Calix[4]pyrrole Hydridosilicate: The Elusive Planar Tetracoordinate Silicon Imparts Striking Stability to Its Anionic Silicon Hydride

2018 ◽  
Vol 140 (50) ◽  
pp. 17409-17412 ◽  
Author(s):  
Fabian Ebner ◽  
Lutz Greb
Keyword(s):  
Silicon Hydride

Silicon hydride etch products from the reaction of atomic hydrogen with Si(100)

1989 ◽  
Vol 207 (2-3) ◽  
pp. 364-384 ◽  
Author(s):  
Stephen M. Gates ◽  
Roderick R. Kunz ◽  
C.Michael Greenlief
Keyword(s):  
Atomic Hydrogen ◽  
Silicon Hydride

scholarly journals XPS Analysis of 2- and 3-Aminothiophenol Grafted on Silicon (111) Hydride Surfaces

Molecules ◽  
2018 ◽  
Vol 23 (10) ◽  
pp. 2712 ◽  
Author(s):  
Chieh-Hua Lee ◽  
Wan-Cian Chen ◽  
Yit Khung
Keyword(s):  
High Resolution ◽  
Nucleophilic Addition ◽  
Surface Reaction ◽  
Negative Charge ◽  
Strong Preference ◽  
Xps Analysis ◽  
Silicon Hydride ◽  
Resonance Structures ◽  
Resonance Effects ◽  
Sh Group

Following on from our previous study on the resonance/inductive structures of ethynylaniline, this report examines similar effects arising from resonance structures with aromatic aminothiophenol with dual electron-donating substituents. In brief, 2- and 3-aminothiophenol were thermally grafted on silicon (111) hydride substrate at 130 °C under nonpolar aprotic mesitylene. From the examination of high resolution XPS Si2p, N1s, and S2p spectrum, it was noticed that there was a strong preference of NH2 over SH to form Si–N linkage on the silicon hydride surface for 2-aminothiophenol. However, for 3-aminothiophenol, there was a switch in reactivity of the silicon hydride toward SH group. This was attributed to the antagonistic and cooperative resonance effects for 2- and 3-aminothiophenol, respectively. The data strongly suggested that the net resonance of the benzylic-based compound could have played an important role in the net distribution of negative charge along the benzylic framework and subsequently influenced the outcome of the surface reaction. To the best of the authors’ knowledge, this correlation between dual electron-donating substituents and the outcome of the nucleophilic addition toward silicon hydride surfaces has not been described before in literature.

scholarly journals Sonochemical Reaction of Bifunctional Molecules on Silicon (111) Hydride Surface

Molecules ◽  
2021 ◽  
Vol 26 (20) ◽  
pp. 6166
Author(s):  
Serge Ismael Zida ◽  
Yue-Der Lin ◽  
Yit Lung Khung
Keyword(s):  
Photoelectron Spectroscopy ◽  
Lone Pair ◽  
Thermal Reaction ◽  
Silicon Hydride ◽  
Force Microscopy ◽  
Bifunctional Molecules ◽  
Bond Breakage ◽  
Sonochemical Reaction ◽  
Grafting From ◽  
P Type

While the sonochemical grafting of molecules on silicon hydride surface to form stable Si–C bond via hydrosilylation has been previously described, the susceptibility towards nucleophilic functional groups during the sonochemical reaction process remains unclear. In this work, a competitive study between a well-established thermal reaction and sonochemical reaction of nucleophilic molecules (cyclopropylamine and 3-Butyn-1-ol) was performed on p-type silicon hydride (111) surfaces. The nature of surface grafting from these reactions was examined through contact angle measurements, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Cyclopropylamine, being a sensitive radical clock, did not experience any ring-opening events. This suggested that either the Si–H may not have undergone homolysis as reported previously under sonochemical reaction or that the interaction to the surface hydride via a lone-pair electron coordination bond was reversible during the process. On the other hand, silicon back-bond breakage and subsequent surface roughening were observed for 3-Butyn-1-ol at high-temperature grafting (≈150 °C). Interestingly, the sonochemical reaction did not produce appreciable topographical changes to surfaces at the nano scale and the further XPS analysis may suggest Si–C formation. This indicated that while a sonochemical reaction may be indifferent towards nucleophilic groups, the surface was more reactive towards unsaturated carbons. To the best of the author’s knowledge, this is the first attempt at elucidating the underlying reactivity mechanisms of nucleophilic groups and unsaturated carbon bonds during sonochemical reaction of silicon hydride surfaces.

