In Situ Auger Electron Spectroscopy Study of Atomic Layer Deposition:  Growth Initiation and Interface Formation Reactions during Ruthenium ALD on Si−H, SiO2, and HfO2Surfaces

Kie Jin Park; David B. Terry; S. Michael Stewart; Gregory N. Parsons

doi:10.1021/la061898u

In Situ Auger Electron Spectroscopy Study of Atomic Layer Deposition: Growth Initiation and Interface Formation Reactions during Ruthenium ALD on Si−H, SiO2, and HfO2Surfaces

Langmuir ◽

10.1021/la061898u ◽

2007 ◽

Vol 23 (11) ◽

pp. 6106-6112 ◽

Cited By ~ 36

Author(s):

Kie Jin Park ◽

David B. Terry ◽

S. Michael Stewart ◽

Gregory N. Parsons

Keyword(s):

Atomic Layer Deposition ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Atomic Layer ◽

Spectroscopy Study ◽

Interface Formation ◽

Layer Deposition ◽

Growth Initiation

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In situ infrared spectroscopy study of the interface self-cleaning during the atomic layer deposition of HfO2 on GaAs(100) surfaces

Applied Physics Letters ◽

10.1063/1.4896501 ◽

2014 ◽

Vol 105 (12) ◽

pp. 121604 ◽

Cited By ~ 10

Author(s):

Liwang Ye ◽

Theodosia Gougousi

Keyword(s):

Infrared Spectroscopy ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Spectroscopy Study ◽

Layer Deposition ◽

Self Cleaning ◽

In Situ Infrared Spectroscopy

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An in situ Auger electron spectroscopy study of chromium thin film coverage of copper surfaces: Effects of surface morphology, temperature and environment

Thin Solid Films ◽

10.1016/0040-6090(91)90030-2 ◽

1991 ◽

Vol 200 (1) ◽

pp. 67-76 ◽

Cited By ~ 4

Author(s):

H. Lefakis ◽

P.S. Ho

Keyword(s):

Thin Film ◽

Surface Morphology ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Spectroscopy Study ◽

Copper Surfaces

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Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5015946 ◽

2018 ◽

Vol 36 (2) ◽

pp. 02D402

Author(s):

Seok Hwan Kim ◽

Wooseok Song ◽

In Su Jeon ◽

Sun Sook Lee ◽

Taek-Mo Chung ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition

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In-Situ Synchrotron Radiation Photoemission Spectroscopy Study of the Initial Atomic Layer Deposition of Al2O3 Film on Si(001) Substrate

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2011.3629 ◽

2011 ◽

Vol 11 (5) ◽

pp. 4328-4332 ◽

Cited By ~ 1

Author(s):

S. H. Kim ◽

B. K. Lee ◽

J. Baik ◽

C. Jeon ◽

S. S. Lee ◽

...

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition ◽

Synchrotron Radiation Photoemission

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HfO[sub 2]∕Si interface formation in atomic layer deposition films: An in situ investigation

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3021023 ◽

2009 ◽

Vol 27 (1) ◽

pp. 300 ◽

Cited By ~ 12

Author(s):

Massimo Tallarida ◽

Konstantin Karavaev ◽

Dieter Schmeisser

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Interface Formation ◽

Layer Deposition ◽

In Situ Investigation

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In situ infrared spectroscopy study of the surface reactions during the atomic layer deposition of TiO2 on GaAs (100) surfaces

Applied Surface Science ◽

10.1016/j.apsusc.2017.05.264 ◽

2017 ◽

Vol 422 ◽

pp. 666-674 ◽

Cited By ~ 4

Author(s):

Liwang Ye ◽

Jaron A. Kropp ◽

Theodosia Gougousi

Keyword(s):

Infrared Spectroscopy ◽

Atomic Layer Deposition ◽

Surface Reactions ◽

Atomic Layer ◽

Spectroscopy Study ◽

Layer Deposition ◽

In Situ Infrared Spectroscopy

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In Situ proton-induced X-ray emission and auger electron spectroscopy study of titanium and niobium implantation of iron films

Materials Science and Engineering ◽

10.1016/0025-5416(85)90356-8 ◽

1985 ◽

Vol 69 (2) ◽

pp. 539-547 ◽

Cited By ~ 8

Author(s):

B.D. Sartwell ◽

D.A. Baldwin

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Spectroscopy Study ◽

Iron Films ◽

X Ray

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"IN SITU" AUGER ELECTRON SPECTROSCOPY APPLIED TO STUDY THE CHANGE OF SURFACE OF TiNi ALLOY IN NITROGEN ATMOSPHERE AT LOW PRESSURE AND AT ROOM TEMPERATURE

Applied Crystallography ◽

10.1142/9789812811325_0056 ◽

2001 ◽

Author(s):

E. Rówiński ◽

E. Łągiewka

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Room Temperature ◽

Low Pressure ◽

Nitrogen Atmosphere ◽

Tini Alloy

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Auger electron spectroscopy study of Ni3Si

Scripta Metallurgica ◽

10.1016/0036-9748(89)90492-4 ◽

1989 ◽

Vol 23 (11) ◽

pp. 1969-1973 ◽

Cited By ~ 16

Author(s):

I. Baker ◽

R.A. Padgett ◽

E.M. Schulson

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Spectroscopy Study

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Auger Electron Spectroscopy Study of GaAs Substrate Cleaning Procedures

Journal of The Electrochemical Society ◽

10.1149/1.2123868 ◽

1982 ◽

Vol 129 (2) ◽

pp. 406-408 ◽

Cited By ~ 14

Author(s):

J. L. Zilko ◽

R. S. Williams

Keyword(s):

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Gaas Substrate ◽

Auger Electron ◽

Spectroscopy Study ◽

Cleaning Procedures ◽

Substrate Cleaning

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