Loading Effect in Copper(II) Oxide Cluster-Surface-Modified Titanium(IV) Oxide on Visible- and UV-Light Activities

2013 ◽  
Vol 117 (45) ◽  
pp. 23848-23857 ◽  
Author(s):  
Qiliang Jin ◽  
Musashi Fujishima ◽  
Anna Iwaszuk ◽  
Michael Nolan ◽  
Hiroaki Tada
Keyword(s):  
Uv Light ◽  
Oxide Cluster ◽  
Loading Effect ◽  
Cluster Surface ◽  
Surface Modified

Origin of the Visible-Light Response of Nickel(II) Oxide Cluster Surface Modified Titanium(IV) Dioxide

2013 ◽  
Vol 117 (6) ◽  
pp. 2709-2718 ◽  
Author(s):  
Anna Iwaszuk ◽  
Michael Nolan ◽  
Qiliang Jin ◽  
Musashi Fujishima ◽  
Hiroaki Tada
Keyword(s):  
Visible Light ◽  
Light Response ◽  
Oxide Cluster ◽  
Cluster Surface ◽  
Visible Light Response ◽  
Surface Modified

Preparation and Photocatalytic Activity of Silver Doped TiO2 Nanotubes

2014 ◽  
Vol 618 ◽  
pp. 14-18
Author(s):  
Ying Cao Xu ◽  
Hong You
Keyword(s):  
Acetic Acid ◽  
Photocatalytic Activity ◽  
Light Intensity ◽  
Anodic Oxidation ◽  
Ag Nanoparticles ◽  
Uv Light ◽  
Effect Factors ◽  
Glycerol Water ◽  
Surface Modified

In this paper, highly ordered TiO2 nanotubes were performed by the method of anodic oxidation, using glycerol / water, NH4F as the electrolyte, and Oxidation voltage to 25v for 1h. TiO2 nanotube surface modified by Ag nanoparticles, by using UV light to restore Ag+ to Ag, the Ag+ from AgNO3 solution sputted out by ultrasonic. Ag-doped TiO2 was used to degrade acetic acid concentrations under UV light. Different Ag/TiO2, HAc concentration, and light intensity were selected as effect factors, TiO2 as contrast test.

Preparation and enhanced photocatalytic oxidation activity of surface-modified CdS nanoparticles with high photostability

1999 ◽  
Vol 14 (5) ◽  
pp. 2092-2095 ◽  
Author(s):  
M. Y. Han ◽  
W. Huang ◽  
C. H. Quek ◽  
L. M. Gan ◽  
C. H. Chew ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Surface Modification ◽  
Photocatalytic Oxidation ◽  
Uv Light ◽  
Cds Nanoparticles ◽  
Oxidation Activity ◽  
Chemical Surface ◽  
Photo Oxidation ◽  
Chemical Surface Modification ◽  
Surface Modified

Highly photostable CdS nanoparticles modified with an alkyl group were prepared by an improved microemulsion technique using hexanethiol as cosurfactant. The surface-modified CdS nanoparticles catalyzed the photo-oxidation of 4-chlorophenol via continuously bubbling oxygen under uv light. The photocatalytic oxidation activity of the CdS nanoparticles was enhanced due to the formation of their compact CdS cores with strong chemical surface modification by heat treatment.

Tin oxide-surface modified anatase titanium(iv) dioxide with enhanced UV-light photocatalytic activity

2012 ◽  
Vol 14 (2) ◽  
pp. 705-711 ◽  
Author(s):  
Musashi Fujishima ◽  
Qiliang Jin ◽  
Hironori Yamamoto ◽  
Hiroaki Tada ◽  
Michael Nolan
Keyword(s):  
Photocatalytic Activity ◽  
Tin Oxide ◽  
Uv Light ◽  
Oxide Surface ◽  
Surface Modified

Cleaning Process Optimization in a Gate Oxide Cluster Tool Using an in-Line XPS Module

1997 ◽  
Vol 477 ◽  
Author(s):  
Barbara Froeschle ◽  
Frédérique Glowacki ◽  
Anton J. Bauer ◽  
Igor Kasko ◽  
Richard Oechsner ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Dielectric Breakdown ◽  
Uv Light ◽  
Reference Sample ◽  
Gate Oxide ◽  
Cleaning Process ◽  
Oxide Cluster ◽  
Time Dependent Dielectric Breakdown ◽  
Wafer Surfaces ◽  
Cluster Tool

