Mixed Oxide Surfaces:  Ultrathin Films of CaxMg(1-x)O

1998 ◽  
Vol 102 (4) ◽  
pp. 693-700 ◽  
Author(s):  
M. J. Iedema ◽  
N. Kizhakevariam ◽  
J. P. Cowin
Keyword(s):  
Mixed Oxide ◽  
Ultrathin Films ◽  
Oxide Surfaces

ChemInform Abstract: Mixed Oxide Surfaces: Ultrathin Films of CaxMg(1-x)O.

ChemInform ◽  
2010 ◽  
Vol 29 (20) ◽  
pp. no-no
Author(s):  
M. J. IEDEMA ◽  
N. KIZHAKEVARIAM ◽  
J. P. COWIN
Keyword(s):  
Mixed Oxide ◽  
Ultrathin Films ◽  
Oxide Surfaces

Electron Transfer at Oxide Surfaces. The MgO Paradigm: from Defects to Ultrathin Films

2012 ◽  
Vol 113 (6) ◽  
pp. 4035-4072 ◽  
Author(s):  
Gianfranco Pacchioni ◽  
Hajo Freund
Keyword(s):  
Electron Transfer ◽  
Ultrathin Films ◽  
Oxide Surfaces

Use of catalytic reactions to probe Mg-Al mixed oxide surfaces

1994 ◽  
Vol 25 (1-2) ◽  
pp. 87-95 ◽  
Author(s):  
Christopher T. Fishel ◽  
Robert J. Davis
Keyword(s):  
Mixed Oxide ◽  
Catalytic Reactions ◽  
Oxide Surfaces

Interaction of Amino Acids and Silica-Containing Mixed-Oxide Surfaces in Aqueous Solutions

1989 ◽  
Vol 18 (2) ◽  
pp. 209-212 ◽  
Author(s):  
Shoji Kaneko ◽  
Masatsugu Mikawa ◽  
Sei-ichi Yamagiwa
Keyword(s):  
Amino Acids ◽  
Aqueous Solutions ◽  
Mixed Oxide ◽  
Oxide Surfaces

scholarly journals TiO2–Al2O3 binary mixed oxide surfaces for photocatalytic NOx abatement

2014 ◽  
Vol 318 ◽  
pp. 142-149 ◽  
Author(s):  
Asli Melike Soylu ◽  
Meryem Polat ◽  
Deniz Altunoz Erdogan ◽  
Zafer Say ◽  
Cansu Yıldırım ◽  
...  
Keyword(s):  
Mixed Oxide ◽  
Oxide Surfaces ◽  
Nox Abatement

Sub-monolayer control of the growth of oxide films on mesoporous materials

2018 ◽  
Vol 6 (36) ◽  
pp. 17548-17558 ◽  
Author(s):  
Zhihuan Weng ◽  
Zhi-hui Chen ◽  
Xiangdong Qin ◽  
Francisco Zaera
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Mesoporous Materials ◽  
Mixed Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Oxide Surfaces ◽  
Oxide Thin Films ◽  
Layer Deposition

Mixed oxide surfaces were developed via the atomic layer deposition of a variety of oxide thin films on mesoporous materials.

Epitaxial growth manner and structure of superconducting oxide films

1990 ◽  
Vol 48 (4) ◽  
pp. 2-3
Author(s):  
Yoshichika Bando ◽  
Takahito Terashima ◽  
Kenji Iijima ◽  
Kazunuki Yamamoto ◽  
Kazuto Hirata ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Film Surface ◽  
High Energy ◽  
Epitaxial Films ◽  
Layer By Layer ◽  
Initial Growth ◽  
In Situ Growth ◽  
High Quality ◽  
Activated Reactive Evaporation

The high quality thin films of high-Tc superconducting oxide are necessary for elucidating the superconducting mechanism and for device application. The recent trend in the preparation of high-Tc films has been toward “in-situ” growth of the superconducting phase at relatively low temperatures. The purpose of “in-situ” growth is to attain surface smoothness suitable for fabricating film devices but also to obtain high quality film. We present the investigation on the initial growth manner of YBCO by in-situ reflective high energy electron diffraction (RHEED) technique and on the structural and superconducting properties of the resulting ultrathin films below 100Å. The epitaxial films have been grown on (100) plane of MgO and SrTiO, heated below 650°C by activated reactive evaporation. The in-situ RHEED observation and the intensity measurement was carried out during deposition of YBCO on the substrate at 650°C. The deposition rate was 0.8Å/s. Fig. 1 shows the RHEED patterns at every stage of deposition of YBCO on MgO(100). All the patterns exhibit the sharp streaks, indicating that the film surface is atomically smooth and the growth manner is layer-by-layer.

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