The Effect of Chain Length Distribution on Elastomeric Properties. III. Non-Random Networks Prepared with a Partially Vinyl-Selective Bis(Alkylperoxy)Diisopropylbenzene

1980 ◽  
Vol 53 (4) ◽  
pp. 988-993 ◽  
Author(s):  
M. A. Llorente ◽  
J. E. Mark
Keyword(s):  
Reaction Time ◽  
Benzoyl Peroxide ◽  
Crosslinking Agent ◽  
Length Distribution ◽  
Random Networks ◽  
Silicon Hydride ◽  
Chain Length Distribution ◽  
Γ Radiation ◽  
Close Proximity ◽  
Effective Degree

Abstract The reactant α,α′-bis(t-butylperoxy)diisopropylbenzene was used to crosslink PDMS polymers containing vinyl side groups with varying degrees of segregation along the chains. On the basis of the elongation moduli of the resulting networks, this reactant was found to be moderately selective for vinyl groups, falling approximately midway between the essentially non-selective benzoyl peroxide and γ-radiation and a highly selective silicon hydride crosslinking agent. As expected, a significant amount of the selectivity was lost at longer reaction time. Placing crosslinks in close proximity decreases the effective degree of crosslinking, and may affect the swelling response more than the modulus in elongation.

Si Whisker Growth by Hydrogen Radical using Hot Filament CVD Reactor

2007 ◽  
Vol 1018 ◽  
Author(s):  
Hiroshi Nagayoshi ◽  
Suzuka Nishimura ◽  
Kazutaka Terashima ◽  
Nobuo Matsumoto ◽  
Alexander G. Ulyashin
Keyword(s):  
Residence Time ◽  
Silicon Substrate ◽  
Silicon Surface ◽  
Whisker Growth ◽  
Silicon Hydride ◽  
Particle Layer ◽  
Hot Filament Cvd ◽  
Silicon Whisker ◽  
Hydrogen Radical ◽  
Hot Filament

AbstractThis paper describes the growth mechanism of silicon whisker on a silicon substrate using hot filament CVD reactor. Only hydrogen is used as source gas. The particle layer could be obtained at high filament current condition under hydrogen ambient. XPS analysis result suggests that the particle is composed of tungsten silicide. The deposition condition of the particle layer is much depended on the substrate size, surface condition and the distance between the substrate and the filament. The experimental results suggest that the silicon hydride, which generated at the silicon surface by hydrogen radical etching, react with the tungsten filament material around the filament, depositing on the silicon substrate. The silicon surface is etched by hydrogen radical and its resultant surface morphology is much depended on the particle deposition pattern. Many silicon whiskers, which diameter is varied from 10 to 50 nm, are observed on the textured silicon surface when the residence time of the source gas in the reactor is long. Each whisker has a silicon particle on their tip. The silicon hydride generated by the hydrogen radical etching is much absorbed to the silicide particle when the source gas residence time is long, enabling the silicon whisker growth from the particle. The results suggest that nm size whisker structure is much stable compare to the bulk silicon against etching reaction.

Aluminum-silicon hydride clusters for prospective hydrogen storage

2019 ◽  
Vol 44 (48) ◽  
pp. 26459-26468
Author(s):  
Li Ma ◽  
Tao Zhou ◽  
Jinyun Li ◽  
Hongshan Chen
Keyword(s):  
Hydrogen Storage ◽  
Silicon Hydride ◽  
Aluminum Silicon

scholarly journals Oxidative addition of silicon hydrides to hydridocarbonyltris(triphenylphosphine)iridium(I)

1969 ◽  
Vol 47 (12) ◽  
pp. 2205-2208 ◽  
Author(s):  
J. F. Harrod ◽  
D. F. R. Gilson ◽  
R. Charles
Keyword(s):  
Nuclear Magnetic Resonance ◽  
Magnetic Resonance ◽  
Oxidative Addition ◽  
Proton Nuclear Magnetic Resonance ◽  
Iridium Complex ◽  
Thermal Loss ◽  
Silicon Hydride ◽  
Silicon Hydrides ◽  
Nuclear Magnetic

Complexes have been prepared by oxidation of hydridocarbonyltris(triphenylphosphine)iridium(I) with a variety of silicon hydrides. The complexes were very stable with respect to thermal loss of either silicon hydride or molecular hydrogen.An unequivocal assignment of stereochemistry of the complexes was obtained from a combination of infrared and proton nuclear magnetic resonance (n.m.r.) techniques. Addition of the silicon hydride to the iridium complex was found to be stereospecifically cis.

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