ABSTRACTA cleaning process using anhydrous HF (AHF)/methanol and ozone was carried out in a STEAG AST Vapor Phase Cleaning module (VPC). This module was integrated in a state-of-theart cluster tool also consisting of a STEAG AST Rapid Thermal Oxidation module (RTO). To investigate the properties of silicon after cleaning a novel in-line XPS module was integrated into the gate oxide cluster. Measurements of fluorine, carbon, and oxygen contamination in the range from 0.01 to 1 monolayers on cleaned wafer surfaces and on regrown oxides (< 0.5 nm) have been performed and used for rapid optimization of the cleaning procedure. The in-line integration enabled measurements without exposing the wafers to atmosphere thus avoiding oxidation or contamination of the wafer surfaces. To demonstrate the feasibility of this cluster tool for advanced gate dielectric formation, 4.0 nm thin oxide was grown directly after the cleaning in the RTO module without breaking the vacuum. Time dependent dielectric breakdown results for oxides pre-oxidation-cleaned in AHF, and in AHF followed by ozone were compared to a reference sample without any dry pre-oxidation cleaning. It could be shown, that the cleaning in AHF with a subsequent ozone step at 200°C under UV light lead to improved breakdown characteristics compared to AHF/methanol cleanings without such subsequent ozone/UV step or conventional wet cleaning using HF-Dip.

High-loading effect of surface-modified inorganic particles in polymer materials

1989 ◽  
Vol 8 (6) ◽  
pp. 624-626 ◽  
Author(s):  
Kazuta Mitsuishi ◽  
Tatsumi Yabuki ◽  
Soji Kodama ◽  
Hitoshi Kawasaki
Keyword(s):  
Polymer Materials ◽  
High Loading ◽  
Inorganic Particles ◽  
Loading Effect ◽  
Surface Modified ◽  
Effect Of Surface

scholarly journals Novel N-chloramine precursors for antimicrobial application: synthesis and facile covalent immobilization on polyurethane surface based on perfluorophenyl azide (PFPA) chemistry

2018 ◽  
Vol 96 (10) ◽  
pp. 939-948 ◽  
Author(s):  
Lingdong Li ◽  
Fengxiang Zhang ◽  
Fangyuan Gai ◽  
Hao Zhou ◽  
Xiaofang Chi ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Uv Light ◽  
Covalent Immobilization ◽  
Material Surface ◽  
Biocidal Activity ◽  
Force Microscopy ◽  
Atomic Force ◽  
Antimicrobial Materials ◽  
Surface Modified ◽  
Perfluorophenyl Azide

To control the pathogen cross contaminations on medical material surface, there is a pressing need to develop antimicrobial materials with highly efficacious surface biocidal activity. In this work, N-chloramine precursors containing a quaternary ammonium unit and perfluorophenyl azide unit were synthesized and covalently immobilized on inert polyurethane (PU) film upon UV light irradiation. The surface modification was confirmed by contact angle, Fourier transform infrared (ATR FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) analyses. After bleaching treatment, satisfactory biocidal activity was achieved for the surface-modified PU films. It was found that the introduced surface QA center contributed an even faster surface contact killing behavior and that precursors with a longer structural linker caused higher surface chlorine content and higher antimicrobial efficacy. This approach provides a novel and facile method that enables the covalent immobilization of N-chloramine precursors on inert polymeric surface to produce durable antimicrobial materials.

scholarly journals Different behavior of human gingival fibroblasts on surface modified zirconia: A comparison between ultraviolet (UV) light and plasma

2019 ◽  
Vol 38 (5) ◽  
pp. 756-763
Author(s):  
Yang YANG ◽  
Miao ZHENG ◽  
Yu LIAO ◽  
Jianfeng ZHOU ◽  
Heping LI ◽  
...  
Keyword(s):  
Uv Light ◽  
Human Gingival Fibroblasts ◽  
Gingival Fibroblasts ◽  
Surface Modified
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