MC4:  A Hypothetical Three-Dimensional Organometallic Net with Metal−Metal Bonding and Polyacetylene Substructures

1996 ◽  
Vol 118 (42) ◽  
pp. 10294-10302 ◽  
Author(s):  
Norman Goldberg ◽  
Huang Tang ◽  
Nancy Kroohs ◽  
Roald Hoffmann
2006 ◽  
Vol 970 ◽  
Author(s):  
Ronald J. Gutmann ◽  
J. Jay McMahon ◽  
Jian-Qiang Lu

ABSTRACTA monolithic, wafer-level three-dimensional (3D) technology platform is described that is compatible with next-generation wafer level packaging (WLP) processes. The platform combines the advantages of both (1) high bonding strength and adaptability to IC wafer topography variations with spin-on dielectric adhesive bonding and (2) process integration and via-area advantages of metal-metal bonding. A copper-benzocyclobutene (Cu-BCB) process is described that incorporates single-level damascene-patterned Cu vias with partially-cured BCB as the bonding adhesive layer. A demonstration vehicle consisting of a two-wafer stack of 2-4 μm diameter vias has shown the bondability of both Cu-to-Cu and BCB-to-BCB. Planarization conditions to achieve BCB-BCB bonding with low-resistance Cu-Cu contacts have been examined, with wafer-scale planarization requirements compared to other 3D platforms. Concerns about stress induced at the tantalum (Ta) liner-to-BCB interface resulting in partial delamination are discussed. While across-wafer uniformity has not been demonstrated, the viability of this WLP-compatible 3D platform has been shown.


1992 ◽  
Vol 98 (1) ◽  
pp. 82-89 ◽  
Author(s):  
Theodore D. Brennan ◽  
James A. Ibers
Keyword(s):  

Biochemistry ◽  
1994 ◽  
Vol 33 (34) ◽  
pp. 10401-10407 ◽  
Author(s):  
Ninian J. Blackburn ◽  
Mary E. Barr ◽  
William H. Woodruff ◽  
John van der Ooost ◽  
Simon de Vries

2010 ◽  
Vol 41 (12) ◽  
pp. 1694-1699 ◽  
Author(s):  
Szu-Hsueh Lai ◽  
Chung-Jen Hsiao ◽  
Yu-Min Huang ◽  
I-Chia Chen ◽  
Wen-Zhen Wang ◽  
...  

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