Microphase Separation in Low Molecular Weight Styrene-Isoprene Diblock Copolymers Studied by DSC and13C NMR

1980 ◽  
Vol 13 (1) ◽  
pp. 100-106 ◽  
Author(s):  
B. Morèse-Séguéla ◽  
M. St-Jacques ◽  
J. M. Renaud ◽  
J. Prod'homme
1989 ◽  
Vol 22 (8) ◽  
pp. 3380-3387 ◽  
Author(s):  
John N. Owens ◽  
Irena S. Gancarz ◽  
Jeffrey T. Koberstein ◽  
Thomas P. Russell

Soft Matter ◽  
2016 ◽  
Vol 12 (8) ◽  
pp. 2481-2490 ◽  
Author(s):  
Ying Jiang ◽  
Xinghua Zhang ◽  
Bing Miao ◽  
Dadong Yan ◽  
Jeff Z. Y. Chen

A study on the structural properties of low-molecular weight AB diblock copolymers indicates substantial deviations from the properties of high-molecular weight polymers.


2008 ◽  
Vol 41 (15) ◽  
pp. 5785-5792 ◽  
Author(s):  
Rafal A. Mickiewicz ◽  
Eleftherios Ntoukas ◽  
Apostolos Avgeropoulos ◽  
Edwin L. Thomas

2000 ◽  
Vol 629 ◽  
Author(s):  
Ratchana Limary ◽  
Peter F. Green

ABSTRACTSymmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.


1998 ◽  
Vol 31 (7) ◽  
pp. 2174-2184 ◽  
Author(s):  
Seong-Uk Hong ◽  
Jonathan H. Laurer ◽  
John M. Zielinski ◽  
Jon Samseth ◽  
Steven D. Smith ◽  
...  

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