Electrochemical Quartz Crystal Microbalance in a Channel Flow Cell:  A Study of Copper Dissolution

2007 ◽  
Vol 111 (9) ◽  
pp. 3669-3674 ◽  
Author(s):  
Clare M. Galvani ◽  
Andrew Graydon ◽  
D. Jason Riley ◽  
David York
Keyword(s):  
Channel Flow ◽  
Quartz Crystal Microbalance ◽  
Quartz Crystal ◽  
Electrochemical Quartz Crystal Microbalance ◽  
Flow Cell ◽  
Copper Dissolution

Evaluation of Inhibitors for ECMP of Copper Using Electrochemical Quartz Crystal Microbalance (EQCM) Technique

2006 ◽  
Vol 914 ◽  
Author(s):  
Ashok Muthukumaran ◽  
Viral Lowalekar ◽  
Srini Raghavan
Keyword(s):  
Oxalic Acid ◽  
Corrosion Inhibitor ◽  
Organic Compounds ◽  
Quartz Crystal Microbalance ◽  
Quartz Crystal ◽  
Electrochemical Quartz Crystal Microbalance ◽  
Copper Films ◽  
Copper Dissolution ◽  
Mechanism Of Inhibition ◽  
Electrochemical Mechanical Planarization

AbstractChemical formulations for the electrochemical mechanical planarization (ECMP) of copper must contain constituents that are stable at anodic potentials. A key component of the formulation is a corrosion inhibitor, which is required to protect low lying areas while higher areas are selectively removed. Organic compounds, which adsorb on copper at low overpotentials and form a film by oxidation at higher overpotentials, may be particularly useful for ECMP. The objective of this work is to evaluate the effect of two inhibitors on copper dissolution in oxalic acid based systems using an electrochemical quartz crystal microbalance (EQCM) technique. By recording current as well as mass changes during the application of potential to electrodeposited copper films, the extent and mechanism of inhibition of sulfhydryl based acid (SBA) inhibitor has been explored.

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