Plasma Oxidation Kinetics of Gold Nanoparticles and Their Encapsulation in Graphene Shells by Chemical Vapor Deposition Growth

2012 ◽  
Vol 116 (23) ◽  
pp. 12861-12874 ◽  
Author(s):  
Junchi Wu ◽  
Wenwu Shi ◽  
Nitin Chopra
Keyword(s):  
Gold Nanoparticles ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Oxidation Kinetics ◽  
Chemical Vapor ◽  
Plasma Oxidation ◽  
Chemical Vapor Deposition Growth ◽  
Kinetics Of

Local anodic oxidation kinetics of chemical vapor deposition graphene supported on a thin oxide buffered silicon template

Carbon ◽  
2013 ◽  
Vol 54 ◽  
pp. 336-342 ◽  
Author(s):  
Min-Chiang Chuang ◽  
Hsiao-Mei Chien ◽  
Yuan-Hong Chain ◽  
Gou-Chung Chi ◽  
Sheng-Wei Lee ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Anodic Oxidation ◽  
Vapor Deposition ◽  
Oxidation Kinetics ◽  
Chemical Vapor ◽  
Local Anodic Oxidation ◽  
Thin Oxide ◽  
Chemical Vapor Deposition Graphene ◽  
Kinetics Of

Edge Structural Stability and Kinetics of Graphene Chemical Vapor Deposition Growth

ACS Nano ◽  
2012 ◽  
Vol 6 (4) ◽  
pp. 3243-3250 ◽  
Author(s):  
Haibo Shu ◽  
Xiaoshuang Chen ◽  
Xiaoming Tao ◽  
Feng Ding
Keyword(s):  
Chemical Vapor Deposition ◽  
Structural Stability ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Kinetics Of

The edge termination controlled kinetics in graphene chemical vapor deposition growth

2014 ◽  
Vol 5 (12) ◽  
pp. 4639-4645 ◽  
Author(s):  
Haibo Shu ◽  
Xiaoshuang Chen ◽  
Feng Ding
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Edge Termination ◽  
Cvd Growth ◽  
Kinetics Of

The kinetics of graphene CVD growth is dominated by the type of edge passivation.

In situ study of electron beam-induced chemical vapor deposition of Au in an environmental TEM

1995 ◽  
Vol 53 ◽  
pp. 256-257
Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss
Keyword(s):  
Electron Beam ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Quantum Effect ◽  
Line Drawing ◽  
Chemical Vapor ◽  
Environmental Cell ◽  
Engineering Changes ◽  
Kinetics Of

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.

Chemical vapor deposition growth and characterization of AlGaN nanowires

2015 ◽  
Vol 32 (6) ◽  
pp. 638
Author(s):  
Xingmin Cai ◽  
Xiaoqiang Su ◽  
Fan Ye ◽  
Huan Wang ◽  
Guangxing Liang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth

Epitaxial mist chemical vapor deposition growth and characterization of Cu3N films on (0001)α-Al2O3 substrates

2020 ◽  
Vol 13 (7) ◽  
pp. 075505
Author(s):  
Tomohiro Yamaguchi ◽  
Hiroki Nagai ◽  
Takanori Kiguchi ◽  
Nao Wakabayashi ◽  
Takuto Igawa ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Α Al2o3

scholarly journals Study of deposition parameters and growth kinetics of ZnO deposited by aerosol assisted chemical vapor deposition

RSC Advances ◽  
2021 ◽  
Vol 11 (30) ◽  
pp. 18493-18499
Author(s):  
Sergio Sánchez-Martín ◽  
S. M. Olaizola ◽  
E. Castaño ◽  
E. Urionabarrenetxea ◽  
G. G. Mandayo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Growth Kinetics ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Kinetics Analysis ◽  
Deposition Parameters ◽  
Kinetics Of

Impact of deposition parameters, microstructure and growth kinetics analysis of ZnO grown by Aerosol-assisted Chemical Vapor Deposition (AACVD).

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