Deperturbation Analysis of the [18.5]1-X0+System and the Electronic Structure of ReN:  A Laser Induced and Dispersed Fluorescence Study

1997 ◽  
Vol 101 (36) ◽  
pp. 6741-6745 ◽  
Author(s):  
Jianying Cao ◽  
Walter J. Balfour ◽  
Charles X. W. Qian
1999 ◽  
Vol 111 (17) ◽  
pp. 7844-7856 ◽  
Author(s):  
Amy E. Stevens Miller ◽  
Cheng-Chi Chuang ◽  
Henry C. Fu ◽  
Kelly J. Higgins ◽  
William Klemperer

2001 ◽  
Vol 79 (2-3) ◽  
pp. 101-108 ◽  
Author(s):  
W Klemperer ◽  
C -C Chuang ◽  
K J Higgins ◽  
A Stevens Miller ◽  
H C Fu

The inert-gas-halogen complexes have been studied for several decades by jet spectroscopy. Much of the seemingly bizarre behavior has become understandable in terms of two virtually isoenergetic isomer forms. The recently recognized linear isomer of Ar–I2 has a virtually continuous B ¬ X excitation spectrum. It also undergoes a very rapid vibrational predissociation, and suffers no electronic quenching from the B state. The well-known T-shaped isomer shows slow vibrational predissociation, which is competitive with electronic quenching. The quenching distorts the vibrational distribution of the I2 B state photofragments, consequently leading to a false estimation of the T-shaped Ar–I2 (B) state dissociation energy. The binding energies for the T-shaped Ar–I2 (X) and Ar–I2 (B) are unambiguously determined from the recent dispersed fluorescence study, which are also in good accord with the ab initio calculation. We discuss aspects of pure vibrational laser-induced fluorescence of hydrogen fluoride complexes. We contrast the behavior of Ar–HF with Ne–HF and present new results for the vHF = 3 level of Ne–HF. PACS Nos.: 33.80Gj, 34.30th


2010 ◽  
Vol 132 (12) ◽  
pp. 4214-4229 ◽  
Author(s):  
Bhanu Neupane ◽  
Nhan C. Dang ◽  
Khem Acharya ◽  
Mike Reppert ◽  
Valter Zazubovich ◽  
...  

1997 ◽  
Vol 107 (12) ◽  
pp. 4473-4482 ◽  
Author(s):  
Chi Zhou ◽  
Walter J. Balfour ◽  
Charles X. W. Qian

Author(s):  
S.J. Splinter ◽  
J. Bruley ◽  
P.E. Batson ◽  
D.A. Smith ◽  
R. Rosenberg

It has long been known that the addition of Cu to Al interconnects improves the resistance to electromigration failure. It is generally accepted that this improvement is the result of Cu segregation to Al grain boundaries. The exact mechanism by which segregated Cu increases service lifetime is not understood, although it has been suggested that the formation of thin layers of θ-CuA12 (or some metastable substoichiometric precursor, θ’ or θ”) at the boundaries may be necessary. This paper reports measurements of the local electronic structure of Cu atoms segregated to Al grain boundaries using spatially resolved EELS in a UHV STEM. It is shown that segregated Cu exists in a chemical environment similar to that of Cu atoms in bulk θ-phase precipitates.Films of 100 nm thickness and nominal composition Al-2.5wt%Cu were deposited by sputtering from alloy targets onto NaCl substrates. The samples were solution heat treated at 748K for 30 min and aged at 523K for 4 h to promote equilibrium grain boundary segregation. EELS measurements were made using a Gatan 666 PEELS spectrometer interfaced to a VG HB501 STEM operating at 100 keV. The probe size was estimated to be 1 nm FWHM. Grain boundaries with the narrowest projected width were chosen for analysis. EDX measurements of Cu segregation were made using a VG HB603 STEM.


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