Confined High-Pressure Chemical Deposition of Hydrogenated Amorphous Silicon

2011 ◽  
Vol 134 (1) ◽  
pp. 19-22 ◽  
Author(s):  
Neil F. Baril ◽  
Rongrui He ◽  
Todd D. Day ◽  
Justin R. Sparks ◽  
Banafsheh Keshavarzi ◽  
...  
2016 ◽  
Vol 28 (28) ◽  
pp. 5939-5942 ◽  
Author(s):  
Rongrui He ◽  
Todd D. Day ◽  
Justin R. Sparks ◽  
Nichole F. Sullivan ◽  
John V. Badding

Author(s):  
R. Garcia-Hemansanz ◽  
E. Garcia-Hemme ◽  
D. Pastor ◽  
A. del Prado ◽  
I. Martil ◽  
...  

2017 ◽  
Vol 56 (51) ◽  
pp. 14995-15000 ◽  
Author(s):  
Seyed Pouria Motevalian ◽  
Stephen C. Aro ◽  
Hiu Y. Cheng ◽  
Todd D. Day ◽  
Adri C. T. van Duin ◽  
...  

1982 ◽  
Vol 42 (3) ◽  
pp. 197-200 ◽  
Author(s):  
Takeo Ishidate ◽  
Kuon Inoue ◽  
Kazuhiko Tsuji ◽  
Shigeru Minomura

1981 ◽  
Vol 42 (C4) ◽  
pp. C4-773-C4-777 ◽  
Author(s):  
H. R. Shanks ◽  
F. R. Jeffrey ◽  
M. E. Lowry

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