818Ge0.18C0.002 occurs at 625°C, about 50°C higher than that of NiSi1-xGex on Si0.82Ge0.18. For thin-film lateral diffusion couples, a 200-nm thick Ni film was in contact with 80–130 nm thick Si1-x-yGexCy through 1–10 μm sized contact openings in a 170 nm thick SiO2 isolation. While the Ni3Si phase was formed for both the Si0.82Ge0.18 and Si0.818Ge0.18C0.002 samples, the presence of 0.2 at.% C caused a slightly slower lateral growth.

The importance of spinning speed in fabrication of spin-coated organic thin film transistors: Film morphology and field effect mobility

2014 ◽  
Vol 104 (23) ◽  
pp. 233306 ◽  
Author(s):  
Kenji Kotsuki ◽  
Hiroshige Tanaka ◽  
Seiji Obata ◽  
Sven Stauss ◽  
Kazuo Terashima ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Field Effect ◽  
Organic Thin Film Transistors ◽  
Film Morphology ◽  
Organic Thin Film ◽  
Field Effect Mobility ◽  
Spinning Speed

scholarly journals Engineering block copolymer materials for patterning ultra-low dimensions

2020 ◽  
Vol 5 (10) ◽  
pp. 1642-1657
Author(s):  
Cian Cummins ◽  
Guillaume Pino ◽  
Daniele Mantione ◽  
Guillaume Fleury
Keyword(s):  
Thin Film ◽  
Block Copolymer ◽  
Block Copolymers ◽  
Low Dimensions ◽  
Processing Strategies ◽  
Synthetic Routes ◽  
Film Processing ◽  
Thin Film Processing

Recently engineered high χ-low N block copolymers for nanolithography are evaluated. Synthetic routes together with thin film processing strategies are highlighted that could enable the relentless scaling for logic technologies at sub-10 nanometres.

Improvement of Cu2ZnSnS4 thin film morphology using Cu–Zn–Sn–O precursor fabricated by sputtering

2013 ◽  
Vol 13 (9) ◽  
pp. 1861-1864 ◽  
Author(s):  
Ryo Ishino ◽  
Kazuhiro Fukushima ◽  
Takashi Minemoto
Keyword(s):  
Thin Film ◽  
Film Morphology ◽  
Cu2znsns4 Thin Film
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